US2018282358A1PendingUtilityA1

Alkoxide compound, thin film-forming starting material, thin film formation method, and alcohol compound

Assignee: ADEKA CORPPriority: Aug 5, 2014Filed: Jun 4, 2018Published: Oct 4, 2018

Est. expiryAug 5, 2034(~8 yrs left)· nominal 20-yr term from priority

Inventors:Atsushi Sakurai Masako Hatase Tomoharu Yoshino Masaki Enzu

C07F 15/06C07F 7/10C07F 7/081C23C 16/45525C23C 16/18C07F 15/04C07C 251/76C07C 251/08C07F 15/045C07F 15/065C07F 7/0818C07F 1/08H10P 14/42C07F 17/00

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References

Claims

Abstract

The alkoxide compound of the present invention is characteristically represented by the following general formula (I):

Claims

exact text as granted — not AI-modified

1 . An alcohol compound of the following formula (II): 
       
         
           
           
               
               
           
         
       
       wherein R 4  and R 5  are each independently a hydrogen atom, a C 1-12  hydrocarbon group, or a group of any of the following formulas (Y-1) to (Y-6) or (Y-8); R 6  is a hydrogen atom or a C 1-3  hydrocarbon group or a group of any of the following formulas (Y-1) to (Y-6) or (Y-8); however, when R 4  is a methyl group and R 5  is a methyl group or an ethyl group, R 6  is a hydrogen atom or a group of any of the following formulas (Y-1) to (Y-6) or (Y-8), 
       
         
           
           
               
               
           
         
       
       wherein R Y1  to R Y12  are each independently a hydrogen atom or a C 1-12  hydrocarbon group, and A 8  to A 10  are each a C 1-6  alkanediyl group.

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