Detonator-sensitive assembled booster charges for use in blasting engineering and the use thereof

Abstract

This invention relates to detonator-sensitive assembled booster charges for use in blasting engineering. The booster charge comprises nitroalkane and a cavity-forming agent.

1 - 15 . canceled 
     
     
         16 . A detonator-sensitive booster charge for use in blasting engineering comprising:
 a mixture comprising a nitromethane, fumed silica, and a cavity-forming means comprising a plurality of hollow glass microspheres, and   a receptacle for an ignition device,   wherein the booster charge is configured so as to be waterproof and temperature-resistant.   
     
     
         17 . The detonator-sensitive booster charge according to  claim 16 , wherein the booster charge is made of a liquid-impermeable material. 
     
     
         18 . The detonator-sensitive booster charge according to  claim 17 , wherein the booster charge exhibits a concave curvature arranged on an opposite side of the receptacle for the ignition device. 
     
     
         19 . The detonator-sensitive booster charge according to  claim 18 , wherein the concave curvature comprises a metallic coating. 
     
     
         20 . The detonator-sensitive booster charge according to  claim 16 , wherein the ignition device comprises a blasting cap, a detonating cord, or a non-electric detonator. 
     
     
         21 . The detonator-sensitive booster charge according to  claim 16 , wherein the hollow glass microsphere has a grain size of 20-200 μm. 
     
     
         22 . The detonator-sensitive booster charge according to  claim 18 , wherein the mixture comprises between 85% by weight and 98.3% by weight nitromethane, between 1.5% by weight and 10% by weight fumed silica, and between 0.2% by weight and 10% by weight cavity-forming means comprising a plurality of hollow glass microspheres. 
     
     
         23 . The detonator-sensitive booster charge according to  claim 17 , wherein the mixture comprises 92.5% by weight nitromethane, 6.5% by weight fumed silica, and 1% weight cavity-forming means comprising a plurality of hollow glass microspheres, wherein the hollow glass microspheres have a grain size of substantially 100 μm and. 
     
     
         24 . The detonator-sensitive booster charge according to  claim 16 , further comprising an oxygen-containing compound selected from the nitrates group. 
     
     
         25 . The detonator-sensitive booster charge according to  claim 21 , wherein the hollow glass microspheres have a grain size of between 40-150 μm. 
     
     
         26 . The detonator-sensitive booster charge according to  claim 21 , wherein the hollow glass microspheres have a grain size of between 80-120 μm. 
     
     
         27 . The detonator-sensitive booster charge according to  claim 22 , wherein the mixture comprises between 85% by weight and 95% by weight nitromethane, between 3% by weight and 8% by weight fumed silica, and between 0.5% by weight and 5% by weight cavity-forming means comprising a plurality of hollow glass microspheres. 
     
     
         28 . The detonator-sensitive booster charge according to  claim 27 , wherein the mixture comprises between 91% by weight and 93% by weight nitromethane, between 5% by weight and 7% by weight fumed silica, and between 0.8% by weight and 2% by weight cavity-forming means comprising a plurality of hollow glass microspheres.