Method of manufacturing display device using bottom surface exposure

Abstract

A method for manufacturing a display device includes forming a plurality of light blocking patterns on a first surface of a transparent substrate, wherein a first light blocking pattern of the plurality of light blocking patterns has a different line width than a second light blocking pattern of the plurality of light blocking patterns. An insulating layer is formed on the first surface of the transparent substrate and the light blocking patterns. A conductive layer is formed on the insulating layer. A photo-resist layer is formed on the conductive layer. The photo-resist layer is exposed with ultraviolet rays through a second surface of the transparent substrate, wherein the first and second surfaces of the transparent substrate are opposite to each other. The photo-resist layer is developed. The conductive layer is etched using the photo-resist layer as a mask. The photo-resist layer is removed.

What is claimed is: 
     
         1 . A display device, comprising:
 a transparent thin film encapsulation layer comprising a first surface and a second surface, wherein the first surface and the second surface are opposite to each other;   a red pixel, a green pixel, and a blue pixel disposed on the first surface;   a black matrix disposed on the first surface and disposed between adjacent pixels among the red, green, and blue pixels; and   a transparent electrode layer disposed on the second surface,   wherein a width of the transparent electrode layer is smaller than a width of the black matrix.   
     
     
         2 . The display device of  claim 1 , wherein the transparent electrode layer completely overlaps the black matrix. 
     
     
         3 . The display device of  claim 1 , wherein the transparent electrode layer directly contacts the second surface. 
     
     
         4 . The display device of  claim 1 , wherein the black matrix directly contacts the first surface. 
     
     
         5 . The display device of  claim 1 , wherein the black matrix includes a plurality of black matrix patterns, wherein a first black matrix pattern of the plurality of black matrix patterns has a width that is different from a width of a second black matrix pattern of the plurality of black matrix patterns. 
     
     
         6 . The display device of  claim 1 , wherein the transparent electrode layer includes indium zinc oxide (IZO) or indium tin oxide (ITO). 
     
     
         7 . The display device of  claim 1 , wherein the transparent electrode layer is formed by a photolithography process. 
     
     
         8 . The display device of  claim 7 , wherein the photolithography process comprises exposing a photo-resist layer on the transparent electrode layer with ultraviolet rays through the first surface of the transparent thin film encapsulation layer and etching the transparent electrode layer using the photo-resist layer as a mask. 
     
     
         9 . The display device of  claim 8 , wherein the etching over-etches the transparent electrode layer such that the width of the transparent electrode layer is smaller than a width of the photo-resist layer in a portion of the photo-resist layer overlapping with a corresponding portion of the black matrix.