Exposure apparatus and device fabrication method

Abstract

An exposure apparatus includes a projection system having an optical element; a substrate stage which has a holder configured to hold a substrate and which is movable below the projection system; a first nozzle member having a liquid supply port; a second nozzle member having a liquid recovery port which is arranged such that the liquid recovery port faces an upper surface of the substrate during exposure; and a driving system having a motor, which moves the second nozzle member in a direction substantially perpendicular to an optical axis of the optical element. The second nozzle member is moved based on a movement condition of the substrate stage. The substrate is exposed via liquid covering a portion of the upper surface of the substrate. The liquid supply via the liquid supply port is performed parallel to the liquid recovery via the liquid recovery port.

1 . An exposure apparatus comprising:
 a projection system having an optical element;   a substrate stage which has a holder configured to hold a substrate and which is movable below the projection system;   a first nozzle member having a liquid supply port;   a second nozzle member having a liquid recovery port which is arranged such that the liquid recovery port faces an upper surface of the substrate during exposure; and   a driving system having a motor, which moves the second nozzle member in a direction substantially perpendicular to an optical axis of the optical element,   wherein:   the second nozzle member is moved based on a movement condition of the substrate stage,   the substrate is exposed via liquid covering a portion of the upper surface of the substrate,   the liquid on the substrate is recovered via the liquid recovery port of the second nozzle member such that the liquid on the substrate covers the portion of the upper surface of the substrate, and   the liquid supply via the liquid supply port is performed parallel to the liquid recovery via the liquid recovery port.