High purity metallic top coat for semiconductor manufacturing components

Abstract

An article comprises a component for a manufacturing chamber, a coating on the component, and an anodization layer formed on the coating. The anodization layer has a thickness of about 2-10 mil, comprises a low porosity layer portion having a density of greater than 99% and a porous columnar layer portion having a higher porosity than the low porosity layer portion. The porous columnar layer portion comprises a plurality of columnar nanopores having a diameter of about 10-50 nm.

What is claimed is: 
     
         1 . An article comprising:
 a component for a manufacturing chamber;   a coating on the component; and   an anodization layer formed on the coating, the anodization layer having a thickness of about 2-10 mil, wherein the anodization layer comprises a low porosity layer portion having a density of greater than 99% and a porous columnar layer portion having a higher porosity than the low porosity layer portion and comprising a plurality of columnar nanopores having a diameter of about 10-50 nm.   
     
     
         2 . The article of  claim 1 , wherein the coating has an average surface roughness of less than about 20 micro-inch. 
     
     
         3 . The article of  claim 1 , wherein the article further comprises a barrier layer between the component and the coating. 
     
     
         4 . The article of  claim 3 , wherein the barrier layer has a thickness in a range of about 0.1-5.0 microns. 
     
     
         5 . The article of  claim 3 , wherein the article comprises a first one of Aluminum or Titanium, wherein the coating comprises a second one of Aluminum or Titanium, and wherein the barrier layer comprises a solid solution of Aluminum and Titanium. 
     
     
         6 . The article of  claim 1 , wherein the component comprises at least one of Aluminum, an Aluminum alloy, stainless steel, Titanium, a Titanium alloy, Magnesium, or a Magnesium alloy. 
     
     
         7 . The article of  claim 1 , wherein the coating comprises Aluminum, an Aluminum alloy, Titanium, a Titanium alloy, Niobium, a Niobium alloy, Zirconium, a Zirconium alloy, Copper, or a Copper alloy. 
     
     
         8 . The article of  claim 1 , wherein the porous columnar layer portion has a porosity of about 40-50%. 
     
     
         9 . The article of  claim 1 , wherein the component has an average surface roughness of about 120 micro-inches. 
     
     
         10 . The article of  claim 1 , wherein the coating comprises a gradient of a first metal and a second metal. 
     
     
         11 . The article of  claim 1 , wherein the coating has a thickness of about 0.2-5.0 mm. 
     
     
         12 . The article of  claim 1 , wherein the coating is devoid of oxide inclusions. 
     
     
         13 . The article of  claim 1 , wherein the component is a showerhead, a cathode sleeve, a sleeve liner door, a cathode base, a chamber line, or an electrostatic chuck base. 
     
     
         14 . An article comprising a component of a manufacturing chamber, a coating on a surface of the component, and an anodization layer on the coating, the article having been manufactured by a process comprising:
 depositing a coating onto the surface of the article; and   anodizing the coating to form the anodization layer, the anodization layer having a thickness of about 2-10 mil, wherein anodizing the coating comprises:   applying a first current density during a start of the anodizing to form a low porosity layer portion of the anodization layer, the low porosity layer portion having a density of greater than about 99%; and   applying a second current density that is lower than the first current density during a remainder of the anodizing to form a porous columnar layer portion of the anodization layer, the porous columnar layer portion having a higher porosity than the low porosity layer portion and comprising a plurality of columnar nanopores having a diameter of about 10-50 nm.   
     
     
         15 . The article of  claim 14 , wherein the porous columnar layer portion of the anodization layer has a porosity of about 40-50%. 
     
     
         16 . A method comprising:
 cold spray coating a metal powder onto an article to form a coating on the article; and   anodizing the coating to form an anodization layer having a thickness of about 2-10 mil, wherein anodizing the coating comprises:
 applying a first current density during a start of the anodizing to form a low porosity layer portion of the anodization layer, the low porosity layer portion having a density of greater than 99%; and 
 applying a second current density that is lower than the first current density during a remainder of the anodizing to form a porous columnar layer portion of the anodization layer over the low porosity layer portion, the porous columnar layer portion comprising a plurality of columnar nanopores having a diameter of about 10-50 nm, 
   
     
     
         17 . The method of  claim 16 , wherein the porous columnar layer portion has a porosity of about 40-50%. 
     
     
         18 . The method of  claim 16 , further comprising:
 performing chemical mechanical polishing (CMP) of the coating to cause the coating to have an average surface roughness of less than about 20 micro-inch prior to anodizing the coating.   
     
     
         19 . The method of  claim 16 , further comprising:
 forming a barrier layer between the article and the coating by heating the article after the cold spray coating to a temperature in a range from about 200 degrees C. to about 1450 degrees C. for more than about 30 minutes, wherein the barrier layer has a thickness of about 0.5-5.0 microns.   
     
     
         20 . The method of  claim 16 , wherein the coating comprises a mixture of a first metal and a second metal, and wherein depositing the coating comprises adjusting a percentage of the first metal and the second metal to cause the coating to have a gradient of the first metal and the second metal.