Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium

Abstract

A liquid immersion member is used in a liquid immersion exposure apparatus which exposes a substrate by exposure light via a first liquid between an emitting surface of an optical member and the substrate, and is capable of forming a liquid immersion space on an object movable below the optical member. The liquid immersion member includes a first member that is disposed at at least a portion of surrounding of the optical member; a second member that is capable of being opposite to the object and is movable outside an optical path of the exposure light; and a protection part that protects the optical member. The protection part decreases a change in pressure which the optical member receives from the liquid in the liquid immersion space.

What is claimed is: 
     
         1 . A liquid immersion exposure apparatus comprising:
 a movable stage having a holder on which a substrate is held;   a projection system having an optical member; and   a liquid immersion member to form a liquid immersion space under the projection system, which includes (i) a liquid supply part, (ii) a liquid recovery part, (iii) a first member surrounding the optical member, and (iv) a second member that is movable outside an optical path of the exposure light relative to the first member, wherein   the second member has the liquid recovery part,   the second member moves in a direction perpendicular to an optical axis of the optical member so that a relative speed between the second member and the movable stage is smaller than a relative speed between the first member and the movable stage,   the amount of the liquid to be supplied via the liquid supply part is changed depending on the movement of the second member,   the substrate is exposed with exposure light via liquid in the liquid immersion space, and   the liquid is recovered via the liquid recovery part from above the substrate such that the liquid immersion space covers a portion of an upper surface of the substrate.   
     
     
         2 . The apparatus according to  claim 1 , wherein
 the liquid immersion member has the liquid recovery part as a first liquid recovery part and a second liquid recovery part, and   the amount of the liquid to be recovered via the second liquid recovery part is changed depending on the movement of the second member.   
     
     
         3 . A liquid immersion exposure apparatus comprising:
 a movable stage having a holder on which a substrate is held;   a projection system having an optical member; and   a liquid immersion member to form a liquid immersion space under the projection system, which includes (i) a liquid supply part, (ii) a first liquid recovery part (iii) a second liquid recovery part, (iv) a first member surrounding the optical member, and (v) a second member that is movable outside an optical path of the exposure light relative to the first member, wherein   the second member has the first liquid recovery part,   the second member moves in a direction perpendicular to an optical axis of the optical member so that a relative speed between the second member and the movable stage is smaller than a relative speed between the first member and the movable stage,   the amount of the liquid to be recovered via the second liquid recovery part is changed depending on the movement of the second member,   the substrate is exposed with exposure light via liquid in the liquid immersion space, and   the liquid is recovered via the first liquid recovery part from above the substrate such that the liquid immersion space covers a portion of an upper surface of the substrate.