Temperature profile in an advanced thermal treatment apparatus and method

Abstract

Applying heat from a heat source to a first region to cause a first pyrolysis process, the first pyrolysis process resulting in a gaseous mixture, and applying heat from the heat source to a second region to cause a second pyrolysis process, the second pyrolysis process being applied to the gaseous mixture, wherein the second region is located closer to the heat source than the first region. Pyrolysis is used to destroy oils, tars and/or PAHs in carbonaceous material.

1 . An advanced thermal treatment (ATT) method comprising:
 applying heat from a heat source to a first region to cause a first advanced thermal treatment (ATT) process, the first ATT process resulting in a gaseous mixture;   applying heat from the heat source to a second region to cause a second ATT process, the second ATT process being applied to the gaseous mixture;   wherein the second region is located closer to the heat source than the first region.   
     
     
         2 . The method of  claim 1 , further comprising:
 applying heat from the heat source to a third region to cause a third ATT process, the third ATT process being applied to the gaseous mixture;   wherein the third region is located closer to the heat source than the first region and the second region is located closer to the heat source than the third region.   
     
     
         3 . (canceled) 
     
     
         4 . (canceled) 
     
     
         5 . The method of  claim 2  wherein the dwell time in the third region is longer than the dwell time in the first region and longer than the dwell time in the second region. 
     
     
         6 . The method of  claim 1 , wherein the first region is a rotable retort and the second region is a gas enclosure, wherein the gas enclosure is located proximate the heat source. 
     
     
         7 . The method of  claim 1 , further comprising a heating system including the heat source and a thermally insulated chamber. 
     
     
         8 . A method of  claim 7 , wherein the second region is located within the thermally insulated chamber. 
     
     
         9 . An advanced thermal treatment (ATT) apparatus comprising:
 a first region;   a second advanced thermal treatment (ATT) region; and   a heat source being positioned such that, when operated
 the heat source heats the first region to cause a first ATT process, the first ATT process resulting in a gaseous mixture, and 
 the heat source heats the second region to cause a second ATT process, the second ATT process being applied to the gaseous mixture; 
   wherein the second region is located closer to the heat source than the first region.   
     
     
         10 . The apparatus of  claim 9 , further comprising a third region located in between the first region and the second region, wherein the heat source is further adapted to heat the third region to cause a third ATT process when the heat source is operated, the third ATT process being applied to the gaseous mixture. 
     
     
         11 . (canceled) 
     
     
         12 . (canceled) 
     
     
         13 . The apparatus of  claim 10 , wherein the third region is longer than the first region and longer than the second region, such that, during operation, the dwell time in the third region is longer than dwell time in the first region and longer than dwell time in the second region. 
     
     
         14 . The apparatus of  claim 9 , wherein the first region is a rotable retort and the second region is a gas enclosure, wherein the gas enclosure is located proximate the heat source. 
     
     
         15 . The apparatus of  claim 9 , further comprising a heating system including the heat source and a thermally insulated chamber. 
     
     
         16 . The apparatus of  claim 15 , wherein the second region is located within the thermally insulated chamber. 
     
     
         17 . The method of  claim 1 , wherein the first and second ATT processes each comprise a pyrolysis process. 
     
     
         18 . The method of  claim 1 , wherein the first and second ATT processes each comprise a gasification process. 
     
     
         19 . The apparatus of  claim 9 , wherein the first and second ATT processes each comprise a pyrolysis process. 
     
     
         20 . The apparatus of  claim 9 , wherein the first and second ATT processes each comprise a gasification process.