Growing graphene on substrates

Abstract

Embodiments described herein provide methods and apparatus for forming graphitic carbon such as graphene on a substrate. The method includes providing a precursor comprising a linear conjugated hydrocarbon, depositing a hydrocarbon layer from the precursor on the substrate, and forming graphene from the hydrocarbon layer by applying energy to the substrate. The precursor may include template molecules such as polynuclear aromatics, and may be deposited on the substrate by spinning on, by spraying, by flowing, by dipping, or by condensing. The energy may be applied as radiant energy, thermal energy, or plasma energy.

1 . An apparatus for forming a graphene layer on a substrate, the apparatus comprising:
 a deposition chamber having a substrate support disposed therein;   a liquid precursor applicator disposed in the deposition chamber opposite the substrate support;   one or more radiant energy assemblies disposed in the chamber opposite the substrate support; and   a conduit coupled to the liquid precursor applicator, wherein the conduit is configured to deliver a hydrocarbon precursor and a solvent to the liquid precursor applicator.   
     
     
         2 . The apparatus of  claim 1 , wherein the substrate support is coupled to a motor and configured to rotate. 
     
     
         3 . The apparatus of  claim 2 , wherein the motor is configured to rotate the substrate support between about 100 revolutions per second and about 1000 revolutions per second. 
     
     
         4 . The apparatus of  claim 1  further comprising:
 a nozzle coupled to the liquid precursor applicator. 
 
     
     
         5 . The apparatus of  claim 4 , wherein the liquid precursor applicator is disposed adjacent a central region of the substrate support. 
     
     
         6 . The apparatus of  claim 1 , wherein the one or more radiant energy assemblies comprise a radiant energy source and a reflector. 
     
     
         7 . The apparatus of  claim 6 , wherein the radiant energy source is an ultraviolet energy source. 
     
     
         8 . The apparatus of  claim 7 , wherein the ultraviolet energy source is an ultraviolet lamp, an ultraviolet light emitting diode, an ultraviolet laser source, or combinations thereof. 
     
     
         9 . The apparatus of  claim 8 , wherein the ultraviolet laser source is a xenon excimer laser, an argon fluorine excimer laser, or krypton fluorine excimer laser. 
     
     
         10 . The apparatus of  claim 7 , wherein the ultraviolet energy source is configured to generate a power density of between about 1 mW/cm 2  and about 1 W/cm 2 . 
     
     
         11 . The apparatus of  claim 1 , wherein the hydrocarbon precursor is one or more of a linear conjugated hydrocarbon, an aromatic hydrocarbon, a cycloaliphatic hydrocarbon, derivatives thereof, and combinations thereof. 
     
     
         12 . The apparatus of  claim 11 , wherein the linear conjugated hydrocarbon is selected from the group consisting of 1,3-pentadiene, 1,3-hexadiene, 2,4-pentadiene, 2,4-hexadiene, and 1,3,5-heptatriene. 
     
     
         13 . The apparatus of  claim 1 , wherein the solvent is benzene. 
     
     
         14 . An apparatus for forming a graphene layer on a substrate, the apparatus comprising:
 a substrate handling module having a robot disposed therein;   a deposition chamber coupled to the substrate handling module, the deposition chamber comprising:
 a substrate support; 
 a liquid precursor applicator disposed in the deposition chamber opposite the substrate support; 
 one or more radiant energy assemblies disposed in the chamber opposite the substrate support; and 
 a conduit coupled to the liquid precursor applicator, wherein the conduit is configured to deliver a hydrocarbon precursor and a solvent to the liquid precursor applicator; and 
   a cure chamber coupled to the substrate handling module.   
     
     
         15 . The apparatus of  claim 14 , wherein a motor is coupled to the substrate support and the motor is configured to rotate the substrate support between about 100 revolutions per second and about 1000 revolutions per second. 
     
     
         16 . The apparatus of  claim 14  further comprising:
 a nozzle coupled to the liquid precursor applicator. 
 
     
     
         17 . The apparatus of  claim 16 , wherein the liquid precursor applicator is disposed adjacent a central region of the substrate support. 
     
     
         18 . The apparatus of  claim 14  further comprising:
 a drying chamber coupled to the substrate handling module. 
 
     
     
         19 . The apparatus of  claim 14  further comprising:
 a pre-treatment chamber coupled to the substrate handling module. 
 
     
     
         20 . An apparatus for forming a graphene layer on a substrate, the apparatus comprising:
 a substrate handling module having a robot disposed therein;   a deposition chamber coupled to the substrate handling module, the deposition chamber comprising:
 a substrate support; 
 a liquid precursor applicator disposed in the deposition chamber opposite the substrate support; 
 one or more radiant energy assemblies disposed in the chamber opposite the substrate support; and 
 a conduit coupled to the liquid precursor applicator, wherein the conduit is configured to deliver a hydrocarbon precursor and a solvent to the liquid precursor applicator; and 
   a cure chamber coupled to the substrate handling module, wherein the cure chamber comprises an ultraviolet radiation source.