Method and system for optimizing optical inspection of patterned structures

Abstract

A system and method are presented for use in inspection of patterned structures. The system comprises: data input utility for receiving first type of data indicative of image data on at least a part of the patterned structure, and data processing and analyzing utility configured and operable for analyzing the image data, and determining a geometrical model for at least one feature of a pattern in said structure, and using said geometrical model for determining an optical model for second type of data indicative of optical measurements on a patterned structure.

1 - 21 . (canceled) 
     
     
         22 . A method for process control of the manufacture of patterned structures, the method being carried out by a computer system comprising data input and output, memory and a data processing utility, the method comprising:
 receiving, by the data input, measured data about a structure among the patterned structures being processed, the measured data comprising first measured data and second measured data of first and second different types corresponding to first and second responses of, respectively, first and second sites of the structure containing first and second different targets, and measured in first type and second type measurements based on different physical principles; and   processing and analyzing the first and second types measured data by said data processing utility, said processing and analyzing comprising: determining a correlation function between the first and second types measured data obtained on the first and second different targets, and determining, from said correlation function, data indicative of at least one correlation parameter of the patterned structure; and utilizing said data indicative of the at least one correlation parameter to optimize at least one data interpretation model for interpreting measured data of at least one of the first and second types.   
     
     
         23 . A method for process control of the manufacture of patterned structures, the method comprising:
 performing measurements on a patterned structure, comprising performing at least one measurement of a first type by a first measurement tool on a first site of the structure comprising a first target and generating first type measured data, and performing at least one second measurement of a second type by a second measurement tool on a second site of said structure comprising a second different target and generating second type measured data, the first type and the second type measurements being based on different physical principles;   processing the first type measured and the second type measured data to determine at least one parameter of the structure characterizing the process of manufacture of the patterned structures, said processing comprising: determining a correlation function between the first type measured data and the second type measured data and utilizing data indicative of at least one correlation parameter to optimize interpretation of at least one of the first type measured data and the second type measured data and determine the at least one parameter of the structure from the at least one of the first and second measured data.