Exposure apparatus, manufacturing method of flat-panel display, device manufacturing method, and exposure method

Abstract

A liquid crystal exposure apparatus that exposes a substrate with an illumination light via a projection optical system is equipped with: a substrate holder that holds the substrate; a substrate encoder system that includes head units and scales, and acquires the position information of the substrate holder on the basis of the output of the head units; and a drive section that relatively moves one of the head units and the scales on the substrate holder with respect to the other.

1 . An exposure apparatus that exposes an object with an illumination light via a projection optical system, the apparatus comprising:
 a holding section that holds the object;   a position measurement section that includes a measuring section and a measured section, and acquires position information of the holding section based on an output of the measuring section; and   a first drive section that relatively moves one of the measuring section and the measured section on the holding section, with respect to the other of the measuring section and the measured section.   
     
     
         2 . The exposure apparatus according to  claim 1 , further comprising:
 a second drive section that moves the measuring section and the measured section, wherein   the first drive section relatively moves one of the measuring section and the measured section in a first direction, with respect to the other of the measuring section and the measured section, and   the second drive section moves the measuring section and the measured section in a second direction that intersects the first direction, while moving the holding section in the second direction.   
     
     
         3 . The exposure apparatus according to  claim 2 , wherein
 one of the first drive section and the second drive section is supported from below by the other of the first drive section and the second drive section   
     
     
         4 . The exposure apparatus according to  claim 1 , wherein
 the position measurement section has
 the measured section that has a plurality of grating areas disposed spaced apart from each other in the first direction, 
 a plurality of the measuring sections each of which irradiates the measured section with a measurement beam and is movable within a predetermined plane including the first and the second directions, and 
 a measurement device that measures position information of the plurality of measuring sections in the second direction, 
   the plurality of the measuring sections are provided on the holding section and the measured section is provided to face the measuring sections, and   the position measurement section measures the position information of the holding section based on measurement information of the plurality of measuring sections the measurement beams of which are irradiated on at least one of the plurality of grating areas, and based on measurement information of the measurement device.   
     
     
         5 . The exposure apparatus according to  claim 4 , wherein
 the measurement device has the measured section that has a plurality of grating areas disposed spaced apart from each other in the second direction, and a plurality of the measuring sections each of which irradiates the measured section with a measurement beam and is movable within a predetermined plane including the first and the second directions.   
     
     
         6 . The exposure apparatus according to  claim 1 , further comprising:
 a frame member that supports the projection optical system, wherein   the measured section is provided at the frame member.   
     
     
         7 . The exposure apparatus according to  claim 1 , further comprising:
 a forming device having a pattern holding body that holds a predetermined pattern and a third drive section that drives the pattern holding body in the first direction, the forming device forming the predetermined pattern on the object via the pattern holding body using an energy beam.   
     
     
         8 . The exposure apparatus according to  claim 7 , wherein
 the object is a substrate used in a flat-panel display.   
     
     
         9 . The exposure apparatus according to  claim 8 , wherein
 the substrate has at least a side or a diagonal line with a length of 500 mm or greater.   
     
     
         10 . A manufacturing method of a flat-panel display, comprising:
 exposing the object using the exposure apparatus according to  claim 8 ; and   developing the object that has been exposed.   
     
     
         11 . A device manufacturing method, comprising:
 exposing the object using the exposure apparatus according to  claim 7 ; and   developing the object that has been exposed.   
     
     
         12 . An exposure method of exposing an object with an illumination light via a projection optical system, the method comprising:
 acquiring position information of a holding section that holds the object, based on an output of a measuring section of a position measurement section that includes the measuring section and a measured section; and   relatively moving one of the measuring section and the measured section on the holding member with respect to the other of the measuring section and the measured section, using a first drive section.