Target supply device and euv light generation apparatus

Abstract

A target supply device may include a tank for storing a target material, a nozzle which is connected to the tank and outputs the target material, and a gas supply section for supplying the tank with gas. The gas supply section may include a booster which is connected to a gas line, boosts the gas supplied from the gas line, and outputs the boosted gas to the tank, a pressure sensor for measuring the pressure inside the tank, and a pressure controller which adjusts the pressure of the gas to be supplied to the tank on the basis of a measurement result from the pressure sensor.

What is claimed is: 
     
         1 . A target supply device configured to supply a target material comprising:
 a tank configured to store the target material;   a nozzle connected to the tank and configured to output the target material; and   a gas supply section configured to supply the tank with gas, the gas supply section comprising:   a pipe having a first end connected to the tank; and   a booster connected between a gas line and a second end of the pipe and configured to boost gas supplied from the gas line and supply the pipe with the boosted gas.   
     
     
         2 . The target supply device according to  claim 1 , wherein the gas supply section further comprises a pressure controller configured to adjust pressure of the boosted gas in the pipe. 
     
     
         3 . The target supply device according to  claim 1 , wherein the gas supply section further comprises a pressure lowering section configured to lower pressure of the gas, which has been boosted by the booster, down to a predetermined pressure. 
     
     
         4 . The target supply device according to  claim 3 , wherein the gas supply section further comprises a pressure accumulator disposed between the booster and the pressure lowering section. 
     
     
         5 . The target supply device according to  claim 1 , wherein the gas supply section further comprises a gas purifying section configured to remove impurities from the gas which has been boosted by the booster. 
     
     
         6 . The target supply device according to  claim 5 , wherein the gas supply section further comprises a pressure lowering section configured to lower pressure of the gas, which has been boosted by the booster, down to a predetermined pressure. 
     
     
         7 . The target supply device according to  claim 1 , wherein the gas supply section further comprises a particle filter configured to remove particles from the gas which has been boosted by the booster. 
     
     
         8 . The target supply device according to  claim 7 , wherein the gas supply section further comprises a pressure lowering section configured to lower pressure of the gas, which has been boosted by the booster, down to a predetermined pressure. 
     
     
         9 . The target supply device according to  claim 1 , wherein the gas supply section further comprises a pressure stabilizer configured to stabilize the pressure of the gas which has been boosted by the booster. 
     
     
         10 . The target supply device according to  claim 9 , wherein the gas supply section further comprises a pressure lowering section configured to lower pressure of the gas, which has been boosted by the booster, down to a predetermined pressure. 
     
     
         11 . An EUV light generation apparatus comprising a target supply device configured to supply a target material, the EUV light generation apparatus irradiating the target material with a laser beam to generate EUV light, the target supply device comprising:
 a tank configured to store the target material;   a nozzle connected to the tank and configured to output the target material; and   a gas supply section configured to supply the tank with gas, the gas supply section comprising:   a pipe having a first end connected to the tank; and   a booster connected between a gas line and a second end of the pipe and configured to boost gas supplied from the gas line and supply the pipe with the boosted gas.   
     
     
         12 . The EUV light generation apparatus according to  claim 11 , wherein
 the gas supply section further comprises a pressure controller configured to adjust pressure of the boosted gas in the pipe.   
     
     
         13 . The EUV light generation apparatus according to  claim 11 , wherein
 the gas supply section further comprises a pressure lowering section configured to lower pressure of the gas, which has been boosted by the booster, down to a predetermined pressure.   
     
     
         14 . The EUV light generation apparatus according to  claim 13 , wherein
 the gas supply section further comprises a pressure accumulator disposed between the booster and the pressure lowering section.   
     
     
         15 . The EUV light generation apparatus according to  claim 11 , wherein
 the gas supply section further comprises a gas purifying section configured to remove impurities from the gas which has been boosted by the booster.   
     
     
         16 . The EUV light generation apparatus according to  claim 15 , wherein
 the gas supply section further comprises a pressure lowering section configured to lower pressure of the gas, which has been boosted by the booster, down to a predetermined pressure.   
     
     
         17 . The EUV light generation apparatus according to  claim 11 , wherein
 the gas supply section further comprises a particle filter configured to remove particles from the gas which has been boosted by the booster.   
     
     
         18 . The EUV light generation apparatus according to  claim 17 , wherein
 the gas supply section further comprises a pressure lowering section configured to lower pressure of the gas, which has been boosted by the booster, down to a predetermined pressure.   
     
     
         19 . The EUV light generation apparatus according to  claim 11 , wherein
 the gas supply section further comprises a pressure stabilizer configured to stabilize the pressure of the gas which has been boosted by the booster.   
     
     
         20 . The EUV light generation apparatus according to  claim 19 , wherein
 the gas supply section further comprises a pressure lowering section configured to lower pressure of the gas, which has been boosted by the booster, down to a predetermined pressure.