Processing apparatus

Abstract

According to one embodiment, a processing apparatus for processing substrates having different base shapes includes a stage comprising a first portion having a substrate facing surface and an opening extending therethough connected to a source of a cooling fluid, and a second portion located outwardly of the first portion, a substrate support, having a substrate support surface thereon, extending over the second portion, a process fluid outlet overlying the first portion, and a driving unit coupled to one of the stage and the first portion, wherein the driving unit is configured to move at least one of the substrate support surface and the substrate facing surface such that the relative locations of the substrate support surface and the substrate facing surface of the stage are changeable based on the shape of a substrate to be processed in the apparatus.

What is claimed is: 
     
         1 . An apparatus for processing substrates having different base shapes, comprising:
 a stage comprising a first portion having a substrate facing surface and an opening extending therethough connected to a source of a cooling fluid, and a second portion located outwardly of the first portion;   a substrate support, having a substrate support surface thereon, extending over the second portion;   a process fluid outlet overlying the first portion; and   a driving unit coupled to one of the stage and the first portion, wherein the driving unit is configured to move at least one of the substrate support surface and the substrate facing surface such that the relative locations of the substrate support surface and the substrate facing surface of the stage are changeable based on the shape of a substrate to be processed in the apparatus.   
     
     
         2 . The apparatus according to  claim 1 , wherein the relative positions of the first and second portions are fixed with respect to each other. 
     
     
         3 . The apparatus according to  claim 1 , wherein the driving unit is configured to move the substrate support with respect to the second portion. 
     
     
         4 . The apparatus according to  claim 1 , wherein the driving unit is configured to move the first portion with respect to the second portion. 
     
     
         5 . The apparatus according to  claim 1 , wherein the driving unit is configured to position the first portion to position the substrate facing surface thereof a preselected distance from a surface of a substrate when the substrate includes a recess, and also position the substrate facing surface the preselected distance from the surface of the substrate when the substrate does not include a recess. 
     
     
         6 . The apparatus according to  claim 1 , wherein the driving unit is configured to position the substrate support to position a substrate when located thereon a preselected distance from the substrate facing surface of the first portion when the substrate includes a recess, and also position the substrate support to position a substrate when located thereon the preselected distance from the substrate facing surface of the first portion when the substrate does not include a recess. 
     
     
         7 . The apparatus according to  claim 1 , further comprising an ultraviolet light source. 
     
     
         8 . An apparatus for processing substrates of a first type having a rear side including a recess having a width extending therein terminating in an underside surface, and of a second type having a flat rear side, comprising:
 a substrate support including a substrate support surface thereon;   a first portion including a flow passage therethrough and at least a first substrate facing surface;   a process fluid outlet overlying the first portion; wherein the relative positions of the substrate support surface and the substrate facing surface are changeable based up the type of substrate to be processed on the apparatus.   
     
     
         9 . The apparatus according to  claim 8 , wherein
 the first portion includes a removable insert having a second substrate facing surface sized to be received in a recess in the rear side of the first type of substrate, and   the insert is configured to be removably located on the substrate facing surface when a first type of substrate is to be processed in the apparatus, and the spacing between the underside surface of a first type of substrate and the second substrate facing surface when a first type substrate is processed in the same as the spacing between the rear side of the second type of substrate and the first substrate facing surface.   
     
     
         10 . The apparatus according to  claim 9 , wherein the insert includes a fluid flow passage therethrough positionable in alignment with the flow passage. 
     
     
         11 . The apparatus according to  claim 8 , wherein the substrate support is fixed with respect to the first substrate facing surface. 
     
     
         12 . The apparatus according to  claim 8 , further comprising a driving member configured to position the first substrate facing surface at different positions with respect to the substrate support surface. 
     
     
         13 . The apparatus according to  claim 12 , wherein the width of the first substrate facing surface is smaller than the width of the recess in a first type of substrate. 
     
     
         14 . The apparatus according to  claim 8 , further comprising a driving member configured to position the substrate support surface at different locations with respect to the first substrate facing surface. 
     
     
         15 . The apparatus according to  claim 8 , further comprising:
 a processing fluid supply including a processing fluid connected to the process fluid outlet; and   a cooling fluid source connected to the flow passage, wherein the flow passage opens through the first substrate facing surface.   
     
     
         16 . The apparatus according to  claim 15 , wherein the cooling fluid is selected to have a temperature when located in a space between a substrate located on the substrate support and the first substrate facing surface or second substrate facing surface below the freezing point of the processing fluid. 
     
     
         17 . The apparatus according to  claim 8 , wherein the first portion is rotatable about an axis extending along the flow passage. 
     
     
         18 . A processing apparatus for processing substrates of a first type having a recess including a recess formed of a peripheral surface extending inwardly of the rear surface side thereof and ending in an inner generally flat wall, and substrates wherein the rear surface side is flat, comprising:
 a stage including a flat upper surface through which a flow passage extending through the stage opens and a substrate support;   a removable substrate holder comprising a flat plate-like base portion having substantially the same size as a substrate and a projection portion having a size receivable within the recess of a substrate of the first type;   a processing liquid supply unit overlying the flat upper surface, and configured to drop a processing liquid onto a substrate when on the substrate support; and   a cooling medium supply unit coupled to the flow passage.   
     
     
         19 . The processing apparatus according to  18 , wherein the substrate holder further comprises a substrate contact portion on the base portion and configured to support a first substrate and a through hole extending through the projection portion. 
     
     
         20 . The processing apparatus according to  19 , wherein the projection portion is sized such that a distance between a peripheral surface of the recess and an outer peripheral surface of the projection portion is a predetermined distance when the first substrate is held by the substrate holder.