Gas laser apparatus

Abstract

A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.

1 . A gas laser apparatus comprising:
 a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas;   a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber;   a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and   a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.   
     
     
         2 . The gas laser apparatus according to  claim 1 , further comprising:
 a first tank disposed between the purification column and the booster pump;   a first pressure sensor that measures a first pressure inside the first tank;   a second tank disposed between the booster pump and the third control valve; and   a second pressure sensor that measures a second pressure inside the second tank, wherein   the controller controls the booster pump on a basis of the first pressure and controls the third control valve on a basis of the second pressure.   
     
     
         3 . The gas laser apparatus according to  claim 2 , wherein the controller controls the booster pump so that the first pressure is equal to or higher than a first predetermined value and equal to or lower than a second predetermined value and permits the third control valve to open if the second pressure is equal to or higher than a third predetermined value. 
     
     
         4 . The gas laser apparatus according to  claim 1 , further comprising:
 a fourth control valve disposed between the second laser gas supply source and the second control valve, wherein   the booster pump is connected through a third control valve to a pipe between the fourth control valve and the second control valve, and   the controller selectively executes a first control mode in which the third control valve is closed and the fourth control valve is opened and a second control mode in which the fourth control valve is closed and the third control valve is opened.   
     
     
         5 . The gas laser apparatus according to  claim 4 , further comprising:
 a first tank disposed between the purification column and the booster pump;   a first pressure sensor that measures a first pressure inside the first tank;   a second tank disposed between the booster pump and the third control valve; and   a second pressure sensor that measures a second pressure inside the second tank,   wherein the controller controls the booster pump on a basis of the first pressure and controls the third control valve on a basis of the second pressure.   
     
     
         6 . The gas laser apparatus according to  claim 5 , wherein the controller controls the booster pump so that the first pressure is equal to or higher than a first predetermined value and equal to or lower than a second predetermined value and permits the third control valve to open if the second pressure is equal to or higher than a third predetermined value. 
     
     
         7 . The gas laser apparatus according to  claim 1 , wherein the first laser gas contains a fluorine gas, an argon gas, a neon gas, and a xenon gas, and
 the second laser gas contains an argon gas, a neon gas, and a xenon gas.   
     
     
         8 . The gas laser apparatus according to  claim 7 , wherein the laser chamber is connected through a fifth control valve to a third laser gas supply source that supplies a third laser gas having a higher xenon gas concentration than the second laser gas. 
     
     
         9 . The gas laser apparatus according to  claim 8 , further comprising a xenon concentration meter that measures a xenon gas concentration of the gas having passed through the purification column,
 wherein the controller controls the fifth control valve on a basis of the xenon gas concentration.   
     
     
         10 . The gas laser apparatus according to  claim 8 , further comprising an operating characteristic measuring instrument that measures an operating characteristic of laser light that is outputted from the laser chamber,
 wherein the controller controls the fifth control valve on a basis of the operating characteristic.   
     
     
         11 . The gas laser apparatus according to  claim 1 , further comprising:
 a second laser chamber connected through a sixth control valve to the first laser gas supply source and connected through a seventh control valve to the second laser gas supply source;   a common pipe connected to the second laser gas supply source and divided into a first branch pipe in which the second control valve is disposed and a second branch pipe in which the seventh control valve is disposed; and   a fourth control valve disposed in the common pipe, wherein   the purification column removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber and at least a part of a gas exhausted from the second laser chamber, and   the booster pump, connected through the third control valve to the common pipe between the fourth control valve and a place where the common pipe is divided into the first and second branch pipes, raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber and an operating gas pressure of the second laser chamber.