Substrate processing apparatus and substrate processing method

Abstract

There is provided a substrate processing apparatus comprising a liquid amount detecting part configured to detect a liquid amount of a liquid film formed on a substrate; and a coating state detecting part configured to detect a coating state of the substrate with the liquid film formed thereon.

What is claimed is: 
     
         1 . A substrate processing apparatus comprising:
 a liquid amount detecting part configured to detect a liquid amount of a liquid film formed on a substrate; and   a coating state detecting part configured to detect a coating state of the substrate with the liquid film formed thereon.   
     
     
         2 . The substrate processing apparatus of  claim 1 , further comprising: a drying part configured to perform a drying process on the substrate on which the liquid film is formed. 
     
     
         3 . The substrate processing apparatus of  claim 2 , wherein the liquid amount detecting part is configured to detect the liquid amount before the substrate is transferred to the drying part. 
     
     
         4 . The substrate processing apparatus of  claim 2 , wherein the liquid amount detecting part is configured to detect the liquid amount after the substrate is transferred to the drying part. 
     
     
         5 . The substrate processing apparatus of  claim 2 , wherein the coating state detecting part is configured to detect the coating state before the substrate is transferred to the drying part. 
     
     
         6 . The substrate processing apparatus of  claim 1 , wherein the coating state detecting part is configured to detect the coating state using an imaging device. 
     
     
         7 . The substrate processing apparatus of  claim 6 , further comprising:
 a laser irradiation part configured to irradiate a laser beam to the substrate on which the liquid film is formed; and   a screen configured to have a reflected beam, which is generated when the laser beam is reflected at the substrate, projected onto the screen,   wherein the imaging device is configured to pick up the reflected beam projected onto the screen, and   the coating state detecting part is configured to detect the coating state based on an image data obtained by the imaging device.   
     
     
         8 . The substrate processing apparatus of  claim 6 , further comprising: an irradiation part configured to irradiate a monochromatic beam to the substrate on which the liquid film is formed,
 wherein the imaging device is configured to pick up an image of the substrate to which the monochromatic beam is irradiated, and   the coating state detecting part is configured to detect the coating state based on an image data obtained by the imaging device.   
     
     
         9 . The substrate processing apparatus of  claim 1 , wherein the coating state detecting part is configured to detect the coating state using an infrared sensor. 
     
     
         10 . A substrate processing method, comprising:
 detecting a coating state of a substrate with a liquid film formed thereon;   detecting a liquid amount of the liquid film when the coating state is a predetermined state in which the liquid film covers a pattern of the substrate; and   performing a drying process on the substrate when the liquid amount falls within a preset range.   
     
     
         11 . The substrate processing method of  claim 10 , further comprising: regulating a supply amount of a liquid that forms the liquid film when the coating state is not the predetermined state or when the liquid amount is outside of the preset range. 
     
     
         12 . A substrate processing method, comprising:
 detecting a first weight of a substrate having a surface on which a liquid film is formed before a drying process;   detecting a coating state of the substrate with the liquid film formed thereon before the drying process;   performing the drying process on the substrate on which the liquid film has been formed;   detecting a second weight of the substrate after the drying process; and   detecting a state of the surface of the substrate after the drying process.