US2018196285A1PendingUtilityA1
Method for manufacturing an ophthalmic lens
Est. expiryNov 27, 2033(~7.3 yrs left)· nominal 20-yr term from priority
Inventors:Franco RigatoGlòria Casanellas PeñalverPau Artús ColomerAntoni Vilajoana MasJuan Carlos Dürsteler López
G02C 7/107G02B 1/14G02C 2202/16G02B 5/282G02B 1/115G02C 7/02G02B 1/11
45
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Abstract
A method for manufacturing an ophthalmic lens including selecting a base of polymeric material and applying a multiple layer structure coating. The coating is selected by designating an interphase, a first layer (of 91-169 nm) with a refraction index higher than 1.8, a second layer (of 128-248 nm) with a refraction index lower than 1.65, a third layer (of 73-159 nm) with a refraction index higher than 1.8 and a fourth layer (of 40-138 nm) with a refraction index lower than 1.8. A total thickness of the multiple layer structure is less than 600 nm. The structure has intermediate layer(s) with intermediate refraction indices, wherein a doublet of two adjacent layers that fulfil the thicknesses above is replaced by a triplet so that the thickness and an optical thickness of the triplet differ from those of the doublet by less than 5%, respectively.
Claims
exact text as granted — not AI-modified1 . A method for manufacturing an ophthalmic lens comprising the steps of:
selecting a base of polymeric material; selecting a coating having an interferential multiple layer structure, wherein the selecting the coating includes the steps of— designating a multiple layer structure including—
an interphase, orientated towards the base and selected from the group consisting of SiO x , SiO 2 , Cr, Ni/Cr, SnO 2 , Al 2 O 3 , AlN, ZnO, SiO/Cr, SiO x /Al 2 O 3 , ITO, and MoO 3 , with a thickness between 0 and 150 nm,
a first high refraction index layer selected from the group consisting of oxides, nitrides and oxynitrides of Zr, Ti, Sb, In, Sn, Ta, Nb, Hf and mixtures thereof, with a refraction index n D higher than 1.8,
a second low refraction index layer selected from the group consisting of SiO 2 , MgF 2 , Al 2 O 3 , LaF 3 and mixtures thereof, with a refraction index n D lower than 1.65,
a third high refraction index layer selected from the group consisting of oxides, nitrides and oxynitrides of Zr, Ti, Sb, In, Sn, Ta, Nb, Hf and mixtures thereof, with a refraction index n D higher than 1.8,
a fourth layer selected from the group consisting of SiO 2 , MgF 2 , Al 2 O 3 , LaF 3 and mixtures thereof, with a refraction index n D lower than 1.8,
wherein a total thickness of said multiple layer structure is at most 600 nm, measured from an outer surface of the interphase to an outer surface of the fourth layer, and wherein, a thickness of said first high refraction index layer is between 91 and 169 nm, a thickness of said second low refraction index layer is between 128 and 248 nm, a thickness of said third high refraction index layer is between 73 and 159 nm, and a thickness of said fourth layer is between 40 and 138 nm; substituting a doublet formed by said first high refraction index layer and said second low refraction index layer with a triplet formed by an intermediate layer, a substitute first high refraction index layer and a substitute second low refraction index layer, wherein said intermediate layer has a refraction index nD lower than 1.8 and with a thickness between greater than 0 and 160 nm, wherein said substitute first high refraction index layer is selected from the group consisting of oxides, nitrides and oxynitrides of Zr, Ti, Sb, In, Sn, Ta, Nb, Hf and mixtures thereof, with a refraction index nD higher than 1.8, wherein said substitute second low refraction index layer is selected from the group consisting of SiO 2 , MgF 2 , Al 2 O 3 , LaF 3 and mixtures thereof, with a refraction index n D lower than 1.65, wherein a total thickness of said multiple layer structure is at most 600 nm, measured from an outer surface of the interphase to an outer surface of the fourth layer, and wherein said triplet has a thickness that differs from a thickness of said doublet by less than 5%, and an optical thickness of said triplet differs from an optical thickness of said doublet by less than 5%; and applying the coating having the substituting triplet to said ophthalmic lens.
2 . A method for manufacturing an ophthalmic lens comprising the steps of:
selecting a base of polymeric material selecting a coating having an interferential multiple layer structure, wherein the selecting the coating includes the steps of designating a multiple layer structure including—
an interphase, orientated towards the base and selected from the group consisting of SiO x , SiO 2 , Cr, Ni/Cr, SnO 2 , Al 2 O 3 , AlN, ZnO, SiO/Cr, SiO x /Al 2 O 3 , ITO, and MoO 3 , with a thickness between 0 and 150 nm,
a first high refraction index layer selected from the group consisting of oxides, nitrides and oxynitrides of Zr, Ti, Sb, In, Sn, Ta, Nb, Hf and mixtures thereof, with a refraction index n D higher than 1.8,
a second low refraction index layer selected from the group consisting of SiO 2 , Mg F 2 , Al 2 O 3 , LaF 3 and mixtures thereof, with a refraction index n D lower than 1.65,
a third high refraction index layer selected from the group consisting of oxides, nitrides and oxynitrides of Zr, Ti, Sb, In, Sn, Ta, Nb, Hf and mixtures thereof, with a refraction index n D higher than 1.8,
a fourth layer selected from the group consisting of SiO 2 , MgF 2 , Al 2 O 3 , LaF 3 and mixtures thereof, with a refraction index n D lower than 1.8,
wherein a total thickness of said multiple layer structure is at most 600 nm, measured from an outer surface of the interphase to an outer surface of the fourth layer, and wherein, a thickness of said first high refraction index layer is between 91 and 169 nm, a thickness of said second low refraction index layer is between 128 and 248 nm, a thickness of said third high refraction index layer is between 73 and 159 nm, and a thickness of said fourth layer is between 40 and 138 nm; substituting a doublet formed by said first high refraction index layer and said second low refraction index layer with a triplet formed by a substitute first high refraction index layer, an intermediate layer and a substitute second low refraction index layer, wherein said intermediate layer has a refraction index n D between 1.65 and 1.8 and with a thickness between greater than 0 and 100 nm, wherein said substitute first high refraction index layer is selected from the group consisting of oxides, nitrides and oxynitrides of Zr, Ti, Sb, In, Sn, Ta, Nb, Hf and mixtures thereof, with a refraction index n D higher than 1.8, wherein said substitute second low refraction index layer is selected from the group consisting of SiO 2 , MgF 2 , Al 2 O 3 , LaF 3 and mixtures thereof, with a refraction index n D lower than 1.65, wherein a total thickness of said multiple layer structure is at most 600 nm, measured from an outer surface of the interphase to an outer surface of the fourth layer, and wherein said triplet has a thickness that differs from a thickness of said doublet by less than 5%, and an optical thickness of said triplet differs from an optical thickness of said doublet by less than 5%; and applying the coating having the substituting triplet to said ophthalmic lens.
3 . A method for manufacturing an ophthalmic lens, comprising the steps of
selecting a base of polymeric material; selecting a coating having an interferential multiple layer structure, wherein the selecting the coating includes the steps of designating a multiple layer structure—
an interphase, orientated towards the base and selected from the group consisting of SiO x , SiO 2 , Cr, Ni/Cr, SnO 2 , Al 2 O 3 , AlN, ZnO, SiO/Cr, SiO x /Al 2 O 3 , ITO, and MoO 3 , with a thickness between 0 and 150 nm,
a first high refraction index layer selected from the group consisting of oxides, nitrides and oxynitrides of Zr, Ti, Sb, In, Sn, Ta, Nb, Hf and mixtures thereof, with a refraction index n D higher than 1.8,
a second low refraction index layer selected from the group consisting of SiO 2 , MgF 2 , Al 2 O 3 , LaF 3 and mixtures thereof, with a refraction index n D lower than 1.65,
a third high refraction index layer selected from the group consisting of oxides, nitrides and oxynitrides of Zr, Ti, Sb, In, Sn, Ta, Nb, Hf and mixtures thereof, with a refraction index n D higher than 1.8,
a fourth layer selected from the group consisting of SiO 2 , MgF 2 , Al 2 O 3 , LaF 3 and mixtures thereof, with a refraction index n D lower than 1.8,
wherein a total thickness of said multiple layer structure is at most 600 nm, measured from an outer surface of the interphase to an outer surface of the fourth layer, and wherein, a thickness of said first high refraction index layer is between 91 and 169 nm, a thickness of said second low refraction index layer is between 128 and 248 nm, a thickness of said third high refraction index layer is between 73 and 159 nm, and a thickness of said fourth layer is between 40 and 138 nm; substituting a doublet formed by said second low refraction index layer and said third high refraction index layer with a triplet formed by a substitute second low refraction index layer, an intermediate layer and a substitute third high refraction index layer, wherein said intermediate layer has a refraction index n D between 1.65 and 1.8 and with a thickness between 0 and 110 nm, wherein said substitute second low refraction index layer is selected from the group consisting of SiO 2 , Mg F 2 , Al 2 O 3 , LaF 3 and mixtures thereof, with a refraction index n D lower than 1.65, wherein said substitute third high refraction index layer is selected from the group consisting of oxides, nitrides and oxynitrides of Zr, Ti, Sb, In, Sn, Ta, Nb, Hf and mixtures thereof, with a refraction index n D higher than 1.8, wherein a total thickness of said multiple layer structure is at most 600 nm, measured from an outer surface of the interphase to an outer surface of the fourth layer, and wherein said triplet has a thickness that differs from a thickness of said doublet by less than 5%, and an optical thickness of said triplet differs from an optical thickness of said doublet by less than 5%; and applying said coating with the substituting triplet to said ophthalmic lens.
4 . A method for manufacturing an ophthalmic lens comprising the steps of:
selecting a base of polymeric material; selecting a coating having an interferential multiple layer structure, wherein the selecting the coating includes the steps of— designating a multiple layer structure including—
an interphase, orientated towards the base and selected from the group consisting of SiO x , SiO 2 , Cr, Ni/Cr, SnO 2 , Al 2 O 3 , AlN, ZnO, SiO/Cr, SiO x /Al 2 O 3 , ITO, and MoO 3 , with a thickness between 0 and 150 nm,
a first high refraction index layer selected from the group consisting of oxides, nitrides and oxynitrides of Zr, Ti, Sb, In, Sn, Ta, Nb, Hf and mixtures thereof, with a refraction index n D higher than 1.8,
a second low refraction index layer selected from the group consisting of SiO 2 , MgF 2 , Al 2 O 3 , LaF 3 and mixtures thereof, with a refraction index n D lower than 1.65,
a third high refraction index layer selected from the group consisting of oxides, nitrides and oxynitrides of Zr, Ti, Sb, In, Sn, Ta, Nb, Hf and mixtures thereof, with a refraction index n D higher than 1.8,
a fourth layer selected from the group consisting of SiO 2 , MgF 2 , Al 2 O 3 , LaF 3 and mixtures thereof, with a refraction index n D lower than 1.8,
wherein a total thickness of said multiple layer structure is at most 600 nm, measured from an outer surface of the interphase to an outer surface of the fourth layer, and wherein, a thickness of said first high refraction index layer is between 91 and 169 nm, a thickness of said second low refraction index layer is between 128 and 248 nm, a thickness of said third high refraction index layer is between 73 and 159 nm, and a thickness of said fourth layer is between 40 and 138 nm; substituting a doublet formed by said first high refraction index layer and said second low refraction index layer with a triplet formed by an intermediate layer, a substitute first high refraction index layer and a substitute second low refraction index layer, wherein said intermediate layer has a refraction index nD lower than 1.8 and with a thickness between greater than 0 and 160 nm, substituting a doublet formed by said first high refraction index layer and said second low refraction index layer with a triplet formed by said substitute first high refraction index layer, a second intermediate layer and said substitute second low refraction index layer, wherein said second intermediate layer has a refraction index n D between 1.65 and 1.8 and with a thickness between greater than 0 and 100 nm, wherein said substitute first high refraction index layer is selected from the group consisting of oxides, nitrides and oxynitrides of Zr, Ti, Sb, In, Sn, Ta, Nb, Hf and mixtures thereof, with a refraction index n D higher than 1.8, wherein said substitute second low refraction index layer is selected from the group consisting of SiO 2 , MgF 2 , Al 2 O 3 , LaF 3 and mixtures thereof, with a refraction index n D lower than 1.65, wherein a total thickness of said multiple layer structure is at most 600 nm, measured from an outer surface of the interphase to an outer surface of the fourth layer, and wherein any of said triplets has a thickness that differs from a thickness of said doublet by less than 5%, and an optical thickness of said triplet differs from an optical thickness of said doublet by less than 5%; and applying the coating having the substituting triplets to said ophthalmic lens.
5 . A method for manufacturing an ophthalmic lens comprising the steps of:
selecting a base of polymeric material; selecting a coating having an interferential multiple layer structure, wherein the selecting the coating includes the steps of— designating a multiple layer structure including—
an interphase, orientated towards the base and selected from the group consisting of SiO x , SiO 2 , Cr, Ni/Cr, SnO 2 , Al 2 O 3 , AlN, ZnO, SiO/Cr, SiO x /Al 2 O 3 , ITO, and MoO 3 , with a thickness between 0 and 150 nm,
a first high refraction index layer selected from the group consisting of oxides, nitrides and oxynitrides of Zr, Ti, Sb, In, Sn, Ta, Nb, Hf and mixtures thereof, with a refraction index n D higher than 1.8,
a second low refraction index layer selected from the group consisting of SiO 2 , MgF 2 , Al 2 O 3 , LaF 3 and mixtures thereof, with a refraction index n D lower than 1.65,
a third high refraction index layer selected from the group consisting of oxides, nitrides and oxynitrides of Zr, Ti, Sb, In, Sn, Ta, Nb, Hf and mixtures thereof, with a refraction index n D higher than 1.8,
a fourth layer selected from the group consisting of SiO 2 , MgF 2 , Al 2 O 3 , LaF 3 and mixtures thereof, with a refraction index n D lower than 1.8,
wherein a total thickness of said multiple layer structure is at most 600 nm, measured from an outer surface of the interphase to an outer surface of the fourth layer, and wherein, a thickness of said first high refraction index layer is between 91 and 169 nm, a thickness of said second low refraction index layer is between 128 and 248 nm, a thickness of said third high refraction index layer is between 73 and 159 nm, and a thickness of said fourth layer is between 40 and 138 nm; substituting a doublet formed by said first high refraction index layer and said second low refraction index layer with a triplet formed by an intermediate layer, a substitute first high refraction index layer and a substitute second low refraction index layer, wherein said intermediate layer has a refraction index nD lower than 1.8 and with a thickness between greater than 0 and 160 nm, substituting a doublet formed by said second low refraction index layer and said third high refraction index layer with a triplet formed by said substitute second low refraction index layer, a second intermediate layer and a substitute third high refraction index layer, wherein said second intermediate layer has a refraction index n D between 1.65 and 1.8 and with a thickness between greater than 0 and 110 nm, wherein said substitute first high refraction index layer is selected from the group consisting of oxides, nitrides and oxynitrides of Zr, Ti, Sb, In, Sn, Ta, Nb, Hf and mixtures thereof, with a refraction index n D higher than 1.8, wherein said substitute second low refraction index layer is selected from the group consisting of SiO 2 , MgF 2 , Al 2 O 3 , LaF 3 and mixtures thereof, with a refraction index n p lower than 1.65, wherein said substitute third high refraction index layer is selected from the group consisting of oxides, nitrides and oxynitrides of Zr, Ti, Sb, In, Sn, Ta, Nb, Hf and mixtures thereof, with a refraction index n D higher than 1.8, wherein a total thickness of said multiple layer structure is at most 600 nm, measured from an outer surface of the interphase to an outer surface of the fourth layer, and wherein any of said triplets has a thickness that differs from a thickness of the corresponding doublet by less than 5%, and an optical thickness of any of said triplets differs from an optical thickness of the corresponding doublet by less than 5%; and applying the coating having the substituting triplets to said ophthalmic lens.
6 . A method for manufacturing an ophthalmic lens comprising the steps of:
selecting a base of polymeric material selecting a coating having an interferential multiple layer structure, wherein the selecting the coating includes the steps of designating a multiple layer structure including—
an interphase, orientated towards the base and selected from the group consisting of SiO x , SiO 2 , Cr, Ni/Cr, SnO 2 , Al 2 O 3 , AlN, ZnO, SiO/Cr, SiO x /Al 2 O 3 , ITO, and MoO 3 , with a thickness between 0 and 150 nm,
a first high refraction index layer selected from the group consisting of oxides, nitrides and oxynitrides of Zr, Ti, Sb, In, Sn, Ta, Nb, Hf and mixtures thereof, with a refraction index n D higher than 1.8,
a second low refraction index layer selected from the group consisting of SiO 2 , MgF 2 , Al 2 O 3 , LaF 3 and mixtures thereof, with a refraction index n D lower than 1.65,
a third high refraction index layer selected from the group consisting of oxides, nitrides and oxynitrides of Zr, Ti, Sb, In, Sn, Ta, Nb, Hf and mixtures thereof, with a refraction index n D higher than 1.8,
a fourth layer selected from the group consisting of SiO 2 , MgF 2 , Al 2 O 3 , LaF 3 and mixtures thereof, with a refraction index n D lower than 1.8,
wherein a total thickness of said multiple layer structure is at most 600 nm, measured from an outer surface of the interphase to an outer surface of the fourth layer, and wherein, a thickness of said first high refraction index layer is between 91 and 169 nm, a thickness of said second low refraction index layer is between 128 and 248 nm, a thickness of said third high refraction index layer is between 73 and 159 nm, and a thickness of said fourth layer is between 40 and 138 nm; substituting a doublet formed by said first high refraction index layer and said second low refraction index layer with a triplet formed by a substitute first high refraction index layer, an intermediate layer and a substitute second low refraction index layer, wherein said intermediate layer has a refraction index n D between 1.65 and 1.8 and with a thickness between greater than 0 and 100 nm, substituting a doublet formed by said second low refraction index layer and said third high refraction index layer with a triplet formed by said substitute second low refraction index layer, a second intermediate layer and a substitute third high refraction index layer, wherein said second intermediate layer has a refraction index n D between 1.65 and 1.8 and with a thickness between 0 and 110 nm, wherein said substitute first high refraction index layer is selected from the group consisting of oxides, nitrides and oxynitrides of Zr, Ti, Sb, In, Sn, Ta, Nb, Hf and mixtures thereof, with a refraction index n D higher than 1.8, wherein said substitute second low refraction index layer is selected from the group consisting of SiO 2 , MgF 2 , Al 2 O 3 , LaF 3 and mixtures thereof, with a refraction index n D lower than 1.65, wherein said substitute third high refraction index layer is selected from the group consisting of oxides, nitrides and oxynitrides of Zr, Ti, Sb, In, Sn, Ta, Nb, Hf and mixtures thereof, with a refraction index n D higher than 1.8, wherein a total thickness of said multiple layer structure is at most 600 nm, measured from an outer surface of the interphase to an outer surface of the fourth layer, and wherein any of said triplets has a thickness that differs from a thickness of the corresponding doublet by less than 5%, and an optical thickness of any of said triplets differs from an optical thickness of the corresponding doublet by less than 5%; and applying the coating having the substituting triplets to said ophthalmic lens.
7 . A method for manufacturing an ophthalmic lens comprising the steps of:
selecting a base of polymeric material; selecting a coating having an interferential multiple layer structure, wherein the selecting the coating includes the steps of— designating a multiple layer structure including—
an interphase, orientated towards the base and selected from the group consisting of SiO x , SiO 2 , Cr, Ni/Cr, SnO 2 , Al 2 O 3 , AlN, ZnO, SiO/Cr, SiO x /Al 2 O 3 , ITO, and MoO 3 , with a thickness between 0 and 150 nm,
a first high refraction index layer selected from the group consisting of oxides, nitrides and oxynitrides of Zr, Ti, Sb, In, Sn, Ta, Nb, Hf and mixtures thereof, with a refraction index n D higher than 1.8,
a second low refraction index layer selected from the group consisting of SiO 2 , MgF 2 , Al 2 O 3 , LaF 3 and mixtures thereof, with a refraction index n D lower than 1.65,
a third high refraction index layer selected from the group consisting of oxides, nitrides and oxynitrides of Zr, Ti, Sb, In, Sn, Ta, Nb, Hf and mixtures thereof, with a refraction index n D higher than 1.8,
a fourth layer selected from the group consisting of SiO 2 , MgF 2 , Al 2 O 3 , LaF 3 and mixtures thereof, with a refraction index n D lower than 1.8,
wherein a total thickness of said multiple layer structure is at most 600 nm, measured from an outer surface of the interphase to an outer surface of the fourth layer, and wherein, a thickness of said first high refraction index layer is between 91 and 169 nm, a thickness of said second low refraction index layer is between 128 and 248 nm, a thickness of said third high refraction index layer is between 73 and 159 nm, and a thickness of said fourth layer is between 40 and 138 nm; substituting a doublet formed by said first high refraction index layer and said second low refraction index layer with a triplet formed by an intermediate layer, a substitute first high refraction index layer and a substitute second low refraction index layer, wherein said intermediate layer has a refraction index nD lower than 1.8 and with a thickness between greater than 0 and 160 nm, substituting a doublet formed by said first high refraction index layer and said second low refraction index layer with a triplet formed by said substitute first high refraction index layer, a second intermediate layer and said substitute second low refraction index layer, wherein said second intermediate layer has a refraction index n D between 1.65 and 1.8 and with a thickness between greater than 0 and 100 nm, substituting a doublet formed by said second low refraction index layer and said third high refraction index layer with a triplet formed by said substitute second low refraction index layer, a third intermediate layer and a substitute third high refraction index layer, wherein said third intermediate layer has a refraction index n D between 1.65 and 1.8 and with a thickness between 0 and 110 nm, wherein said substitute first high refraction index layer is selected from the group consisting of oxides, nitrides and oxynitrides of Zr, Ti, Sb, In, Sn, Ta, Nb, Hf and mixtures thereof, with a refraction index n D higher than 1.8, wherein said substitute second low refraction index layer is selected from the group consisting of SiO 2 , MgF 2 , Al 2 O 3 , LaF 3 and mixtures thereof, with a refraction index n D lower than 1.65, wherein said substitute third high refraction index layer is selected from the group consisting of oxides, nitrides and oxynitrides of Zr, Ti, Sb, In, Sn, Ta, Nb, Hf and mixtures thereof, with a refraction index n D higher than 1.8, wherein a total thickness of said multiple layer structure is at most 600 nm, measured from an outer surface of the interphase to an outer surface of the fourth layer, and wherein any of said triplets has a thickness that differs from a thickness of the corresponding doublet by less than 5%, and an optical thickness of any of said triplets differs from an optical thickness of the corresponding doublet by less than 5%; and applying the coating having the substituting triplets to said ophthalmic lens.
8 . The method according to any one of claim 1 , 2 , 3 , 4 , 5 , 6 or 7 , wherein the thickness x of said first high refraction index layer, the thickness y of said second low refraction index layer, the thickness z of said third high refraction index layer and the thickness t of said fourth layer fulfil the following relation:
(
x
y
z
t
)
-
(
129.5
188.3
116.0
89.0
)
·
A
·
(
x
-
129.5
y
-
188.3
z
-
116.0
t
-
89.0
)
≤
1
where
A
=
(
8.29
·
10
4
-
1.76
·
10
-
4
,
-
1.18
·
10
-
4
1.50
·
10
-
4
-
1.76
·
10
-
4
3.34
·
10
-
4
-
1.80
·
10
-
5
-
3.50
·
10
-
5
-
1.18
·
10
-
4
-
1.80
·
10
-
5
7.16
·
10
-
4
-
2.60
·
10
-
4
1.50
·
10
-
4
-
3.50
·
10
-
5
-
2.60
·
10
-
4
5.34
·
10
-
4
)
.
9 . The method according to any one of claim 1 , 2 , 3 , 4 , 5 , 6 or 7 , wherein, the thickness x of said first high refraction index layer, the thickness y of said second low refraction layer, the thickness z of said third high refraction index layer and the thickness t of said fourth layer fulfil the following relation:
(
x
y
z
t
)
-
(
129.7
189.7
114.2
87.2
)
·
A
·
(
x
-
129.7
y
-
189.7
z
-
114.2
t
-
87.2
)
≤
1
where
A
=
(
1.53
·
10
-
3
-
3.41
·
10
-
4
-
1.35
·
10
-
4
8.99
·
10
-
5
-
3.41
·
10
-
4
4.82
-
4
-
1.86
·
10
-
5
9.77
·
10
-
6
-
1.35
·
10
-
4
-
1.86
·
10
-
5
1.12
·
10
-
3
-
2.53
·
10
-
4
8.99
·
10
-
5
9.77
·
10
-
6
-
2.53
·
10
-
4
8.44
·
10
-
4
)
.
10 . The method according to any one of claim 1 , 2 , 3 , 4 , 5 , 6 or 7 , wherein a simulation of reflection and transmission curves of said multiple layer structure has the following characteristics:
a visible reflection R vis by a light incidence angle of 15° lower than 2.5%, calculated as an average of a reflection value in a range of 380-780 nm, weighted by an efficiency spectrum of spectral light for day light and by a spectral distribution of the illuminant D65, according to Spanish standard UNI-EN ISO 13666:1998,
a visible reflection R vis by a light incidence angle of 60° lower than 5.0%, calculated as an average of a reflection value in a range of 380-780 nm, weighted by an efficiency spectrum of spectral light for day light and by a spectral distribution of the illuminant D65, according to Spanish standard UNI-EN ISO 13666:1998, and
a transmission value in the infra-red A T IR-A lower than 76%, calculated as an average transmission value in a range of 780-1400 nm according to the following formula:
T
IR
-
A
=
∑
λ
∈
A
T
(
λ
)
14
where
A
=
{
780
,
800
,
850
,
900
,
950
,
1000
,
1050
,
1100
,
1150
,
1200
,
1250
,
1300
,
1350
,
1400
}
.
11 . The method according to any one of claim 1 , 2 , 3 , 4 , 5 , 6 or 7 , wherein a simulation of reflection and transmission curves of said multiple layer structure has a blue light transmittance value T azul lower than 95%, calculated as an average transmission value in a range of 410-460 nm according to the following formula:
T
azul
=
∑
λ
∈
B
T
(
λ
)
6
where
B
=
{
410
,
420
,
430
,
440
,
450
,
460
}
.
12 . The method according to any one of claim 1 , 2 , 3 , 4 , 5 , 6 or 7 , wherein said fourth layer has a refraction index n D between 1.4 and 1.6 and a thickness between 50 and 124 nm.
13 . The method according to claim 1 , wherein said intermediate layer has a thickness between greater than 0 and 25 nm.
14 . The method according to any one of claim 1 , 2 , 3 , 4 , 5 , 6 or 7 , wherein at least one of said first high refraction index layer or said third high refraction index layer is made up of two high refraction index sub-layers.
15 . The method according to any one of claim 1 , 2 , 3 , 4 , 5 , 6 or 7 , wherein at least one of said second low refraction index layer or said fourth layer is made up of two low refraction index sub-layers.Join the waitlist — get patent alerts
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