Conductive material and method for manufacturing the same

Abstract

Provided is a conductive material including: a base material that is conductive at least at a surface thereof; and a titanium film on the surface of the base material, the titanium film having an average film thickness of not less than 1 μm and not more than 300 μm.

1 : A conductive material comprising:
 a base material that is conductive at least at a surface thereof; and   a titanium film on the surface of the base material, the titanium film having an average film thickness of not less than 1 μm and not more than 300 μm.   
     
     
         2 : The conductive material according to  claim 1 , wherein, when a thickness of the titanium film is measured at each of arbitrary five spots on a surface of the conductive material, a maximum thickness and a minimum thickness of the titanium film measured at each of the arbitrary five spots are within ±50% of the average film thickness. 
     
     
         3 : The conductive material according to  claim 1 , wherein
 the titanium film includes:
 a titanium layer; and 
 a titanium alloy layer containing an alloy of a metal contained in the base material and titanium, and 
   the titanium alloy layer is disposed between the titanium layer and the base material.   
     
     
         4 : A method for manufacturing the conductive material according to  claim 1 , the method comprising:
 a molten salt bath formation step of preparing a molten salt bath that contains KF, KCl, and K 2 TiF 6 ;   a dissolving step of supplying Ti to the molten salt bath to dissolve the Ti in the molten salt bath; and   an electrolyzing step of performing molten salt electrolysis using a cathode and an anode provided in the molten salt bath in which the Ti is dissolved, to electrodeposit Ti on a surface of the cathode,   in the dissolving step, Ti being supplied in at least a minimum amount necessary for Ti 4+  in the molten salt bath to become Ti 3+  by a comproportionation reaction expressed by Formula (1) below,
   3Ti 4+ +Ti metal→4Ti 3+ ,  Formula (1):
 
   in the electrolyzing step, a base material that is conductive at least at a surface thereof being used as the cathode.   
     
     
         5 : The method for manufacturing the conductive material according to  claim 4 , wherein a molar mixing ratio of the KF and the KCl is 10:90 to 90:10. 
     
     
         6 : The method for manufacturing the conductive material according to  claim 4 , wherein a K 2 TiF 6  content in the molten salt bath is not less than 0.1 mol %. 
     
     
         7 : The method for manufacturing the conductive material according to  claim 4 , wherein the Ti to be supplied in the dissolving step is a titanium sponge. 
     
     
         8 : The method for manufacturing the conductive material according to  claim 4 , wherein the anode is made of Ti.