Exposure apparatus, exposure method, and method for producing device

Abstract

A liquid immersion exposure apparatus includes a projection system, an immersion area forming member having a liquid supply inlet, a liquid recovery outlet and an opening through which an exposure beam is projected, and a substrate stage having a substrate holding portion on which the substrate is held and a stage member having an upper surface provided adjacent to the upper surface of the held substrate with a gap therebetween. A portion of a liquid immersion area is formed by the immersion area forming member on the upper surface of the held substrate and another portion of the liquid immersion area is formed on the upper surface of the stage member when exposing an edge portion of the upper surface of the substrate with exposure light via liquid in the liquid immersion area.

What is claimed is: 
     
         1 . A liquid immersion exposure apparatus comprising:
 a projection system;   an immersion area forming member having a liquid supply inlet and a liquid recovery outlet, the immersion area forming member having an opening through which an exposure beam is projected, the immersion area forming member forming a liquid immersion area on a portion of an upper surface of a substrate during exposure of the substrate; and   a substrate stage which is provided with a substrate holding portion on which the substrate is held and is provided with a stage member having an upper surface, the upper surface of the stage member being provided adjacent to the upper surface of the held substrate with a gap, wherein   the substrate stage is movable below the projection system and the immersion area forming member, and   a portion of the liquid immersion area is formed on the upper surface of the substrate held and another portion of the liquid immersion area is formed on the upper surface of the stage member, when exposing an edge portion of the upper surface of the substrate with exposure light via liquid in the liquid immersion area.