Exposure apparatus and device manufacturing method

Abstract

An exposure apparatus includes a projection system provided with a final element which has a first outer surface that is liquid repellent, and a component disposed adjacent to the final element and having a second outer surface which is liquid repellent, the first outer surface and the second outer surface facing each other with a gap between the first and second outer surfaces. A substrate is exposed with exposure light from the projection system through immersion liquid between an end surface of the final element and the substrate, the immersion liquid covering a portion of an upper surface of the substrate. The gap is formed above the end surface of the final element.

What is claimed is: 
     
         1 . An exposure apparatus comprising:
 a projection system provided with a final element which has a first outer surface that is liquid repellent; and   a component disposed adjacent to the final element and having a second outer surface which is liquid repellent, the first outer surface and the second outer surface facing each other with a gap between the first and second outer surfaces, wherein   a substrate is exposed with exposure light from the projection system through immersion liquid between an end surface of the final element and the substrate, the immersion liquid covering a portion of an upper surface of the substrate, and   the gap is formed above the end surface of the final element.   
     
     
         2 . The exposure apparatus according to  claim 1 , wherein the component includes a holding member which holds the final element. 
     
     
         3 . The exposure apparatus according to  claim 1 , wherein the component includes an immersion area forming member having a flow passage in which the immersion liquid flows.