Curable resin film and first protective film forming sheet

Abstract

A curable resin film of the present invention forms a first protective film ( 1 a ) by attaching the curable resin film containing an epoxy-based thermosetting component having a weight-average molecular weight of 200 to 4,000 to a surface ( 5 a ) of a semiconductor wafer ( 5 ) having a plurality of bumps ( 51 ) with an average peak height (h1) of 50 to 400 μm, an average diameter of 60 to 500 μm, and an average pitch of 100 to 800 μm, heating the attached curable resin film at 100° C. to 200° C. for 0.5 to 3 hours, and curing the heated curable resin film, and when longitudinal sections thereof are observed by a scanning electron microscope, a ratio (h3/h1) of an average thickness (h3) of the first protective film ( 1 a ) at a center position between the bumps ( 51 ) to an average peak height (h1) of the bumps ( 51 ), and a ratio (h2/h1) of an average thickness (h2) of the first protective film ( 1 a ) at a position being in contact with the plurality of bumps ( 51 ) to the average peak height (h1) satisfy a relationship represented by the following expression of [{(h2/h1)−(h3/h1)}≤0.1].

1 . A curable resin film for forming a first protective film on a surface having a plurality of bumps in a semiconductor wafer by being attached to the surface and being cured,
 wherein the curable resin film contains an epoxy-based thermosetting component having a weight-average molecular weight of 200 to 4,000 as a curable component, and   wherein the first protective film that protects the plurality of bumps is formed by attaching the curable resin film to a surface of the semiconductor wafer having the plurality of bumps with an average peak height h1 of 50 to 400 μm, an average diameter D of 60 to 500 μm in a plan view, and an average pitch P of 100 to 800 μm, heating the attached curable resin film at 100° C. to 200° C. for 0.5 to 3 hours, and curing the heated curable resin film, and when longitudinal sections of the first protective film and the semiconductor wafer having the plurality of bumps are observed by a scanning electron microscope, a ratio (h3/h1) of an average thickness h3 of the first protective film at a center position between the plurality of bumps to the average peak height h1 of the plurality of bumps, and a ratio (h2/h1) of an average thickness h2 of the first protective film at a position being in contact with the plurality of bumps to the average peak height h1 satisfy a relationship represented by the following Expression (1).
   {( h 2/ h 1)−( h 3/ h 1)}≤0.1  (1)
 
   
     
     
         2 . A curable resin film for forming a first protective film on a surface having a plurality of bumps in a semiconductor wafer by being attached to the surface and being cured,
 wherein the curable resin film contains an energy ray-curable component having a weight-average molecular weight of 200 to 4,000 as a curable component, and   wherein the first protective film that protects the plurality of bumps is formed by attaching the curable resin film to a surface of the semiconductor wafer having the plurality of bumps with an average peak height h1 of 50 to 400 μm, an average diameter D of 60 to 500 μm in a plan view, and an average pitch P of 100 to 800 μm, irradiating the attached curable resin film with energy rays under a condition of illuminance of 50 to 500 mW/cm 2 , and light intensity of 100 to 2,000 mJ/cm 2 , and curing the irradiated curable resin film, and when longitudinal sections of the first protective film and the semiconductor wafer having the plurality of bumps are observed by a scanning electron microscope, a ratio (h3/h1) of an average thickness h3 of the first protective film at a center position between the plurality of bumps to the average peak height h1 of the plurality of bumps, and a ratio (h2/h1) of an average thickness h2 of the first protective film at a position being in contact with the plurality of bumps to the average peak height h1 satisfy a relationship represented by the following Expression (1).
   {( h 2/ h 1)−( h 3/ h 1)}≤0.1  (1)
 
   
     
     
         3 . The curable resin film according to  claim 1  which contains 5% to 80% by mass of filler having an average particle diameter of 5 to 1,000 nm. 
     
     
         4 . A first protective film forming sheet comprising the curable resin film according to  claim 1  on one surface of a first supporting sheet.