Method and solution for resolving cgt mura issue

Abstract

Embodiments described herein provide an apparatus for providing an inductance at positions that correspond to positions of substrate support pins. The apparatus includes one or more substrate support pins. Each substrate support pin includes a head portion, a first portion, and a second portion. The second portion is an inductor that provides inductance at positions of substrate support pins. The inductance provided by the second portion of the substrate support pin changes the impedance to match the impedance at areas of the substrate support without the substrate support pins. With matched impedance, the plasma density over the areas of the substrate support with the support pins and without the support pins is uniform, leading to improved film thickness uniformity. The uniform film thickness thus reduces or eliminates clouding or the “mura effect”.

What is claimed is: 
     
         1 . A substrate support pin, comprising:
 a head portion having a first lateral dimension;   a first portion coupled to the head portion, the first portion having a second lateral dimension substantially less than the first dimension; and   a second portion coupled to the first portion, the second portion is a metal coil.   
     
     
         2 . The substrate support pin of  claim 1 , further comprising a sleeve surrounding the first portion. 
     
     
         3 . The substrate support pin of  claim 2 , wherein the sleeve comprises a ceramic material. 
     
     
         4 . The substrate support pin of  claim 3 , wherein the head portion and the first portion comprise a metal. 
     
     
         5 . The substrate support pin of  claim 1 , wherein the metal coil comprises aluminum. 
     
     
         6 . The substrate support pin of  claim 1 , further comprising a magnetic insert disposed in the second portion. 
     
     
         7 . The substrate support pin of  claim 6 , wherein the magnetic insert comprises an alloy of aluminum, nickel and cobalt (Al/Ni/Co), samarium cobalt (SmCo), or neodymium (Nd). 
     
     
         8 . A support pedestal for a vacuum chamber, comprising;
 a body having a plurality of openings formed between two major sides of the body; and   a substrate support pin disposed in each of the plurality of openings, each of the substrate support pins comprising:   a head portion having a first lateral dimension;   a first portion coupled to the head portion, the first portion having a second lateral dimension substantially less than the first dimension; and   a second portion coupled to the first portion, the second portion is a metal coil.   
     
     
         9 . The support pedestal of  claim 8 , wherein the first portion has a first longitudinal dimension, the second portion has a second longitudinal dimension, and the first longitudinal dimension is substantially greater than the second longitudinal dimension. 
     
     
         10 . The support pedestal of  claim 9 , further comprising a magnetic insert disposed in the second portion. 
     
     
         11 . The support pedestal of  claim 10 , wherein the magnetic insert comprises an alloy of aluminum, nickel and cobalt (Al/Ni/Co), samarium cobalt (SmCo), or neodymium (Nd). 
     
     
         12 . The support pedestal of  claim 10 , wherein the magnetic insert has a third longitudinal dimension less than or equal to the second longitudinal dimension of the second portion. 
     
     
         13 . The support pedestal of  claim 12 , wherein the third longitudinal dimension is about five percent to about  100  percent of the second longitudinal dimension of the second portion. 
     
     
         14 . The support pedestal of  claim 8 , wherein the head portion and the first portion comprise aluminum. 
     
     
         15 . The support pedestal of  claim 8 , wherein the metal coil comprises aluminum. 
     
     
         16 . An apparatus, comprising:
 a chamber body defining a processing volume; and   a substrate support disposed in the processing volume, the substrate support comprising:
 a body having a plurality of openings formed between two major sides of the body; and 
 a substrate support pin disposed in each of the plurality of openings, each of the substrate support pins comprising:
 a head portion having a first lateral dimension; 
 a first portion coupled to the head portion, the first portion having a second lateral dimension substantially less than the first dimension; and 
 a second portion coupled to the first portion, the second portion being a metal coil. 
 
   
     
     
         17 . The apparatus of  claim 16 , wherein the first portion has a first longitudinal dimension, the second portion has a second longitudinal dimension, and the first longitudinal dimension is substantially greater than the second longitudinal dimension. 
     
     
         18 . The apparatus of  claim 17 , further comprising a magnetic insert disposed in the second portion. 
     
     
         19 . The apparatus of  claim 18 , wherein the magnetic insert comprises an alloy of aluminum, nickel and cobalt (Al/Ni/Co), samarium cobalt (SmCo), or neodymium (Nd). 
     
     
         20 . The apparatus of  claim 19 , wherein the magnetic insert has a third longitudinal dimension less than or equal to the second longitudinal dimension of the second portion.