US2019121246A1PendingUtilityA1

Exposure apparatus, method for producing device, and method for controlling exposure apparatus

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Assignee: NIKON CORPPriority: Jul 28, 2003Filed: Dec 18, 2018Published: Apr 25, 2019
Est. expiryJul 28, 2023(expired)· nominal 20-yr term from priority
Inventors:Nobutaka MagomeNaoyuki Kobayashi
G03F 7/70341G03F 7/709G03F 7/70858G03F 7/70525G03F 7/70866G03F 7/70725G03F 7/7085G03F 7/70533G03F 7/706851G03F 7/707G03F 7/2041
69
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Claims

Abstract

A liquid immersion exposure apparatus includes a movable stage configured to move below and relative to a projection system, a liquid supply inlet and a first liquid collection outlet, the movable stage having a second liquid collection outlet. A first measurement system is provided downstream of the first liquid collection outlet and measures an amount of liquid collected via the first liquid collection outlet. A second measurement system is provided downstream of the second liquid collection outlet and measures an amount of liquid collected via the second liquid collection outlet. A substrate held on the movable stage is exposed with an exposure beam from the projection system via liquid in a liquid immersion area which covers a portion of an upper surface of the substrate and which is formed while performing liquid supply via the liquid supply inlet and liquid collection via the first liquid collection outlet.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
         1 . A liquid immersion exposure apparatus, comprising:
 a projection system;   a liquid supply inlet;   a first liquid collection outlet;   a second liquid collection outlet;   a movable stage configured to move below and relative to the projection system, the liquid supply inlet and the first liquid collection outlet, the movable stage having the second liquid collection outlet;   a first measurement system provided downstream of the first liquid collection outlet, which measures an amount of liquid collected via the first liquid collection outlet; and   a second measurement system provided downstream of the second liquid collection outlet, which measures an amount of liquid collected via the second liquid collection outlet,   wherein a substrate held on the movable stage is exposed with an exposure beam from the projection system via liquid in a liquid immersion area which covers a portion of an upper surface of the substrate and which is formed while performing liquid supply via the liquid supply inlet and performing the liquid collection via the first liquid collection outlet.   
     
     
         2 . The apparatus according to  claim 1 , wherein the first measurement system includes a flow-meter. 
     
     
         3 . The apparatus according to  claim 1 , wherein the second measurement system includes a flow-meter.

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