Make up kit comprising a base composition resistant to make- up removal

Abstract

The present invention relates to a kit for make-up and/or care of nails and/or false nails, comprising: a composition C1 for make-up and/or care of nails and/or false nails comprising at least one film-forming polymer, said polymer being insoluble in acetone, methyl acetate, and ethyl acetate, and a make-up removal composition C2 comprising at least one volatile solvent S2 selected from the group consisting of C 2 -C 5 alcohols, C 5 -C 12 alkanes, and mixtures thereof, said solvent S2 being able to solubilize the film-forming polymer of composition C1.

1 . A kit for make-up and/or care of nails and/or false nails, comprising:
 a composition C1 for make-up and/or care of nails and/or false nails comprising at least one film-forming polymer, said polymer being insoluble in acetone, methyl acetate, and ethyl acetate, and   a make-up removal composition C2 comprising at least one volatile solvent S2 selected from the group consisting of C 2 -C 5  alcohols, C 5 -C 12  alkanes, and mixtures thereof, said solvent S2 being able to solubilize the film-forming polymer of the composition C1.   
     
     
         2 . The kit according to  claim 1 , wherein the composition C1 further comprises a volatile solvent S1 selected from the group consisting of C 2 -C 5  alcohols, C 5 -C 12  alkanes, and mixtures thereof, said solvent S1 being able to solubilize the film-forming polymer of the composition C1. 
     
     
         3 . The kit according to  claim 2 , wherein the solvents S1 and S2 are identical. 
     
     
         4 . The kit according to  claim 1 , wherein the film-forming polymer of the composition C1 is selected from the group consisting of polyamides, polyureas, polyurethanes, silicone resins and aliphatic and cycloaliphatic hydrocarbon polymers. 
     
     
         5 . The kit according to  claim 4 , wherein the film-forming polymer of the composition C1 is a polyamide of formula (I): 
       
         
           
           
               
               
           
         
         wherein:
 R 1  and R 2  represent C 1 -C 50  hydrocarbon groups, or polyamide units, 
 R 3  and R 4  represent divalent C 1 -C 20  hydrocarbon radicals, and 
 R 5  represents a divalent C 1 -C 100  hydrocarbon radical. 
 
       
     
     
         6 . The kit according to  claim 4 , wherein the film-forming polymer of the composition C1 is a poluyrea of formula (II): 
       
         
           
           
               
               
           
         
         wherein:
 R 6  and R 8  represent divalent C 1 -C 100  hydrocarbon radicals, or Si 1 -Si 100  polysiloxane units, 
 R 7  represents a divalent aliphatic, cycloaliphatic, or aromatic C 1 -C 30  hydrocarbon radical, and 
 m is comprised between 1 and 1,000. 
 
       
     
     
         7 . The kit according to  claim 4 , wherein the film-forming polymer of the composition C1 is a polyurethane of formula (III): 
       
         
           
           
               
               
           
         
         wherein:
 R 9  and R 11  represent divalent C 1 -C 50  hydrocarbon radicals, or Si 1 -Si 100  polysiloxane units, 
 R 10  represents a divalent aliphatic, cycloaliphatic, or aromatic C 1 -C 30  hydrocarbon radical and 
 n is comprised between 1 and 1,000. 
 
       
     
     
         8 . The kit according to  claim 4 , wherein the film-forming polymer of the composition C1 is a silicone resin comprising at least one unit of formula (IV): 
       
         
           
           
               
               
           
         
         wherein:
 R 12  represents a C 1 -C 6  alkyl group, and 
 p is comprised between 1 and 2,000 
 
         said polymer being such that at least 50% of the silicon atoms of said polymer are present within units of formula (IV), either identical or different. 
       
     
     
         9 . The kit according to  claim 4 , wherein the film-forming polymer of the composition C1 is an aliphatic or cycloaliphatic hydrocarbon polymer selected from aliphatic or cycloaliphatic hydrocarbon tackifying resins. 
     
     
         10 . The kit according to  claim 1 , wherein:
 the film-forming polymer of the composition C1 is a polyamide, and   the volatile solvent S2 of the composition C2 is a C 2 -C 5  alcohol, optionally in a mixture with a C 5 -C 12  alkane.   
     
     
         11 . The kit according to  claim 10 , wherein the composition C1 comprises at least one volatile solvent S1 comprising at least one C 2 -C 5  alcohol, optionally in a mixture with a C 5 -C 12  alkane. 
     
     
         12 . The kit according to  claim 1 , wherein:
 the film-forming polymer of the composition C1 is selected from the group consisting of aliphatic and cycloaliphatic hydrocarbon polymers, and   the volatile solvent S2 of the composition C2 is a C 5 -C 12  alkane, optionally in a mixture with a C 2 -C 5  alcohol.   
     
     
         13 . The kit according to  claim 12 , wherein the composition C1 comprises at least one volatile solvent S1 comprising at least one C 5 -C 12  alkane, optionally in a mixture with a C 2 -C 5  alcohol. 
     
     
         14 . The kit according to  claim 1 , further comprising:
 a nail varnish composition C3 comprising at least one film-forming polymer, different from the film-forming polymer of composition C1, and preferably at least one pigment, and optionally   a make-up removal composition C4 comprising a volatile solvent selected from the group consisting of C 2 -C 4  alkyl acetates and ketones.   
     
     
         15 . A method for removing make-up from nails and/or false nails, comprising the application of a make-up removal composition C2 on a nail or a false nail coated with a base coating consisting of at least one layer of composition C1, by which said base coating is removed from the nail or false nail, said compositions C1 and C2 being as defined in  claim 1 . 
     
     
         16 . The method according to  claim 15 , comprising a preliminary step for applying on a nail or a false nail, said composition C1, by which a base coating is deposited, consisting of at least one layer of said composition C1 on a nail or a false nail. 
     
     
         17 . The kit according to  claim 2 , wherein the film-forming polymer of the composition C1 is selected from the group consisting of polyamides, polyureas, polyurethanes, silicone resins and aliphatic and cycloaliphatic hydrocarbon polymers. 
     
     
         18 . The kit according to  claim 3 , wherein the film-forming polymer of the composition C1 is selected from the group consisting of polyamides, polyureas, polyurethanes, silicone resins and aliphatic and cycloaliphatic hydrocarbon polymers. 
     
     
         19 . The kit according to  claim 2 , wherein:
 the film-forming polymer of the composition C1 is a polyamide, and   the volatile solvent S2 of the composition C2 is a C 2 -C 5  alcohol, optionally in a mixture with a C 5 -C 12  alkane.   
     
     
         20 . The kit according to  claim 3 , wherein:
 the film-forming polymer of the composition C1 is a polyamide, and   the volatile solvent S2 of the composition C2 is a C 2 -C s  alcohol, optionally in a mixture with a C 5 -C 12  alkane.