Antireflective film, method of producing antireflective film, and eyeglass type display

Abstract

The present invention is an antireflective film, including: a support base, and a pattern composed of a photoresist material formed on the support base, the pattern having a larger size at a point closer to the support base. The present invention provides an antireflective film that is able to give antireflection effect to decrease the reflection of light, a method of producing the same, and an eyeglass type display.

1 . An antireflective film, comprising:
 a support base, and   a pattern composed of a photoresist material formed on the support base, the pattern having a larger size at a point closer to the support base.   
     
     
         2 . The antireflective film according to  claim 1 , wherein the pattern has a pitch of 400 nm or less. 
     
     
         3 . The antireflective film according to  claim 1 , wherein the photoresist material contains a polymer compound having an aromatic group. 
     
     
         4 . The antireflective film according to  claim 2 , wherein the photoresist material contains a polymer compound having an aromatic group. 
     
     
         5 . The antireflective film according to  claim 1 , wherein the photoresist material contains a polymer compound that contains 85% or more of a repeating unit having at least one structure selected from the group consisting of naphthalene, fluorene, anthracene, and cyclopentadienyl complexes. 
     
     
         6 . The antireflective film according to  claim 2 , wherein the photoresist material contains a polymer compound that contains 85% or more of a repeating unit having at least one structure selected from the group consisting of naphthalene, fluorene, anthracene, and cyclopentadienyl complexes. 
     
     
         7 . The antireflective film according to  claim 1 , wherein the photoresist material contains a polymer compound that contains 50% or more of a repeating unit having any of styrene substituted with iodine or bromine, benzene (meth)acrylate substituted with iodine or bromine, and benzene (meth)acrylamide substituted with iodine or bromine. 
     
     
         8 . The antireflective film according to  claim 2 , wherein the photoresist material contains a polymer compound that contains 50% or more of a repeating unit having any of styrene substituted with iodine or bromine, benzene (meth)acrylate substituted with iodine or bromine, and benzene (meth)acrylamide substituted with iodine or bromine. 
     
     
         9 . The antireflective film according to  claim 1 , wherein the photoresist material has a refractive index of 1.6 or more with respect to visible light having a wavelength of 590 to 610 nm. 
     
     
         10 . The antireflective film according to  claim 1 , wherein the pattern is covered with a low-refractive-index material having a refractive index of 1.45 or less with respect to visible light having a wavelength of 590 to 610 nm. 
     
     
         11 . The antireflective film according to  claim 1 , wherein the transmittance of visible light having a wavelength of 400 to 800 nm is 80% or more. 
     
     
         12 . An eyeglass type display, comprising:
 a self-emitting display selected from the group consisting of liquid crystal, organic EL, and micro LED installed on a substrate at the side of an eyeball of the eyeglass type display, and   a convex lens for focusing installed on the side of an eyeball of the self-emitting display,   wherein the antireflective film according to  claim 1  is formed on a surface of the convex lens.   
     
     
         13 . A method of producing an antireflective film, comprising:
 coating a support base with a photoresist material, and   exposing and developing the photoresist material to form a pattern having a larger size at a point closer to the support base.   
     
     
         14 . The method of producing an antireflective film according to  claim 13 , further comprising:
 forming an organic film as the support base on a substrate using an organic film-forming composition, wherein the pattern is formed on the organic film using the photoresist material.   
     
     
         15 . The method of producing an antireflective film according to  claim 13 , wherein the pattern has a pitch of 400 nm or less. 
     
     
         16 . The method of producing an antireflective film according to  claim 13 , wherein the photoresist material contains a polymer compound having an aromatic group. 
     
     
         17 . The method of producing an antireflective film according to  claim 13 , wherein the photoresist material contains a polymer compound that contains 85% or more of a repeating unit having at least one structure selected from the group consisting of naphthalene, fluorene, anthracene, and cyclopentadienyl complexes. 
     
     
         18 . The method of producing an antireflective film according to  claim 13 , wherein the photoresist material contains a polymer compound that contains 50% or more of a repeating unit having any of styrene substituted with iodine or bromine, benzene (meth)acrylate substituted with iodine or bromine, and benzene (meth)acrylamide substituted with iodine or bromine. 
     
     
         19 . The method of producing an antireflective film according to  claim 13 , wherein the photoresist material has a refractive index of 1.6 or more with respect to visible light having a wavelength of 590 to 610 nm. 
     
     
         20 . The method of producing an antireflective film according to  claim 13 , further comprising covering the formed pattern with a low-refractive-index material having a refractive index of 1.45 or less with respect to visible light having a wavelength of 590 to 610 nm.