Exposure apparatus, exposure method, and method for producing device

Abstract

Exposure apparatus exposes a substrate by irradiating the substrate with exposure light via a projection optical system and a liquid. The exposure apparatus is provided with a liquid immersion mechanism for supplying the liquid and recovering the liquid. The liquid immersion mechanism has an inclined surface, which is opposite to a surface of the substrate and is inclined with respect to the surface of the substrate, and a liquid recovering port of the liquid immersion mechanism is formed in the inclined surface. A flat portion is provided between the substrate and the projection optical system. A liquid immersion area can be maintained to be small.

1 . An exposure apparatus in which a substrate is exposed by radiating an exposure light beam onto the substrate through liquid, the exposure apparatus comprising:
 a projection system having a final optical element, the final optical element having a first surface via which the exposure light beam is emitted and a second surface on which the exposure light beam is incident, and a side surface extending upwardly and radially-outwardly from the first surface; and   a nozzle member having a circular opening through which the exposure light beam passes, the nozzle member having a lower surface which is arranged to surround the opening, the nozzle member having a liquid recovery port which is arranged to surround the lower surface, and the lower surface and the liquid recovery port being arranged such that a surface of the substrate faces the lower surface and the recovery port,   wherein:   the second surface of the final optical element is convex,   a gap is formed between the side surface of the final optical element and the nozzle member, and   the lower surface of the nozzle member is positioned lower than the end surface of the final optical element.   
     
     
         2 . The apparatus according to  claim 1 , wherein the opening of the nozzle member is substantially the same size as the first surface of the final optical element of the projection system. 
     
     
         3 . The apparatus according to  claim 1 , further comprising a supporting member by which the final optical element is supported,
 wherein:   the final optical element has a flange portion at which the final optical element is supported by the supporting member, and   the flange portion is above the gap.   
     
     
         4 . The apparatus according to  claim 3 , wherein:
 the flange portion has a lower surface facing downward, and   the supporting member supports the lower surface of the flange portion.   
     
     
         5 . The apparatus according to  claim 1 , wherein a liquid immersion area is formed on a portion of the surface of the substrate, while supplying the liquid from a liquid supply port and recovering the liquid from the liquid recovery port. 
     
     
         6 . The apparatus according to  claim 5 , wherein the liquid supply port supplies a gas after the liquid supply from the liquid supply port is stopped. 
     
     
         7 . A device manufacturing method comprising:
 exposing a substrate by the exposure apparatus of  claim 1 , and   processing the exposed substrate.