Enhanced anodization for processing equipment
Abstract
An enhanced anodization method includes forming a porous anodization layer comprising columns of anodization layer material with pores between adjacent columns. The method further includes sealing the porous layer by forming a sealing layer at a top of the porous layer. The sealing layer may be formed by using a hybrid sealing process that combines, in any order, two or more of de-ionized (DI) water seal, Ni sealing, and, PTFE sealing. Alternatively, the sealing layer is formed by conformally coating the columns in the porous layer with one or more layers of a coating material. Further, the coating material may be surface-fluorinated to improve plasma resistance.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . A method of manufacturing a chamber component for a processing chamber, the method comprising:
providing a metallic article, wherein the metallic article is a part of the chamber component; anodizing the metallic article by forming an anodization layer on the metallic article, wherein the anodization layer comprises a barrier layer adjacent to an external surface of the metallic article and a porous layer on top of the barrier layer, the porous layer comprising columns of anodization layer material with pores between adjacent columns; and sealing the porous layer by forming a sealing layer at a top of the porous layer, wherein the sealing layer is formed using a hybrid sealing process that comprises combining, in any order, two or more of the following sealing processes: a first sealing process comprising sealing with de-ionized (DI) water steam; a second sealing process comprising sealing with nickel plating; and a third sealing process comprising sealing with polytetrafluoroethylene (PTFE).
2 . The method of claim 1 , wherein the first sealing process forms hydrated metallic oxide.
3 . The method of claim 1 , wherein performing the second sealing process comprises immersing the metallic article in a nickel acetate solution.
4 . The method of claim 1 , wherein performing the third sealing process comprises spraying, dipping or brushing a thermosetting resin containing PTFE onto the anodized metallic article.
5 . A method of manufacturing a chamber component for a processing chamber, the method comprising:
providing a metallic article, wherein the metallic article is a part of the chamber component; anodizing the metallic article by forming an anodization layer on the metallic article, wherein the anodization layer comprises a barrier layer adjacent to an external surface of the metallic article and a porous layer on top of the barrier layer, the porous layer comprising columns of anodization layer material with pores between adjacent columns; and sealing the porous layer by forming a sealing layer at a top of the porous layer, wherein the sealing layer is formed by conformally coating the columns in the porous layer with one or more layers of a coating material.
6 . The method of claim 5 , wherein sealing the porous layer further comprises:
annealing the one or more layers of the coating material to form a surface alloy of the coating material.
7 . The method of claim 5 , wherein the one or more layers of the coating material are deposited using one or more of the following processes: atomic layer deposition (ALD), physical vapor deposition (PVD), chemical vapor deposition (CVD), plasma enhanced chemical vapor deposition (PECVD), plasma enhanced physical vapor deposition (PEPVD), and wet chemical deposition.
8 . The method of claim 7 , wherein a thickness of the sealing layer is selected such that the one or more layers of the coating material fully fill the pores between adjacent columns.
9 . The method of claim 7 , wherein a thickness of the sealing layer is selected such that the one or more layers of the coating material partially fill the pores between adjacent columns.
10 . The method of claim 9 , wherein a pore size for the pores between the coated columns of the porous layer is in the range of 5-60 nm.
11 . The method of claim 5 , wherein the coating material comprises an oxide, the method further comprising:
conducting in-situ fluorination to replace at least a portion of oxygen molecules of the oxide with fluorine molecules and convert at least a surface of the coating from the oxide into a fluoride or an oxy-fluoride.
12 . The method of claim 11 , wherein the coating material is Al 2 O 3 or Y 2 O 3 , and the surface of the coating is converted to AlF 3 /AlOF or YF 3 /YOF after in-situ fluorination.
13 . The method of claim 12 , wherein performing the in-situ fluorination comprises:
immersing the article in a mixed acid solution containing HF, NH 4 F, and H 2 O 2 in predetermined volumetric ratio.
14 . The method of claim 12 , wherein performing the in-situ fluorination comprises:
irradiating the article with a fluorine-containing plasma.
15 . A chamber component for a processing chamber, comprising:
a metallic article that is a part of the chamber component; an anodization layer formed on the metallic article, wherein the anodization layer comprises a barrier layer adjacent to an external surface of the metallic article and a porous layer on top of the barrier layer, the porous layer comprising columns of anodization layer material with pores between adjacent columns; and a hybrid sealing layer formed at a top of the porous layer, wherein the hybrid sealing layer comprises, in any order, two or more of the following layers: a hydrated metallic oxide layer; a plated nickel layer; and a polytetrafluoroethylene (PTFE) layer.
16 . A chamber component for a processing chamber, comprising:
a metallic article that is a part of the chamber component; an anodization layer formed on the metallic article, wherein the anodization layer comprises a barrier layer adjacent to an external surface of the metallic article and a porous layer on top of the barrier layer, the porous layer comprising columns of anodization layer material with pores between adjacent columns; and a sealing layer formed at a top of the porous layer, wherein the sealing layer comprises one or more layers of a coating material conformally deposited onto the columns in the porous layer.
17 . The chamber component of claim 16 , wherein the thickness of the sealing layer is selected such that the one or more layers of the coating material fully fill the pores between adjacent columns.
18 . The chamber component of claim 16 , wherein the thickness of the sealing layer is selected such that the one or more layers of the coating material partially fill the pores between adjacent columns.
19 . The chamber component of claim 17 , wherein a pore size for the pores between the coated columns of the porous layer is in the range of 5-60 nm.
20 . The chamber component of claim 16 , wherein the sealing layer further comprises:
a fluorinated outer surface layer over the one or more layers of the coating material.Join the waitlist — get patent alerts
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