US2019376202A1PendingUtilityA1

Enhanced anodization for processing equipment

Assignee: APPLIED MATERIALS INCPriority: Jun 11, 2018Filed: Jun 6, 2019Published: Dec 12, 2019
Est. expiryJun 11, 2038(~11.9 yrs left)· nominal 20-yr term from priority
C25D 11/246C25D 11/18C25D 11/06C25D 11/20
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Claims

Abstract

An enhanced anodization method includes forming a porous anodization layer comprising columns of anodization layer material with pores between adjacent columns. The method further includes sealing the porous layer by forming a sealing layer at a top of the porous layer. The sealing layer may be formed by using a hybrid sealing process that combines, in any order, two or more of de-ionized (DI) water seal, Ni sealing, and, PTFE sealing. Alternatively, the sealing layer is formed by conformally coating the columns in the porous layer with one or more layers of a coating material. Further, the coating material may be surface-fluorinated to improve plasma resistance.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
         1 . A method of manufacturing a chamber component for a processing chamber, the method comprising:
 providing a metallic article, wherein the metallic article is a part of the chamber component;   anodizing the metallic article by forming an anodization layer on the metallic article, wherein the anodization layer comprises a barrier layer adjacent to an external surface of the metallic article and a porous layer on top of the barrier layer, the porous layer comprising columns of anodization layer material with pores between adjacent columns; and   sealing the porous layer by forming a sealing layer at a top of the porous layer, wherein the sealing layer is formed using a hybrid sealing process that comprises combining, in any order, two or more of the following sealing processes:   a first sealing process comprising sealing with de-ionized (DI) water steam;   a second sealing process comprising sealing with nickel plating; and   a third sealing process comprising sealing with polytetrafluoroethylene (PTFE).   
     
     
         2 . The method of  claim 1 , wherein the first sealing process forms hydrated metallic oxide. 
     
     
         3 . The method of  claim 1 , wherein performing the second sealing process comprises immersing the metallic article in a nickel acetate solution. 
     
     
         4 . The method of  claim 1 , wherein performing the third sealing process comprises spraying, dipping or brushing a thermosetting resin containing PTFE onto the anodized metallic article. 
     
     
         5 . A method of manufacturing a chamber component for a processing chamber, the method comprising:
 providing a metallic article, wherein the metallic article is a part of the chamber component;   anodizing the metallic article by forming an anodization layer on the metallic article, wherein the anodization layer comprises a barrier layer adjacent to an external surface of the metallic article and a porous layer on top of the barrier layer, the porous layer comprising columns of anodization layer material with pores between adjacent columns; and   sealing the porous layer by forming a sealing layer at a top of the porous layer, wherein the sealing layer is formed by conformally coating the columns in the porous layer with one or more layers of a coating material.   
     
     
         6 . The method of  claim 5 , wherein sealing the porous layer further comprises:
 annealing the one or more layers of the coating material to form a surface alloy of the coating material.   
     
     
         7 . The method of  claim 5 , wherein the one or more layers of the coating material are deposited using one or more of the following processes: atomic layer deposition (ALD), physical vapor deposition (PVD), chemical vapor deposition (CVD), plasma enhanced chemical vapor deposition (PECVD), plasma enhanced physical vapor deposition (PEPVD), and wet chemical deposition. 
     
     
         8 . The method of  claim 7 , wherein a thickness of the sealing layer is selected such that the one or more layers of the coating material fully fill the pores between adjacent columns. 
     
     
         9 . The method of  claim 7 , wherein a thickness of the sealing layer is selected such that the one or more layers of the coating material partially fill the pores between adjacent columns. 
     
     
         10 . The method of  claim 9 , wherein a pore size for the pores between the coated columns of the porous layer is in the range of 5-60 nm. 
     
     
         11 . The method of  claim 5 , wherein the coating material comprises an oxide, the method further comprising:
 conducting in-situ fluorination to replace at least a portion of oxygen molecules of the oxide with fluorine molecules and convert at least a surface of the coating from the oxide into a fluoride or an oxy-fluoride.   
     
     
         12 . The method of  claim 11 , wherein the coating material is Al 2 O 3  or Y 2 O 3 , and the surface of the coating is converted to AlF 3 /AlOF or YF 3 /YOF after in-situ fluorination. 
     
     
         13 . The method of  claim 12 , wherein performing the in-situ fluorination comprises:
 immersing the article in a mixed acid solution containing HF, NH 4 F, and H 2 O 2  in predetermined volumetric ratio.   
     
     
         14 . The method of  claim 12 , wherein performing the in-situ fluorination comprises:
 irradiating the article with a fluorine-containing plasma.   
     
     
         15 . A chamber component for a processing chamber, comprising:
 a metallic article that is a part of the chamber component;   an anodization layer formed on the metallic article, wherein the anodization layer comprises a barrier layer adjacent to an external surface of the metallic article and a porous layer on top of the barrier layer, the porous layer comprising columns of anodization layer material with pores between adjacent columns; and   a hybrid sealing layer formed at a top of the porous layer, wherein the hybrid sealing layer comprises, in any order, two or more of the following layers:   a hydrated metallic oxide layer;   a plated nickel layer; and   a polytetrafluoroethylene (PTFE) layer.   
     
     
         16 . A chamber component for a processing chamber, comprising:
 a metallic article that is a part of the chamber component;   an anodization layer formed on the metallic article, wherein the anodization layer comprises a barrier layer adjacent to an external surface of the metallic article and a porous layer on top of the barrier layer, the porous layer comprising columns of anodization layer material with pores between adjacent columns; and   a sealing layer formed at a top of the porous layer, wherein the sealing layer comprises one or more layers of a coating material conformally deposited onto the columns in the porous layer.   
     
     
         17 . The chamber component of  claim 16 , wherein the thickness of the sealing layer is selected such that the one or more layers of the coating material fully fill the pores between adjacent columns. 
     
     
         18 . The chamber component of  claim 16 , wherein the thickness of the sealing layer is selected such that the one or more layers of the coating material partially fill the pores between adjacent columns. 
     
     
         19 . The chamber component of  claim 17 , wherein a pore size for the pores between the coated columns of the porous layer is in the range of 5-60 nm. 
     
     
         20 . The chamber component of  claim 16 , wherein the sealing layer further comprises:
 a fluorinated outer surface layer over the one or more layers of the coating material.

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