Multiple electrode substrate support assembly and phase control system

Abstract

Implementations described herein provide a substrate support assembly which enables tuning of a plasma within a plasma chamber. In one embodiment, a method for tuning a plasma in a chamber is provided. The method includes providing a first radio frequency power and a direct current power to a first electrode in a substrate support assembly, providing a second radio frequency power to a second electrode in the substrate support assembly at a different location than the first electrode, monitoring parameters of the first and second radio frequency power, and adjusting one or both of the first and second radio frequency power based on the monitored parameters.

We claim: 
     
         1 . A substrate support assembly, comprising:
 a body having a chucking electrode embedded therein, the chucking electrode comprising a first electrode disposed adjacent to a substrate support surface of the body;   a second electrode disposed in the substrate support assembly at a location further from the support surface; and   a power application system coupled to the substrate support assembly, wherein the power application system comprises:
 a radio frequency power source coupled to one or both of the first and second electrodes through a matching network; and 
 a sensor coupled between the matching circuit and the first and second electrodes. 
   
     
     
         2 . The support assembly of  claim 1 , wherein the second electrode includes a surface area that is greater than a surface area of the first electrode. 
     
     
         3 . The support assembly of  claim 1 , wherein the second electrode includes a diameter that is greater than a diameter of the first electrode. 
     
     
         4 . The support assembly of  claim 1 , wherein the power application system includes a first radio frequency power source coupled to the first electrode and a second radio frequency power source coupled to the second electrode. 
     
     
         5 . The support assembly of  claim 1 , wherein the power application system comprises a single radio frequency power source coupled to both of the first electrode and the second electrode. 
     
     
         6 . The support assembly of  claim 5 , further comprising a power splitter coupled between the radio frequency power source and both of the first electrode and the second electrode. 
     
     
         7 . The support assembly of  claim 1 , wherein the body comprises a dielectric material. 
     
     
         8 . The support assembly of  claim 1 , wherein first electrode has a diameter that is substantially equal to a diameter of a substrate. 
     
     
         9 . The support assembly of  claim 1 , further comprising a phase shifter coupled to one or both of the first electrode and the second electrode. 
     
     
         10 . A substrate support assembly, comprising:
 a dielectric body having a chucking electrode embedded therein, the chucking electrode comprising a first electrode adapted to form a plasma that is positioned adjacent to a substrate support surface of the body;   a second electrode disposed in the dielectric body at a location further from the support surface; and   a power application system coupled to the substrate support assembly, wherein the power application system comprises:
 a radio frequency power source coupled to one or both of the first and second electrodes through a matching network; and 
 a sensor coupled between the matching circuit and the first and second electrodes. 
   
     
     
         11 . The support assembly of  claim 10 , wherein the second electrode includes a surface area that is greater than a surface area of the first electrode. 
     
     
         12 . The support assembly of  claim 10 , wherein the second electrode includes a diameter that is greater than a diameter of the first electrode. 
     
     
         13 . The support assembly of  claim 10 , wherein the power application system includes a first radio frequency power source coupled to the first electrode and a second radio frequency power source coupled to the second electrode. 
     
     
         14 . The support assembly of  claim 10 , wherein the power application system comprises a single radio frequency power source coupled to both of the first electrode and the second electrode. 
     
     
         15 . The support assembly of  claim 14 , further comprising a power splitter coupled between the radio frequency power source and both of the first electrode and the second electrode. 
     
     
         16 . The support assembly of  claim 10 , wherein the body comprises a dielectric material. 
     
     
         17 . The support assembly of  claim 10 , wherein first electrode has a diameter that is substantially equal to a diameter of a substrate. 
     
     
         18 . The support assembly of  claim 10 , further comprising a phase shifter coupled to one or both of the first electrode and the second electrode. 
     
     
         19 . A substrate support assembly, comprising:
 a dielectric body having a chucking electrode embedded therein, the chucking electrode comprising a first electrode adapted to form a plasma that is positioned adjacent to a substrate support surface of the body, wherein first electrode has a diameter that is substantially equal to a diameter of a substrate;   a second electrode embedded in the dielectric body at a location further from the support surface, wherein the second electrode includes a surface area that is greater than a surface area of the first electrode; and   a power application system coupled to the substrate support assembly, wherein the power application system comprises:
 a radio frequency power source coupled to one or both of the first and second electrodes through a matching network; and 
 a sensor coupled between the matching circuit and the first and second electrodes. 
   
     
     
         20 . The support assembly of  claim 19 , wherein the power application system comprises a single radio frequency power source coupled to both of the first electrode and the second electrode.