Exposure apparatus

Abstract

An exposure apparatus that can prevent disadvantages due to a leaked liquid is provided. The exposure apparatus includes a substrate holder that includes a peripheral wall portion and supporting portions located on an inside of the peripheral wall portion and that supports a substrate with the supporting portions by negatively pressurizing a space surrounded by the peripheral wall portion, and a recovery mechanism that includes a collection inlets provided on the inside of the peripheral wall portion and a vacuum system connected to the collection inlets, in which a liquid penetrated from an outer periphery of the substrate is sucked and recovered, in the state with an upper surface of the peripheral wall portion and a back surface of the substrate being spaced at a first distance.

What is claimed is: 
     
         1 . A liquid immersion exposure apparatus comprising:
 a projection system;   a nozzle member having an opening via which an exposure light is projected, the nozzle member having a supply port facing downwardly and a recovery port facing downwardly; and   a substrate stage on which a substrate is held,   wherein the substrate stage has (i) an upper surface on a portion of which a liquid immersion area is formed, the upper surface including a liquid repellent surface, (ii) a peripheral wall portion having an upper surface facing a back surface of the held substrate and (iii) a supporting portion located on an inside of the peripheral wall portion, by which the substrate is supported, and   wherein the substrate stage has a recovery port for collecting liquid which comes from a gap between the upper surface of the substrate stage and an upper surface of the held substrate.