US2019157125A1PendingUtilityA1
Wafer carrier having thermal cover for chemical vapor deposition systems
Est. expiryDec 26, 2033(~7.4 yrs left)· nominal 20-yr term from priority
H10P 72/7621H10P 72/7618H10P 72/7611H10P 72/16Y10T29/49837C23C 16/46H01L 21/68735H01L 21/68764H01L 21/67333Y10T29/49826C23C 16/4584H01L 21/68771
55
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Claims
Abstract
The invention relates generally to semiconductor fabrication technology and, more particularly, to chemical vapor deposition (CVD) processing and associated apparatus for addressing temperature non-uniformities on semiconductor wafer surfaces. Embodiments include a wafer carrier for use in a system for growing epitaxial layers on one or more wafers by CVD, the wafer carrier comprising a top plate and base plate which function coordinately to reduce temperature variability caused during CVD processing.
Claims
exact text as granted — not AI-modified1 - 16 . (canceled)
17 . A method for reducing temperature non-uniformities affecting a characteristic of a device formed in a chemical vapor deposition (CVD) tool, the method comprising:
forming a base plate that includes surface portions arranged to support each of a plurality of wafers, forming a top plate having a size and shape that fits over portions of the base plate that do not reside beneath any of the plurality of wafers; removably securing the top plate to the bottom plate to produce a relative arrangement of the base plate, top plate, and the plurality of wafers in which a more uniform thermal insulating characteristic over the surface of each one of the plurality of wafers during CVD processing is provided compared to an arrangement lacking the top plate.
18 . The method of claim 17 , wherein forming the top plate includes forming a unitary member that includes a plurality of apertures sized and positioned to accept a the plurality of wafers.
19 . The method of claim 17 , wherein removably securing the top plate to the bottom plate includes securing the top plate and the bottom plate using a plurality of staples.
20 . The method of claim 17 , wherein forming the top plate includes forming a plurality of individual segments, each of which is contoured to fit in a corresponding region over the top plate between the plurality of wafers.Join the waitlist — get patent alerts
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