US2019040525A1PendingUtilityA1

Physical vapor deposition using rotational speed selected with respect to deposition rate

Assignee: UNITED TECHNOLOGIES CORPPriority: Jan 20, 2014Filed: Oct 11, 2018Published: Feb 7, 2019
Est. expiryJan 20, 2034(~7.5 yrs left)· nominal 20-yr term from priority
F01D 15/10F05D 2230/90F05D 2300/2118F05D 2220/32F05D 2230/313C23C 14/30F01D 9/041C23C 14/083C23C 14/243C23C 14/54C23C 14/542C23C 14/505
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Claims

Abstract

An apparatus for use in a physical vapor deposition coating process includes a chamber, a crucible configured to hold a ceramic coating material in the chamber, an energy source operable to heat the interior of the chamber, a fixture for holding at least one substrate in the chamber, an actuator operable to rotate the fixture, and a controller configured to establish a plume of the ceramic coating material in the chamber to deposit the ceramic coating material from the plume onto the at least one substrate and form a ceramic coating thereon, and during the deposition, rotate the at least one substrate at a rotational speed selected with respect to deposition rate of the ceramic coating material onto the at least one substrate.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
         1 . An apparatus for use in a physical vapor deposition coating process, comprising:
 a chamber;   a crucible configured to hold a ceramic coating material in the chamber;   an energy source operable to heat the interior of the chamber;   a fixture for holding at least one substrate in the chamber;   an actuator operable to rotate the fixture; and   a controller configured to establish a plume of the ceramic coating material in the chamber to deposit the ceramic coating material from the plume onto the at least one substrate and form a ceramic coating thereon, and during the deposition, rotate the at least one substrate at a rotational speed selected with respect to deposition rate of the ceramic coating material onto the at least one substrate.   
     
     
         2 . The apparatus as recited in  claim 1 , wherein the rotational speed is 12-120 revolutions per minute. 
     
     
         3 . The apparatus as recited in  claim 1 , wherein the rotational speed is 30-60 revolutions per minute. 
     
     
         4 . The apparatus as recited in  claim 1 , wherein the ceramic coating material is a zirconia-based material. 
     
     
         5 . The apparatus as recited in  claim 1 , wherein the crucible is a tray and the ceramic coating material is a particulate. 
     
     
         6 . The apparatus as in  claim 1 , wherein the energy source is an electron beam gun. 
     
     
         7 . The apparatus as recited in  claim 1 , wherein the fixture includes a shaft connected to an actuator. 
     
     
         8 . The apparatus as recited in  claim 7 , wherein the actuator is operable to rotate the shaft. 
     
     
         9 . The apparatus as recited in  claim 8 , wherein the controller is connected with the actuator to control rotation of the shaft. 
     
     
         10 . The apparatus as recited in  claim 1 , further comprising a thermal hood in the chamber. 
     
     
         11 . The apparatus as recited in  claim 10 , further comprising an oxygen-containing gas source, and the thermal hood includes a gas manifold connected with the oxygen-containing gas source. 
     
     
         12 . The apparatus as recited in  claim 1 , wherein the controller is operable to maintain a pressure of 5×10 −4  to 3×10 −1  torr in the chamber.

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