Method for producing vapor deposition mask, and method for producing organic semiconductor element

Abstract

A method for producing a vapor deposition mask capable of satisfying both enhancement in definition and reduction in weight even when a size is increased, and a method for producing an organic semiconductor element capable of producing an organic semiconductor element with high definition are provided. A vapor deposition mask is produced by the steps of preparing a metal plate with a resin layer in which a resin layer is provided on one surface of a metal plate, forming a metal mask with a resin layer by forming a slit that penetrates through only the metal plate, for the metal plate in the metal plate with a resin layer, and thereafter, forming a resin mask by forming openings corresponding to a pattern to be produced by vapor deposition in a plurality of rows lengthwise and crosswise in the resin layer by emitting a laser from the metal mask side.

1 . A method for producing a vapor deposition mask that is formed by a metal mask provided with a slit, and a polyimide resin mask that is stacked on a front surface of the metal mask, and has openings corresponding to a pattern to be produced by vapor deposition, comprising the steps of:
 providing a metal plate with a polyimide resin layer formed on one surface of the metal plate;   forming the metal mask with the polyimide resin layer by forming a slit that penetrates through only the metal plate; and   forming the polyimide resin mask by forming the openings corresponding to a pattern to be produced by vapor deposition in the polyimide resin layer by emitting a laser from the metal mask side.