Device of capturing sintered product after sintering waste gas in semiconductor manufacturing process

Abstract

A device of capturing a sintered product after sintering a waste gas in a semiconductor manufacturing process includes: a cover disposed at a top of a reaction chamber formed on a waste gas treatment tank; a waste gas introducing pipe and a heater respectively disposed in the reaction chamber, a waste gas reaction end being formed at the heater in the reaction chamber corresponding to an outlet of the waste gas introducing pipe; a ring-shaped water disk disposed between the cover and the waste gas treatment tank, an inlet pipe located outside of the reaction chamber being formed on the ring-shaped water disk; and a plurality of nozzles spaced apart at a circumferential distance distributed in the reaction chamber.

We claim: 
     
         1 . A device for capturing a sintered product after sintering a waste gas in a semiconductor manufacturing process, comprising:
 a cover disposed at a top of a reaction chamber formed on a waste gas treatment tank;   a waste gas introducing pipe and a heater respectively disposed in the reaction chamber, a waste gas reaction end being formed at the heater in the reaction chamber corresponding to an outlet of the waste gas introducing pipe;   a ring-shaped water disk disposed between the cover and the waste gas treatment tank, an inlet pipe located outside of the reaction chamber being formed on the ring-shaped water disk; and   a plurality of nozzles spaced apart at a circumferential distance distributed in the reaction chamber,   wherein the plurality of nozzles are disposed between the waste gas reaction end and a tank wall around the reaction chamber.   
     
     
         2 . The device for capturing a sintered product according to  claim 1 , wherein the waste gas introducing pipe and the heater are respectively disposed on the cover and inserted into the reaction chamber. 
     
     
         3 . The device for capturing a sintered product according to  claim 1 , wherein the heater is a flame heater for forming a flame vent at the waste gas reaction end to provide a flame for sintering the waste gas from the waste gas introducing pipe. 
     
     
         4 . The device for capturing a sintered product according to  claim 1 , wherein the heater is a hot rod for sintering the waste gas from the waste gas introducing pipe at the waste gas reaction end. 
     
     
         5 . The device for capturing a sintered product according to  claim 1 , wherein a water wall is formed around a tank wall of the reaction chamber, and the aerosolised water molecules are diffusion distributed between a bottom edge of a waste gas reaction end and the water wall. 
     
     
         6 . The device for capturing a sintered product according to  claim 1 , wherein a water driver is fluidly connected to the inlet pipe of the ring-shaped water disk, and the water driver comprises an aerosol generator of water molecules. 
     
     
         7 . The device for capturing a sintered product according to  claim 1 , wherein a plurality of water columns protruding from ring-shaped water disk and spaced apart at a circumferential distance, the plurality of nozzles are formed at bottom of the water columns and regarding the bottom edge of the waste gas reaction end it is a gap formed between the nozzle and the waste gas reaction end. 
     
     
         8 . The device for capturing a sintered product according to  claim 1 , wherein a water passage for fluidly connecting between the inlet pipe and the plurality of nozzles of the water columns is formed in the ring-shaped water disk. 
     
     
         9 . The device for capturing a sintered product according to  claim 1 , wherein the product comprises a SiO 2  powder, a WO 2  powder, a BO 2  powder and a F 2  gas.