US2018148859A1PendingUtilityA1

Photosensitive fibers and method for forming fiber pattern

Assignee: NISSAN CHEMICAL IND LTDPriority: Apr 22, 2015Filed: Apr 22, 2016Published: May 31, 2018
Est. expiryApr 22, 2035(~8.7 yrs left)· nominal 20-yr term from priority
D01F 6/50D01F 1/10G03F 7/022G03F 7/038D01D 5/003G03F 7/039G03F 7/0382D01D 5/04G03F 7/0392
48
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Claims

Abstract

The invention provides a method capable of conveniently producing an intricate and fine resist pattern. The invention also provides a fiber containing a positive-type or negative-type photosensitive material.

Claims

exact text as granted — not AI-modified
1 . A fiber comprising a positive-type or negative-type photosensitive material. 
     
     
         2 . The fiber according to  claim 1 , wherein the positive-type photosensitive material comprises (i) a novolac resin and a dissolution inhibitor, (ii) a polyvinylphenol resin or acrylic resin, and a photoacid generator, or (iii) a polyvinylphenol resin or acrylic resin comprising a structural unit having a photoacid generating group in a side chain. 
     
     
         3 . The fiber according to  claim 1 , wherein the negative-type photosensitive material comprises (A) a polymer compound comprising a structural unit having, in a side chain, at least one kind of organic group selected from a hydroxy group, a hydroxymethyl group and an alkoxymethyl group having 1-5 carbon atoms, and (B) a photoacid generator. 
     
     
         4 . The fiber according to  claim 1 , which is a photosensitive fiber. 
     
     
         5 . The fiber according to  claim 1 , comprising a nano fiber and/or a micro fiber. 
     
     
         6 . A composition for producing a photosensitive fiber, comprising a positive-type or negative-type photosensitive material, and a solvent. 
     
     
         7 . The composition according to  claim 6 , wherein the positive-type photosensitive material comprises (i) a novolac resin and a dissolution inhibitor, (ii) a polyvinylphenol resin or acrylic resin, and a photoacid generator, or (iii) a polyvinylphenol resin or acrylic resin comprising a structural unit having a photoacid generating group in a side chain. 
     
     
         8 . The composition according to  claim 6 , wherein the negative-type photosensitive material comprises (A) a polymer compound comprising a structural unit having, in a side chain, at least one kind of organic group selected from a hydroxy group, a hydroxymethyl group and an alkoxymethyl group having 1-5 carbon atoms, and (B) a photoacid generator. 
     
     
         9 . A production method of a photosensitive fiber, comprising a step of spinning the composition according to  claim 6 . 
     
     
         10 . The method according to  claim 9 , wherein the above-mentioned spinning is electrospinning. 
     
     
         11 . The method according to  claim 9 , comprising a step of heating a spun fiber at 70-300° C. 
     
     
         12 . A method of forming a fiber pattern, comprising
 the first step for forming a fiber layer of photosensitive fibers on a substrate,   the second step for exposing the fiber layer to light via a mask, and   the third step for developing the fiber layer with a developing solution.   
     
     
         13 . The method according to  claim 12 , wherein the photosensitive fibers are fibers comprising a positive-type or negative-type photosensitive material. 
     
     
         14 . The method according to  claim 12 , wherein the second step comprises heating the fiber layer after light exposure. 
     
     
         15 . The method according to  claim 12 , wherein the developing solution comprises water or an organic solvent. 
     
     
         16 . A fiber pattern formed using the fiber according to  claim 1 . 
     
     
         17 . A substrate having the fiber pattern according to  claim 16  on a surface. 
     
     
         18 . A method of producing a fiber pattern, comprising
 the first step for forming a fiber layer of photosensitive fibers on a substrate,   the second step for exposing the fiber layer to light via a mask, and   the third step for developing the fiber layer with a developing solution.   
     
     
         19 . A method of producing a substrate with a fiber pattern, comprising
 the first step for forming a fiber layer of photosensitive fibers on a substrate,   the second step for exposing the fiber layer to light via a mask, and   the third step for developing the fiber layer with a developing solution.

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