US2018370850A1PendingUtilityA1
Method of simultaneously coating and tempering glass at high temperature
Est. expiryJul 28, 2037(~11 yrs left)· nominal 20-yr term from priority
C03C 2218/322C03C 2217/268C03C 17/3655C03C 2217/241C03C 17/3452C03C 2217/285C03C 17/3689C03C 2217/214C03C 2217/211C03C 17/3482C03C 2218/31C03C 2218/154C03C 17/3411C03C 2217/94C03C 23/007
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Claims
Abstract
A method for simultaneously tempering and coating glass, including heating a glass substrate, depositing a textured buffer layer on the glass substrate, depositing a material on the buffer layer, depositing O2, and rapidly cooling the glass substrate by introducing a gas. This includes coating the glass substrate with crystalline sapphire or a low E film, for example.
Claims
exact text as granted — not AI-modified1 . A method of simultaneously tempering and coating glass, comprising:
heating a glass substrate; depositing a textured buffer layer on the glass substrate; depositing a ceramic material on the buffer layer; depositing O 2 ; and rapidly cooling the glass substrate by introducing a gas.
2 . The method as recited in claim 1 , wherein the buffer layer is MgO.
3 . The method as recited in claim 1 wherein the ceramic material is aluminum, the aluminum forming a thin film of Al 2 O 3 with the deposited O 2 .
4 . A method of tempering and coating glass with a low E film, comprising:
heating a glass substrate; depositing a textured buffer layer on the glass substrate; depositing tin on the buffer layer, forming a tin oxide film; doping the tin oxide film with fluorine; and rapidly cooling the glass substrate by a gas.
5 . A method of simultaneously tempering and coating glass, comprising:
heating a glass substrate; depositing a photovoltaic absorber coating on the glass substrate; depositing a conducting layer; and rapidly cooling the glass substrate by introducing a gas.
6 . The method as recited in claim 1 wherein the gas is O 2 , He, H 2 , Ar, or N 2 .
7 . The method as recited in claim 4 wherein the gas is O 2 , He, H 2 , Ar, or N 2 .
8 . The method as recited in claim 5 wherein the gas is O 2 , He, H 2 , Ar, or N 2 .Join the waitlist — get patent alerts
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