Exposure apparatus and device fabrication method

Abstract

An exposure apparatus includes a liquid supply system having a supply path via which liquid is supplied to a space under a projection system; a liquid recovery system having a recovery path via which the supplied liquid is collected; a supply flow-meter provided at the supply path; a recovery flow-meter provided at the recovery path; a stage system having a movable stage apparatus on which a substrate is held; and a light receiver which is provided at the movable stage apparatus and which receives detection light via a light-transmissive member. The light-transmissive member has a liquid repellent upper surface from which the detection light is incident on the light-transmissive member. The substrate is exposed through liquid in a liquid immersion area formed on a portion of an upper surface of the substrate while supplying liquid via the supply path and collecting liquid via the recovery path.

What is claimed is: 
     
         1 . An exposure apparatus comprising:
 a projection system;   a liquid supply system having a supply path via which liquid is supplied to a space under the projection system;   a liquid recovery system having a recovery path via which the supplied liquid is collected;   a supply flow-meter provided at the supply path;   a recovery flow-meter provided at the recovery path;   a stage system having a movable stage apparatus on which a substrate is held; and   a light receiver which is provided at the movable stage apparatus and which receives detection light via a light-transmissive member, wherein   the light-transmissive member is provided with a liquid repellent upper surface from which the detection light is incident on the light-transmissive member,   a liquid immersion area is formed on a portion of an upper surface of the substrate while performing liquid supply via the supply path and liquid collection via the recovery path, and   the substrate is exposed through the liquid in the liquid immersion area.   
     
     
         2 . The apparatus according to  claim 1 , wherein the recovery flow-meter measures an amount of the liquid collected from a space under the projection system. 
     
     
         3 . The apparatus according to  claim 1 , further comprising a separator fluidically connected to the recovery path, which separates one of the liquid and gas, which has been collected from a space under the projection system, from the other, wherein the recovery flow-meter measures an amount of the liquid separated by the separator. 
     
     
         4 . The apparatus according to  claim 1 , wherein the supply flow-meter measures an amount of the liquid to be supplied to form the liquid immersion area. 
     
     
         5 . The apparatus according to  claim 1 , wherein during exposure of the substrate, the liquid immersion area is formed on the portion of the upper surface of the substrate while performing the liquid supply by the liquid supply system and the liquid collection by the liquid recovery system. 
     
     
         6 . The apparatus according to  claim 1 , wherein the light-transmissive member is a lens. 
     
     
         7 . The apparatus according to  claim 1 , wherein the liquid repellent upper surface of the light-transmissive member is substantially coplanar with the upper surface of the substrate held on the movable stage apparatus. 
     
     
         8 . The apparatus according to  claim 1 , wherein the movable stage apparatus has a holder configured for holding the substrate in a recess.