Gel Nail Polish and Manufacturing and Using Method Thereof

Abstract

A gel nail polish composition includes a gel nail polish mixture and a color agent mixing therewith for forming a gel nail polish layer on a nail of a user. The gel nail polish mixture includes first through fourth chemical elements, wherein the first through fourth chemical elements are aliphatic urethane acrylate, polymer acrylate oligomer, propoxylated neopentyl glycol diacrylate, and trimethylbenzoyl diphenylphosphine oxide. The wipe off base coat layer, the gel nail polish layer, and the top coat layer are dried under an exposure of one of LED light, UV light, and sunlight that no wet sticky colloid is formed after the top coat layer is dried. The gel nail polish layer is adapted for being removed by directly wiping off the gel nail polish layer on the nail by using a rag, cotton, or tissue paper with the nail polish remover.

What is claimed is: 
     
         1 . A gel nail polish composition, consisting essentially of 57.6-69.9% by weight of an aliphatic urethane acrylate, 16.4-19.8% by weight of a polymer acrylate oligomer, 12.7-15.4% by weight of a propoxylated neopentyle glycol diacrylate, and 4.1-4.9% by weight of a trimethylbenzoyl diphenylphosphine oxide. 
     
     
         2 . The gel nail polish composition, as recited in  claim 1 , wherein said aliphatic urethane acrylate and said polymer acrylate oligomer is dissolved in said propoxylated neopentyle glycol diacrylate by stirring and gradually heating up said aliphatic urethane acrylate and said polymer acrylate oligomer into said propoxylated neopentyle glycol diacrylate from room temperature to 60° C. for 40 minutes to form a first mixture, wherein said trimethylbenzoyl diphenylphosphine oxide is dissolved in said first mixture by mixing and stirring said trimethylbenzoyl diphenylphosphine oxide into said first mixture for 30 minutes to form a second mixture, and cooling down said second mixture from 60° C. back to the room temperature, wherein said second mixture is filtered to remove residues in said second mixture. 
     
     
         3 . The gel nail polish, as recited in  claim 1 , further consisting essentially of a color agent mixed into said gel nail polish composition. 
     
     
         4 . The gel nail polish, as recited in  claim 2 , further consisting essentially of a color agent mixed into said gel nail polish composition. 
     
     
         5 . The gel nail polish composition, as recited in  claim 1 , whrerin wherein a weight ratio of said aliphatic urethane acrylate, said polymer acrylate oligomer, said propoxylated neopentyle glycol diacrylate, and said trimethylbenzoyl diphenylphosphine oxide is 63.5:18:14:4.5. 
     
     
         6 . The gel nail polish composition, as recited in  claim 2 , wherein a weight ratio of said aliphatic urethane acrylate, said polymer acrylate oligomer, said propoxylated neopentyle glycol diacrylate, and said trimethylbenzoyl diphenylphosphine oxide is 63.5:18:14:4.5. 
     
     
         7 . The gel nail polish composition, as recited in  claim 3 , wherein a weight ratio of said aliphatic urethane acrylate, said polymer acrylate oligomer, said propoxylated neopentyle glycol diacrylate, and said trimethylbenzoyl diphenylphosphine oxide is 63.5:18:14:4.5. 
     
     
         8 . The gel nail polish composition, as recited in  claim 4 , wherein a weight ratio of said aliphatic urethane acrylate, said polymer acrylate oligomer, said propoxylated neopentyle glycol diacrylate, and said trimethylbenzoyl diphenylphosphine oxide is 63.5:18:14:4.5. 
     
     
         9 . The gel nail polish composition, as recited in  claim 1 , wherein said gel nail polish mixture is cured by drying under an exposure of a light structure selected from the group consisting of LED light for 30 seconds to less than 60 seconds and sunlight for 1-2 minutes after applied on a nail. 
     
     
         10 . The gel nail polish composition, as recited in  claim 8 , wherein said gel nail polish mixture is cured by drying under an exposure of a light structure selected from the group consisting of LED light for 30 seconds to less than 60 seconds and sunlight for 1-2 minutes after applied on a nail. 
     
     
         11 . A method of manufacturing a gel nail polish composition which consists essentially of 57.6-69.9% by weight of an aliphatic urethane acrylate, 16.4-19.8% by weight of a polymer acrylate oligomer, 12.7-15.4% by weight of a propoxylated neopentyle glycol diacrylate, and 4.1-4.9% by weight of a trimethylbenzoyl diphenylphosphine oxide, where in the method comprises the steps of:
 (a) dissolving said aliphatic urethane acrylate and said polymer acrylate oligomer in said propoxylated neopentyle glycol diacrylate by stirring and gradually heating up said aliphatic urethane acrylate and said polymer acrylate oligomer into said propoxylated neopentyle glycol diacrylate from room temperature to 60° C. for 40 minutes to form a first mixture;   (b) dissolving said trimethylbenzoyl diphenylphosphine oxide in said first mixture by mixing and stirring said trimethylbenzoyl diphenylphosphine oxide into said first mixture for 30 minutes to form a second mixture, and cooling down said second mixture from 60° C. back to the room temperature; and   (c) filtering said second mixture to remove residues in said second mixture to form said gel nail polish composition.   
     
     
         12 . The method, as recited in  claim 12 , after the step (c), further comprising a step of (d) adding and mixing a color agent into said second mixture to form said gel nail polish composition. 
     
     
         13 . The method, as recited in  claim 11 , wherein a weight ratio of said aliphatic urethane acrylate, said polymer acrylate oligomer, said propoxylated neopentyle glycol diacrylate, and said trimethylbenzoyl diphenylphosphine oxide is 63.5:18:14:4.5. 
     
     
         14 . The method, as recited in  claim 12 , wherein a weight ratio of said aliphatic urethane acrylate, said polymer acrylate oligomer, said propoxylated neopentyle glycol diacrylate, and said trimethylbenzoyl diphenylphosphine oxide is 63.5:18:14:4.5. 
     
     
         15 . The method, as recited in  claim 11 , wherein said gel nail polish composition is cured by drying under an exposure of a light structure selected from the group consisting of LED light for 30 seconds to less than 60 seconds and sunlight for 1-2 minutes after applied on a nail. 
     
     
         16 . The method, as recited in  claim 12 , wherein said gel nail polish composition is cured by drying under an exposure of a light structure selected from the group consisting of LED light for 30 seconds to less than 60 seconds and sunlight for 1-2 minutes after applied on a nail. 
     
     
         17 . The method, as recited in  claim 13 , wherein said gel nail polish composition is cured by drying under an exposure of a light structure selected from the group consisting of LED light for 30 seconds to less than 60 seconds and sunlight for 1-2 minutes after applied on a nail. 
     
     
         18 . The method, as recited in  claim 17 , wherein said gel nail polish composition is cured by drying under an exposure of a light structure selected from the group consisting of LED light for 30 seconds to less than 60 seconds and sunlight for 1-2 minutes after applied on a nail. 
     
     
         19 . The method, as recited in  claim 15 , wherein said gel nail polish composition cured on said nail is able to be directly wiping off from said nail. 
     
     
         20 . The method, as recited in  claim 18 , wherein said gel nail polish composition cured on said nail is able to be directly wiping off from said nail.