Pattern formation method, block copolymer, and pattern formation material

Abstract

According to one embodiment, a pattern formation method is disclosed. The method includes a preparation process, a block copolymer layer formation process, and a contact process. The preparation process includes preparing a pattern formation material including a block copolymer including a first block and a second block. The first block includes a first main chain and a plurality of first side chains. At least one of the first side chains includes a plurality of carbonyl groups. The block copolymer layer formation process includes forming a block copolymer layer on a first member. The block copolymer layer includes the pattern formation material and includes a first region and a second region. The first region includes the first block. The second region includes the second block. The contact process includes causing the block copolymer layer to contact a metal compound including a metallic element.

What is claimed is: 
     
         1 . A pattern formation method, comprising:
 a preparation process of preparing a pattern formation material including a block copolymer including a first block and a second block, the first block including a first main chain and a plurality of first side chains, at least one of the first side chains including a plurality of carbonyl groups;   a block copolymer layer formation process of forming a block copolymer layer on a first member, the block copolymer layer including the pattern formation material and including a first region and a second region, the first region including the first block, the second region including the second block; and   a contact process of causing the block copolymer layer to contact a metal compound including a metallic element.   
     
     
         2 . The method according to  claim 1 , wherein the block copolymer layer formation process includes phase separation of the first block and the second block. 
     
     
         3 . The method according to  claim 1 , wherein a direction from the first region toward the second region is along the first member. 
     
     
         4 . The method according to  claim 1 , wherein the first block includes at least one selected from the group consisting of an acrylic acid ester structure and a methacrylic acid ester structure. 
     
     
         5 . The method according to  claim 1 , wherein the first block includes at least one selected from the group consisting of acetonyl acrylic acid ester and acetonyl methacrylic acid ester. 
     
     
         6 . The method according to  claim 1 , wherein the second block includes a second main chain and a plurality of second side chains, at least one of the second side chain not including a plurality of carbonyl groups. 
     
     
         7 . The method according to  claim 1 , wherein
 the second block includes a second main chain and a plurality of second side chains, and   at least one of the second side chains includes at least one selected from the group consisting of benzene, naphthalene, and methyl.   
     
     
         8 . The method according to  claim 1 , wherein
 the second block includes a second main chain, and   the second main chain includes at least one selected from the group consisting of a double bond and an ether bond.   
     
     
         9 . The method according to  claim 1 , wherein
 the second block does not include a carbonyl group, or   the second block includes a carbonyl group, and a ratio of a concentration of the carbonyl group included in the second block to a concentration of the carbonyl group included in the first block is 0.5 or less.   
     
     
         10 . The method according to  claim 1 , wherein the contact process includes causing the block copolymer layer to contact at least one of a liquid including the metal compound or a gas including the metal compound. 
     
     
         11 . The method according to  claim 1 , wherein the metallic element includes at least one selected from the group consisting of aluminum, zinc, titanium, and tungsten. 
     
     
         12 . The method according to  claim 1 , including removing at least a portion of the second region and removing at least a portion of the first member after the contact process, the at least a portion of the first member not overlapping the first region. 
     
     
         13 . A block copolymer, comprising:
 a first block; and   a second block,   the first block including a first main chain and a plurality of first side chains,   at least one of the first side chains including a plurality of carbonyl groups,   a number of carbon atoms included in the at least one of the first side chains being not less than 3 but less than 7,   a number of oxygen atoms included in the at least one of the first side chains being not less than 2 but less than 5,   a terminal of the at least one of the first side chains being a hydrocarbon.   
     
     
         14 . The block copolymer according to  claim 13 , wherein the first block includes at least one selected from the group consisting of an acrylic acid ester structure and a methacrylic acid ester structure. 
     
     
         15 . The block copolymer according to  claim 13 , wherein the first block includes at least one selected from the group consisting of acetonyl acrylic acid ester and acetonyl methacrylic acid ester. 
     
     
         16 . The block copolymer according to  claim 13 , wherein
 the second block includes a second main chain and a plurality of second side chains, and   at least one of the second side chains does not include a plurality of carbonyl groups.   
     
     
         17 . The block copolymer according to  claim 13 , wherein
 the second block includes a second main chain and a plurality of second side chains, and   at least one of the second side chains includes at least one selected from the group consisting of benzene, naphthalene, and methyl.   
     
     
         18 . The block copolymer according to  claim 13 , wherein
 the second block includes a second main chain, and   the second main chain includes at least one selected from the group consisting of a double bond and an ether bond.   
     
     
         19 . The block copolymer according to  claim 13 , wherein
 the second block does not include a carbonyl group, or   the second block includes a carbonyl group, and a ratio of a concentration of the carbonyl group included in the second block to a concentration of the carbonyl group included in the first block is 0.5 or less.   
     
     
         20 . A pattern formation material, comprising:
 the block copolymer according to  claim 13 ; and   a solvent.