Substrate processing apparatus and substrate processing method

Abstract

A substrate processing apparatus includes a substrate holding part, a substrate rotating mechanism, and a chamber. The substrate rotating mechanism incudes an annular rotor part disposed in an internal space of the chamber and a stator part disposed around the rotor part outside the chamber. The substrate holding part is attached to the rotor part in the internal space of the chamber. In the substrate rotating mechanism, a rotating force is generated about a central axis between the stator part and the rotor part. The rotor part is thereby rotated about the central axis, being in a floating state, together with a substrate and the substrate holding part. In the substrate processing apparatus, the substrate can be easily rotated in the internal space having excellent sealability. As a result, it is possible to easily perform single-substrate processing in a sealed internal space.

1 . A substrate processing apparatus for processing a substrate, comprising:
 a chamber having a chamber body and a chamber cover and forming an internal space which is sealed by closing an upper opening of said chamber body by said chamber cover;   a substrate holding part disposed in said internal space of said chamber, for holding a substrate horizontally;   a substrate rotating mechanism for rotating said substrate together with said substrate holding part about a central axis oriented in a vertical direction;   a processing liquid discharge part for discharging a processing liquid supplied onto said substrate to the outside of said chamber;   a processing liquid supply part for supplying said processing liquid onto said substrate in said internal space;   a gas supply part for supplying gas into said internal space;   a buffer tank connected to said internal space through a connecting pipe, for temporarily pooling said processing liquid led from said internal space, in which gas is always continuous with said gas in said internal space with gas in said connecting pipe interposed therebetween;   a gas discharge part for discharging said gas from said buffer tank; and   a pressure control part for controlling a pressure in said internal space of said chamber by controlling said gas supply part and said gas discharge part,   wherein said substrate rotating mechanism comprises:   an annular rotor part disposed in said internal space of said chamber, to which said substrate holding part is attached; and   a stator part disposed around said rotor part outside said chamber, for generating a rotating force between itself and said rotor part, and   said processing liquid discharge part discharges said processing liquid pooled in said buffer tank.   
     
     
         2 . The substrate processing apparatus according to  claim 1 , wherein
 said processing liquid is guided from said internal space to said buffer tank through said connecting pipe.   
     
     
         3 . The substrate processing apparatus according to  claim 2 , wherein
 said gas discharge part comprises:   a slow leak part connected to said buffer tank, for discharging gas from said buffer tank while maintaining said internal space of said chamber at a pressurized atmosphere; and   a forced exhaust part connected to said buffer tank in parallel with said slow leak part, for forcedly discharging said gas from said buffer tank, to thereby bring said internal space of said chamber into a reduced pressure atmosphere.   
     
     
         4 . The substrate processing apparatus according to  claim 3 , wherein
 said connecting pipe is provided with a connection valve, and   under the control of said pressure control part, said forced exhaust part is driven with said connection valve closed, to thereby bring the inside of said buffer tank into a reduced pressure atmosphere, and then said forced exhaust part is driven with said connection valve opened, to thereby also bring said internal space of said chamber into a reduced pressure atmosphere.   
     
     
         5 . The substrate processing apparatus according to  claim 1 , wherein
 said rotor part rotates, being in a floating state in said internal space, by magnetic force exerted between itself and said stator part.   
     
     
         6 . A substrate processing method of processing a substrate, comprising:
 a) supplying and pooling a processing liquid into a chamber while a substrate holding part disposed in an internal space sealed inside said chamber does not hold any substrate; and   b) cleaning the inside of said chamber by rotating said substrate holding part while immersing at least part of said substrate holding part into said processing liquid in said internal space.