US2019006580A1PendingUtilityA1
Magnetic memory device
Est. expiryMar 12, 2034(~7.6 yrs left)· nominal 20-yr term from priority
Inventors:Masatoshi YoshikawaHiroaki YodaShuichi TsubataKenji NomaTatsuya KishiSatoshi SetoKazuhiro Tomioka
H01L 43/08H01L 43/02H01L 43/10H01L 43/12H10N 50/85H10N 50/80H10N 50/10H10N 50/01
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Claims
Abstract
A method of manufacturing a magnetic memory device includes forming a stacked structure including a magnetic element, forming a metal film which covers the stacked structure, and forming a protective insulating film formed of a metallic oxide by oxidizing the metal film. A metal element contained in the metallic oxide is selected from yttrium (Y), aluminum (Al), magnesium (Mg), calcium (Ca), zirconium (Zr) and hafnium (Hf).
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . A method of manufacturing a magnetic memory device, the method comprising:
forming a stacked structure including a magnetic element; forming a metal film which covers the stacked structure; and forming a protective insulating film formed of a metallic oxide by oxidizing the metal film, wherein a metal element contained in the metallic oxide is selected from yttrium (Y), aluminum (Al), magnesium (Mg), calcium (Ca), zirconium (Zr) and hafnium (Hf).
2 . The method of claim 1 , wherein a linear coefficient of thermal expansion of the metallic oxide is greater than 5×10 −6 /K.
3 . The method of claim 1 , wherein a linear coefficient of thermal expansion of the metallic oxide is greater than 7×10 −6 /K.
4 . The method of claim 1 , wherein the magnetic element contains at least one of cobalt (Co), iron (Fe), boron (B) and magnesium (Mg).
5 . The method of claim 1 , wherein the magnetic element includes a first magnetic layer, a second magnetic layer, and a nonmagnetic layer provided between the first magnetic layer and the second magnetic layer.
6 . A method of manufacturing a magnetic memory device, the method comprising:
forming a stacked structure including a magnetic element; forming a metal film which covers the stacked structure; and forming a protective insulating film formed of a metallic oxide by oxidizing the metal film, wherein a linear coefficient of thermal expansion of the metallic oxide is greater than 5×10 −6 /K.
7 . The method of claim 6 , wherein the linear coefficient of thermal expansion of the metallic oxide is greater than 7×10 −6 /K.
8 . The method of claim 6 , wherein the magnetic element contains at least one of cobalt (Co), iron (Fe), boron (B) and magnesium (Mg).
9 . The method of claim 6 , wherein the magnetic element includes a first magnetic layer, a second magnetic layer, and a nonmagnetic layer provided between the first magnetic layer and the second magnetic layer.Join the waitlist — get patent alerts
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