Exposure apparatus, exposure method, and method for producing device

Abstract

An exposure apparatus includes a nozzle member, a nozzle driving system having an actuator by which the nozzle member is moved, and a controller. The nozzle member includes a liquid supply port from which immersion liquid is supplied, a liquid recovery port via which the supplied immersion liquid is recovered, and a gas supply port via which a gas is supplied. The liquid supply port, the liquid recovery port and the gas supply port face downwardly, the liquid recovery port is arranged radially outward of the liquid supply port with respect to a path of the exposure light, and the gas supply port is arranged radially outward of the liquid recovery port with respect to the path. The controller controls the nozzle driving system based on information on a movement of a substrate stage.

1 . An exposure apparatus which exposes a substrate with an exposure light, the exposure apparatus comprising:
 a projection system having a final optical element;   a nozzle member having a liquid supply port from which immersion liquid is supplied, having a liquid recovery port via which the supplied immersion liquid is recovered and a gas supply port via which a gas is supplied, the liquid supply port, the liquid recovery port and the gas supply port facing downwardly, the liquid recovery port being arranged radially outward of the liquid supply port with respect to a path of the exposure light, and the gas supply port being arranged radially outward of the liquid recovery port with respect to the path;   a nozzle driving system having an actuator by which the nozzle member is moved;   a substrate stage having a holder on which the substrate is held;   a stage driving system by which the substrate stage is moved below and relative to the projection system and the nozzle member; and   a controller, wherein   the substrate is exposed with the exposure light through the immersion liquid in a liquid immersion area which covers a portion of an upper surface of the substrate and which is formed while supplying the immersion liquid via the liquid supply port, supplying the gas via the gas supply port and recovering the supplied immersion liquid via the liquid recovery port, and   the controller controls the nozzle driving system based on information on a movement of the substrate stage.   
     
     
         2 . The exposure apparatus according to  claim 1 , wherein the information of the movement of the substrate stage includes a movement amount of the substrate stage. 
     
     
         3 . The exposure apparatus according to  claim 1 , wherein the nozzle member further has a suction port. 
     
     
         4 . The exposure apparatus according to  claim 3 , wherein the suction port is arranged radially outward of the gas supply port with respect to the path of the exposure light.