Exposure apparatus, exposure method, exposure apparatus maintenance method, exposure apparatus adjustment method and device manufacturing method

Abstract

An exposure apparatus exposes a substrate using exposure light via a liquid. The exposure apparatus comprises a substrate holding part, which releasably holds and is capable of moving a substrate, a management apparatus, which manages a status of usage of a dummy substrate that the substrate holding part is capable of holding.

1 . An exposure apparatus comprising:
 a projection system under which a liquid immersion area is formed and from which an exposure light is projected to a substrate;   a substrate stage having a holder part on which the substrate is releasably held, which is movable below the projection system;   a controller which selects one of a plurality of dummy substrate for a maintenance operation, based on a cumulative energy of exposure light irradiated to the selected dummy substrates and/or a cumulative liquid contact time of the selected dummy substrate.