Thermally optimized rings

Abstract

A process kit ring for use in a plasma processing system is disclosed herein. The process kit ring includes an annular body and one or more hollow inner cavities. The annular body is formed from a plasma resistant material. The annular body has an outer diameter greater than 200 mm. The annular body includes a top surface and a bottom surface. The top surface is configured to face a plasma processing region of a process chamber. The bottom surface is opposite the top surface. The bottom surface is substantially perpendicular to a centerline of the body. The bottom surface is supported at least partially by a pedestal assembly. The one or more hollow inner cavities are formed in the annular body about the centerline. The one or more hollow inner cavities are arranged in a circle within the annular body.

What is claimed is: 
     
         1 . A process kit ring for use in a plasma processing system, the process kit ring comprising:
 a hollow annular body of the process kit ring, the annular body comprising:
 a first cavity formed in the annular body; and 
 a first vent hole formed in the annular body and venting the first cavity to an exterior of the annular body. 
   
     
     
         2 . The process kit ring of  claim 1  further comprising:
 a second cavity formed in the annular body. 
 
     
     
         3 . The process kit ring of  claim 2 , wherein the second cavity is vented to the exterior of the annular body by the first vent hole. 
     
     
         4 . The process kit ring of  claim 2 , wherein the second cavity is vented to the exterior of the annular body by a second vent hole. 
     
     
         5 . The process kit ring of  claim 2 , wherein the first cavity and the second cavity are concentric about a centerline of the annular body. 
     
     
         6 . The process kit ring of  claim 2 , wherein the first cavity is formed outward of the second cavity relative to a centerline of the annular body. 
     
     
         7 . The process kit ring of  claim 1  further comprising:
 an internal feature projecting into the first cavity. 
 
     
     
         8 . The process kit ring of  claim 7 , wherein the internal feature comprises:
 a rib or a fin.   
     
     
         9 . The process kit ring of  claim 1 , wherein the annular body further comprises:
 a top surface; and   a bottom surface opposite the top surface, the bottom surface substantially perpendicular to a centerline of the annular body, and wherein the first vent hole is formed in the bottom surface.   
     
     
         10 . A process kit ring for use in a plasma processing system, the process kit ring comprising:
 a hollow annular body of the process kit ring, the annular body comprising:
 a first row of cavities; 
 a second row of cavities; and 
 a first vent hole formed in the annular body and venting at least one cavity of the first row of cavities to an exterior of the annular body. 
   
     
     
         11 . The process kit ring of  claim 10 , wherein the cavities of the first row of cavities are fluidly interconnected. 
     
     
         12 . The process kit ring of  claim 10 , wherein the cavities of the second row of cavities are fluidly interconnected. 
     
     
         13 . The process kit ring of  claim 10 , wherein the first row of cavities and the second row of cavities are fluidly interconnected. 
     
     
         14 . The process kit ring of  claim 10  further comprising:
 a second vent hole formed in the annular body, the second vent hole formed on an opposite surface of the annular body relative to the first vent hole. 
 
     
     
         15 . The process kit ring of  claim 14  further comprising:
 one or more ribs formed in each cavity of the first row of cavities. 
 
     
     
         16 . The process kit ring of  claim 15 , wherein each of the one or more ribs further comprises:
 an aperture.   
     
     
         17 . The process kit ring of  claim 10 , wherein the annular body is formed of stainless steel. 
     
     
         18 . A process kit for a substrate processing chamber, the process kit comprising:
 a first process kit ring comprising:
 a first hollow annular body comprising:
 a first cavity formed in the first annular body; 
 a second cavity formed in the first annular body, the second cavity formed outward of the first cavity relative to a centerline of the first annular body; and 
 a first vent hole formed in the first annular body and venting the first cavity to an exterior of the first annular body; and 
 
   a second process kit ring comprising:
 a second hollow annular body comprising:
 a third cavity formed in the second annular body; 
 a fourth cavity formed in the second annular body, the fourth cavity formed outward of the third cavity relative to a centerline of the second annular body; and 
 a second vent hole formed in the second annular body and venting the third cavity to an exterior of the second annular body. 
 
   
     
     
         19 . The process kit of  claim 18 , wherein the first cavity and the second cavity are in fluid communication with each other. 
     
     
         20 . The process kit of  claim 19 , wherein the third cavity and the fourth cavity are in fluid communication with each other.