Methods and apparatus for controlled chemical vapor deposition

Abstract

A gas injector system is provided that allows for improved distribution and directional control of the vapor material in a CVD or CVI process. Gas injector systems may be used without experiencing significant clogging of gas injector tube apertures over multiple CVD procedures. Further, a gas injector system provided includes a dual aperture release system and/or allow vapor material to flow both substantially horizontally and substantially vertically.

1 . A system comprising
 a first gas injector tube having a first exterior surface;   a second gas injector tube having a second exterior surface;   a shield collar having a plurality of collar apertures;   wherein said first gas injector tube and said second gas injector tube are configured to at least partially overlap at a tube joint;   wherein said shield collar is configured to cover a portion of said first exterior surface and a portion of said second exterior surface; and   wherein said tube joint comprises a gap between said first gas injector tube and said second gas injector tube.   
     
     
         2 . The system of  claim 1 , wherein said plurality of collar apertures is configured to direct gas flow horizontally and vertically. 
     
     
         3 . The system of  claim 1 , wherein said first gas injector tube comprises a plurality of tube apertures. 
     
     
         4 . The system of  claim 1 , wherein said first gas injector tube and said shield collar are comprised of a carbon material. 
     
     
         5 . The system of  claim 1 , wherein said first gas injector tube and said shield collar are comprised of graphite. 
     
     
         6 . The system of  claim 1 , further comprising an end cap configured to be coupled to a terminus of said first gas injector tube. 
     
     
         7 . The system of  claim 6 , wherein said end cap is configured to be coupled to a terminus of said first gas injector tube via a graphite pin.