US2018369833A1PendingUtilityA1

Ion generating device, method for manufacturing same, and air conditioner

Assignee: LG ELECTRONICS INCPriority: Dec 14, 2015Filed: Nov 18, 2016Published: Dec 27, 2018
Est. expiryDec 14, 2035(~9.4 yrs left)· nominal 20-yr term from priority
H10P 95/00B03C 3/68C01B 13/115A61L 9/22B03C 3/82B03C 3/32B03C 3/00G03F 7/30G03F 7/2014B81C 2201/0101B81C 1/00103B01D 2259/818F24F 8/30B01D 2257/90A61L 2209/16B01D 2258/06B01D 53/32F24F 1/0076B03C 3/38
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Claims

Abstract

An ion generating device, a method for manufacturing an ion generating device, and an air conditioner are provided. The ion generating device may include a discharge electrode that generates ions, and a power supply that applies power to the discharge electrode. The discharge electrode may include a support formed of a conductor, and a discharge pin formed to protrude from a surface of the support and having a tip. The discharge pin may include nickel (Ni).

Claims

exact text as granted — not AI-modified
1 . An ion generating device, comprising:
 a discharge electrode that generates ions; and   a power supply that supplies power to the discharge electrode, wherein the discharge electrode includes:
 a support made of a conductor, and 
 a discharge pin that protrudes from a surface of the support and having a tip, and wherein the discharge pin is made of nickel (Ni). 
   
     
     
         2 . The ion generating device of  claim 1 , wherein a voltage applied to the support from the power supply is a DC voltage. 
     
     
         3 . The ion generating device of  claim 1 , wherein a angle of the tip of the discharge pin is 57.40. 
     
     
         4 . The ion generating device of  claim 1 , wherein a white gold (Pt) coating is formed on the discharge pin. 
     
     
         5 . A method of manufacturing an ion generating device including a discharge electrode, the method comprising:
 forming a pattern having an etched shape on a substrate;   depositing a seed layer on the substrate with the pattern;   forming a metal layer on the seed layer;   planarizing a top of the metal layer;   removing the substrate; and   removing the seed layer, wherein the substrate is made of silicon having crystal direction, and wherein the etched shape of the substrate is formed by wet etching using potassium hydroxide (KOH).   
     
     
         6 . The method of  claim 5 , wherein the forming the pattern having the etched shape on the substrate includes:
 forming a sacrifice layer on the substrate;   etching a portion of the sacrifice layer such that a portion of a top of the substrate is exposed; and   forming an etched shape by wet-etching the exposed portion of the top of the substrate.   
     
     
         7 . The method of  claim 6 , wherein the etching of the portion of the sacrifice layer includes:
 depositing a photosensitive resin layer on the sacrifice layer and then exposing the photosensitive resin layer to ultraviolet rays through a photo mask;   exposing a portion of the sacrifice layer by forming a pattern on the photosensitive resin layer using a developing solution;   exposing a portion of the substrate by forming a pattern by etching the exposed portion of the sacrifice layer; and   removing the photosensitive resin layer.   
     
     
         8 . The method of  claim 5 , wherein the metal layer is formed by plating nickel. 
     
     
         9 . The method of  claim 5 , further comprising forming a white gold coating on the metal layer. 
     
     
         10 . An air conditioner, comprising:
 a body having an intake port through which air is suctioned into the body and a discharging port through which air suctioned through the intake port is discharged;   a fan disposed in the body to blow air; and   an ion generating device disposed in an air flow path formed by the fan, wherein the ion generating device includes:
 a discharge electrode that generates ions; and 
 a power supply that supplies power to the discharge electrode, wherein the discharge electrode includes:
 a support made of a conductor; and 
 a discharge pin that protrudes from a surface of the support and having a tip, and wherein the discharge pin is made of nickel (Ni). 
 
   
     
     
         11 . The ion generating device of  claim 1 , wherein a width and height of the discharge pin are the same. 
     
     
         12 . The ion generating device of  claim 11 , wherein the width and the height of the discharge pin are each 10 μm. 
     
     
         13 . The ion generating device of  claim 1 , wherein the discharge pin has a pyramid shape. 
     
     
         14 . The ion generating device of  claim 1 , wherein the support is in the form of a plate. 
     
     
         15 . An air conditioner including the ion generating device of  claim 1 . 
     
     
         16 . An ion generating device manufactured using the method of  claim 5 . 
     
     
         17 . An air conditioner including the ion generating device manufactured using the method of  claim 5 . 
     
     
         18 . The ion generating device of  claim 10 , wherein a voltage applied to the support from the power supply is a DC voltage. 
     
     
         19 . The ion generating device of  claim 10 , wherein an angle of the tip of the discharge pin is 57.4°. 
     
     
         20 . The ion generating device of  claim 10 , wherein a white gold (Pt) coating is formed on the discharge pin.

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