US2018259475A1PendingUtilityA1
Vertical nanopore coupled with a pair of transverse electrodes having a uniform ultrasmall nanogap for dna sequencing
Est. expiryMar 9, 2037(~10.6 yrs left)· nominal 20-yr term from priority
G01N 33/48721B82Y 5/00C12Q 1/6869G01N 27/3278G01N 27/44791G01N 27/4146G01N 27/4145B01L 3/502761B01L 3/502715B01L 3/502707C23C 14/00B81C 2201/0181B81C 2201/0143B81C 2201/0176
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Claims
Abstract
A DNA sequencing device, and related method, which include a nanopore having a maximum width dimension of no greater than about 50 nm, and a pair of electrodes having a spacing of no greater than about 2 nm, the electrodes being exposed within the nanopore to measure a DNA strand passing through the nanopore.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . A nanopore DNA sequencing device, comprising:
a nanopore having a maximum width dimension of no greater than about 50 nm; a pair of electrode members having a spacing of no greater than about 2 nm, the electrodes being exposed within the nanopore to detect an electronic signal associated with one or more nucleotides of a DNA strand passing through the nanopore.
2 . The device of claim 1 , wherein the nanopore width is no greater than about 50 nm.
3 . The device of claim 1 , wherein the spacing is no greater than about 1 nm.
4 . The device of claim 1 , wherein the spacing is in the range of about 0.3 nm to about 2 nm.
5 . The device of claim 1 , wherein the nanopore is oriented with a vertically upward facing inlet opening.
6 . The device of claim 1 , wherein the electrode members have a length that is greater than the maximum width dimension of the nanopore.
7 . The device of claim 1 , wherein the electrode members are formed using a lithography process.
8 . A method of forming a nanopore device for DNA sequencing, the method comprising:
forming first and second electrode members on a substrate, the first and second electrode members being spaced apart by an electrode gap; depositing an insulating layer over the first and second electrode members; forming a nanopore in the insulating layer in alignment with the electrode gap, the nanopore having an inlet opening along a top surface of the insulating layer.
9 . The method of claim 8 , wherein the electrode gap is in the range of about 0.3 nm to about 2 nm.
10 . The method of claim 8 , wherein the inlet opening has a minimum width dimension in the range of about 10 nm to about 30 nm.
11 . The method of claim 8 , wherein forming the first and second electrode members comprises using evaporation techniques.
12 . The method of claim 8 , further comprising forming the electrode gap by depositing at least one sacrificial layer using at least one of sputter deposition, chemical vapor deposition, and atomic layer deposition, and then removing a portion of the sacrificial layer.
13 . The method of claim 8 , wherein forming the nanopore includes drilling through the insulating layer using focused electron beam or focused ion beam techniques.
14 . The method of claim 8 , wherein depositing the insulation coating includes depositing by isotropic deposition.
15 . A method of DNA sequencing, comprising:
providing a nanopore DNA sequencing device, the nanopore DNA sequencing device comprising a nanopore and a tunneling current electrode, the tunneling current electrode comprising first and second electrode members separated by an electrode gap, the electrode gap being exposed within the nanopore; directing a DNA strand through the nanopore and the electrode gap; measuring an electronic signal associated with at least one nucleotide of the DNA strand as the DNA strand passes through the electrode gap.
16 . The method of claim 17 , wherein the nanopore is oriented with an inlet opening of the nanopore facing vertically upward, and the DNA strand passes through the nanopore and electrode gap in a vertically downward direction.
17 . The method of claim 17 , wherein a maximum width dimension of the nanopore is no greater than about 50 nm.
18 . The method of claim 17 , wherein the electrode gap is no greater than about 1 nm.
19 . The method of claim 17 , wherein the electrode gap is in the range of about 0.3 nm to about 2 nm.
20 . The method of claim 17 , wherein measuring the electronic signal includes measuring a tunneling current of at least four different nucleotides (A,T,C,G) of the DNA strand.Join the waitlist — get patent alerts
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