Movable body drive method, movable body drive system, pattern formation method, pattern forming apparatus, exposure method, exposure apparatus, and device manufacturing method

Abstract

In an exposure apparatus that has an illumination optical system to illuminate a mask with an illumination light and a projection optical system to project a pattern image of the illuminated mask onto a substrate, first and second movable bodies, respectively holding the mask and the substrate, are moved based on measurement information of first and the second encoder systems so that, in an exposure operation of the substrate, scanning exposure in which the mask and the substrate are each moved relative to the illumination light is performed with a first direction within the predetermined plane serving as a scanning direction while compensating for a measurement error of the second encoder system that occurs due to at least one of tilt of the second head of the second encoder system and tilt in telecentricity of the second head.

What is claimed is: 
     
         1 . An exposure apparatus that has an illumination optical system to illuminate a mask with an illumination light and a projection optical system to project a pattern image of the illuminated mask onto a substrate, the apparatus comprising:
 a body having a frame member and a first base member, the frame member supporting the projection optical system, and the first base member being disposed above the projection optical system and having an opening through which the illumination light passes;   a first stage system having a first movable body and a first motor, the first movable body being disposed on the first base member and configured to hold the mask in a recessed portion, and the first motor being configured to drive the first movable body;   a first encoder system in which one of a first grating section and first heads is provided at the first movable body, and which measures positional information of the first movable body with a plurality of the first heads that each irradiate a reflective grating of the first grating section with a first measurement beam;   a second base member disposed below the projection optical system;   a second stage system having a plurality of second movable bodies and a second motor, the plurality of second movable bodies being disposed on the second base member and each configured to hold a substrate, and the second motor being configured to drive the plurality of second movable bodies;   a second encoder system that has a plurality of second heads and measures positional information of the second movable bodies, the plurality of second heads each irradiating a second grating section having a reflective grating with a second measurement beam, and the second grating section being disposed substantially parallel to a predetermined plane that is orthogonal to an optical axis of the projection optical system; and   a controller coupled to the first and the second stage systems and the first and the second encoder systems, the controller controlling the first and the second motors based on measurement information of the first and the second encoder systems so that, in an exposure operation of the substrate, scanning exposure in which the mask and the substrate are each moved relative to the illumination light is performed with a first direction within the predetermined plane serving as a scanning direction,   wherein the controller compensates for a measurement error of the second encoder system that occurs due to at least one of tilt of the second head and tilt in telecentricity of the second head.   
     
     
         2 . The exposure apparatus according to  claim 1 , wherein
 the second grating section has four second scale members in each of which the reflective grating is formed, and   the controller compensates for the measurement error of the second encoder system that occurs due to displacement of the second grating section.   
     
     
         3 . The exposure apparatus according to  claim 1 , wherein
 in the first encoder system, one of the first grating section and the first heads is provided at the frame member and the other of the first grating section and the first heads is provided at the first movable body.   
     
     
         4 . The exposure apparatus according to  claim 1 , wherein
 the first grating section has a pair of first scale members that are disposed on both sides of an illumination area of the mask, irradiated with the illumination light, in a second direction orthogonal to the first direction within the predetermined plane.   
     
     
         5 . The exposure apparatus according to  claim 4 , wherein
 the plurality of first heads include at least two first heads at least one each of which is disposed on each of both sides of the illumination area in the second direction so that the pair of first scale members are each irradiated with the first measurement beam.   
     
     
         6 . The exposure apparatus according to  claim 5 , wherein
 the plurality of first heads include at least three first heads used in the scanning exposure, and   the at least three first heads include at least two first heads disposed on one side of the illumination area in the second direction and different from each other in position in the first direction, and at least one first head disposed on the other side of the illumination area in the second direction.   
     
     
         7 . The exposure apparatus according to  claim 6 , wherein
 the plurality of first heads include at least one first head that is used in an operation different from the exposure operation, and is different from the at least three first heads used in the scanning exposure.   
     
     
         8 . The exposure apparatus according to  claim 6 , wherein
 in an exchange operation of the mask held by the first movable body, at least one first head that is disposed farther from the illumination area in the first direction than the at least three first heads used in the scanning exposure is used, the exchange operation being performed at a position spaced from the illumination area in the first direction.   
     
     
         9 . The exposure apparatus according to  claim 6 , wherein
 the plurality of first heads include at least one first head that is switched from one of a state and another state to the other of the state and the another state as the first movable body is moved in the first direction, in the state the first measurement beam being irradiated on the reflective grating, and in the another state the first measurement beam moving off from the reflective grating.   
     
     
         10 . The exposure apparatus according to  claim 6 , further comprising:
 a first detection system that detects a mark of the mask or a mark of the first movable body, wherein   in each of the exposure operation and a detection operation of the mark by the first detection system, the positional information of the first movable body is measured by the first encoder system.   
     
     
         11 . The exposure apparatus according to  claim 10 , wherein
 in an exchange operation of the mask held by the first movable body, the positional information of the first movable body is measured by the first encoder system.   
     
     
         12 . The exposure apparatus according to  claim 1 , further comprising:
 a second detection system that is disposed spaced from the projection optical system, and detects a mark of the substrate or a mark of the second movable body, wherein   in each of the exposure operation and a detection operation of the mark by the second detection system, the positional information of the second movable body is measured by the second encoder system.   
     
     
         13 . The exposure apparatus according to  claim 12 , wherein
 in an exchange operation of a substrate held by the second movable body, the positional information of the second movable body is measured by the second encoder system.   
     
     
         14 . The exposure apparatus according to  claim 12 , wherein
 the positional information of the second movable body is measured by three or four of the second heads that face the second grating section, of the plurality of second heads, and   the second heads that face the second grating section is changed from one of the three second heads and the four second heads to the other of the three second heads and the four second heads, as the second movable body is moved in a direction parallel to the predetermined plane.   
     
     
         15 . The exposure apparatus according to  claim 14 , wherein
 the second grating section has four second scale members in each of which the reflective grating is formed, and   the positional information of the second movable body is measured by three or four of the second heads that face three or four of the four second scale members, respectively.   
     
     
         16 . The exposure apparatus according to  claim 15 , wherein
 in the exposure operation, a relationship between the second grating section and the second heads is changed between a first state and a second state, as the second movable body is moved in the direction parallel to the predetermined plane, wherein   in the first state, the four second scale members and the four second heads face each other, respectively, and   in the second state, the three second scale members and the three second heads face each other, respectively.   
     
     
         17 . A device manufacturing method, including:
 a lithography process of transferring a pattern onto a substrate using the exposure apparatus according to  claim 1 .   
     
     
         18 . An exposure method of illuminating a mask with an illumination light and exposing a substrate with the illumination light via a projection optical system, the method comprising:
 moving a first movable body that holds the mask in a recessed portion, on a first base member disposed above the projection optical system and having an opening through which the illumination light passes;   in a first encoder system in which one of a first grating section and first heads is provided at the first movable body, measuring positional information of the first movable body, with a plurality of the first heads that each irradiate a reflective grating of the first grating section with a first measurement beam;   moving a plurality of second movable bodies that each are configured to hold the substrate, on a second base member disposed below the projection optical system;   measuring positional information of the second movable bodies, with a second encoder system that has a plurality of second heads, the plurality of second heads each irradiating a second grating section having a reflective grating with a second measurement beam, and the second grating section being disposed substantially parallel to a predetermined plane that is orthogonal to an optical axis of the projection optical system;   moving the first and the second movable bodies based on measurement information of the first and the second encoder systems so that, in an exposure operation of the substrate, scanning exposure in which the mask and the substrate are each moved relative to the illumination light is performed with a first direction within the predetermined plane serving as a scanning direction; and   compensating for a measurement error of the second encoder system that occurs due to at least one of tilt of the second head and tilt in telecentricity of the second head.   
     
     
         19 . The exposure method according to  claim 18 , wherein
 the second grating section has four second scale members in each of which the reflective grating is formed, and   the measurement error of the second encoder system that occurs due to displacement of the second grating section is compensated for.   
     
     
         20 . The exposure method according to  claim 18 , wherein
 the first grating section has a pair of first scale members that are disposed on both sides of an illumination area of the mask, irradiated with the illumination light, in a second direction orthogonal to the first direction within the predetermined plane, and   the plurality of first heads include at least two first heads at least one each of which is disposed on each of both sides of the illumination area in the second direction so that the pair of first scale members are each irradiated with the first measurement beam.   
     
     
         21 . The exposure method according to  claim 20 , wherein
 the plurality of first heads include at least three first heads used in the scanning exposure, and   the at least three first heads include at least two first heads disposed on one side of the illumination area in the second direction and different from each other in position in the first direction, and at least one first head disposed on the other side of the illumination area in the second direction.   
     
     
         22 . The exposure method according to  claim 21 , wherein
 in an exchange operation of the mask held by the first movable body, at least one first head that is disposed farther from the illumination area in the first direction than the at least three first heads used in the scanning exposure is used, the exchange operation being performed at a position spaced from the illumination area in the first direction.   
     
     
         23 . The exposure method according to  claim 21 , wherein
 the plurality of first heads include at least one first head that is switched from one of a state and another state to the other of the state and the another state as the first movable body is moved in the first direction, in the state the first measurement beam being irradiated on the reflective grating, and in the another state the first measurement beam moving off from the reflective grating.   
     
     
         24 . The exposure method according to  claim 21 , wherein
 in each of the exposure operation and a detection operation of a mark of the mask or a mark of the first movable body by a first detection system that detects the mark, the positional information of the first movable body is measured by the first encoder system.   
     
     
         25 . The exposure method according to  claim 18 , wherein
 in each of the exposure operation and a detection operation of a mark of the substrate or a mark of the second movable body by a second detection system, the positional information of the second movable body is measured by the second encoder system, the second detection system being disposed spaced from the projection optical system and measuring the mark.   
     
     
         26 . The exposure method according to  claim 25 , wherein
 in an exchange operation of a substrate held by the second movable body, the positional information of the second movable body is measured by the second encoder system.   
     
     
         27 . The exposure method according to  claim 25 , wherein
 the positional information of the second movable body is measured by three or four of the second heads that face the second grating section, of the plurality of second heads, and   the second heads that face the second grating section is changed from one of the three second heads and the four second heads to the other of the three second heads and the four second heads, as the second movable body is moved in a direction parallel to the predetermined plane.   
     
     
         28 . The exposure method according to  claim 27 , wherein
 the second grating section has four second scale members in each of which the reflective grating is formed, and   the positional information of the second movable body is measured by three or four of the second heads that face three or four of the four second scale members, respectively.   
     
     
         29 . The exposure method according to  claim 28 , wherein
 in the exposure operation, a relationship between the second grating section and the second heads is changed between a first state and a second state, as the second movable body is moved in the direction parallel to the predetermined plane, wherein   in the first state, the four second scale members and the four second heads face each other, respectively, and   in the second state, the three second scale members and the three second heads face each other, respectively.   
     
     
         30 . A device manufacturing method, including:
 a lithography process of transferring a pattern onto a substrate using the exposure method according to  claim 18 .   
     
     
         31 . A making method of an exposure apparatus that has an illumination optical system to illuminate a mask with an illumination light and a projection optical system to project a pattern image of the illuminated mask onto a substrate, the method comprising:
 providing a body having a frame member and a first base member, the frame member supporting the projection optical system, and the first base member being disposed above the projection optical system and having an opening through which the illumination light passes;   providing a first stage system having a first movable body and a first motor, the first movable body being disposed on the first base member and configured to hold the mask in a recessed portion, and the first motor being configured to drive the first movable body;   providing a first encoder system in which one of a first grating section and first heads is provided at the first movable body, and which measures positional information of the first movable body with a plurality of the first heads that each irradiate a reflective grating of the first grating section with a first measurement beam;   providing a second base member disposed below the projection optical system;   providing a second stage system having a plurality of second movable bodies and a second motor, the plurality of second movable bodies being disposed on the second base member and each configured to hold a substrate, and the second motor being configured to drive the plurality of second movable bodies;   providing a second encoder system that has a plurality of second heads and measures positional information of the second movable bodies, the plurality of second heads each irradiating a second grating section having a reflective grating with a second measurement beam, and the second grating section being disposed substantially parallel to a predetermined plane that is orthogonal to an optical axis of the projection optical system; and   providing a controller coupled to the first and the second stage systems and the first and the second encoder systems, the controller controlling the first and the second motors based on measurement information of the first and the second encoder systems so that, in an exposure operation of the substrate, scanning exposure in which the mask and the substrate are each moved relative to the illumination light is performed with a first direction within the predetermined plane serving as a scanning direction,   wherein the controller compensates for a measurement error of the second encoder system that occurs due to at least one of tilt of the second head and tilt in telecentricity of the second head.