US2018301627A1PendingUtilityA1
Materials and components in phase change memory devices
Est. expiryAug 29, 2034(~8.1 yrs left)· nominal 20-yr term from priority
H01L 45/06H01L 27/2427H01L 45/1253H01L 45/1233H01L 45/148H01L 45/128H01L 45/144H01L 45/16H10B 63/24H10N 70/861H10N 70/841H10N 70/8828H10N 70/884H10N 70/826H10N 70/231H10N 70/021H10N 70/011
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Claims
Abstract
Phase change memory cells, structures, and devices having a phase change material and an electrode forming an ohmic contact therewith which includes carbon and tungsten doped with nitrogen are disclosed and described. Such electrodes have a low contact resistance with the phase change material and a high thermal stability from room temperature to temperatures needed for programming operations.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . A method of forming a phase change memory structure, comprising:
forming a first, second, and third electrode with a phase change material disposed between the first and second electrode and a select device material disposed between the second and third electrode, wherein at least one of the first or second electrodes comprises a tungsten and carbon material doped with nitrogen.
2 . The method of claim 1 , wherein at least one of the first or second electrodes is formed by co-sputtering carbon and tungsten in a nitrogen gas environment at a partial pressure sufficient to nitrogen dope the carbon-tungsten electrode.
3 . The method of claim 1 , wherein the first electrode comprises a tungsten and carbon material doped with nitrogen, or wherein the second electrode comprises a tungsten and carbon material doped with nitrogen, or wherein both the first and second electrodes comprise a tungsten and carbon material doped with nitrogen.
4 . The method of claim 3 , wherein the third electrode comprises a tungsten and carbon material doped with nitrogen.
5 . The method of claim 1 , wherein all three electrodes comprise a tungsten and carbon material doped with nitrogen.
6 . The method of claim 1 , wherein the electrodes comprising a tungsten and carbon material doped with nitrogen are formed by co-sputtering carbon and tungsten in a nitrogen gas environment at a partial pressure sufficient to nitrogen dope the carbon-tungsten electrode.
7 . The method of claim 1 , wherein nitrogen gas is flowed at a rate of from about 2 sccm to about 10 sccm during co-sputtering to facilitate nitrogen doping.
8 . The method of claim 1 , wherein at least one of the first or second electrodes has a tungsten to carbon at % ratio of from about 50:50 to about 1:99.
9 . The method of claim 1 , wherein at least one of the first or second electrodes has a tungsten to carbon at % ratio of from about 50:50 to about 4:96.
10 . The method of claim 9 , wherein the tungsten to carbon at % ratio is about 4:96.
11 . The method of claim 1 , wherein at least one of the first or second electrodes has a tungsten to carbon at % ratio of from about 30:70 to about 5:95.
12 . The method of claim 1 , wherein at least one of the first or second electrodes has a tungsten to carbon at % ratio of from about 20:80 to about 10:90.
13 . The method of claim 1 , wherein at least one of the first or second electrodes is nitrogen doped to have a resistivity of from about 0.1 mOhm*cm to about 5 Ohm*cm.
14 . The method of claim 1 , wherein at least one of the first or second electrodes is nitrogen doped to have a resistivity of from about 0.5 mOhm*cm to about 25 mOhm*cm.
15 . The method of claim 10 , wherein the electrode is further nitrogen doped to have a resistivity of from about 4.0 mOhm*cm to about 30.0 mOhm*cm.
16 . The method of claim 1 , wherein at least one of the first or second electrodes forms an Ohmic contact with the phase change material.
17 . The method of claim 16 , wherein the Ohmic contact is mechanically and thermally stable across a temperature range of from about 20° C. to about 600° C.
18 . The method of claim 1 , wherein at least one of the first or second electrodes forms a diffusion barrier against contamination of the phase change material.
19 . The method of claim 4 , wherein the third electrode has a tungsten to carbon at % ratio of from about 50:50 to about 4:96.
20 . The method of claim 19 , wherein the tungsten to carbon at % ratio is about 4:96 and the electrode is nitrogen doped to have a resistivity of from about 4.0 mOhm*cm to about 30.0 mOhm*cm.Join the waitlist — get patent alerts
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