Exposure apparatus, exposure method, method for manufacturing device

Abstract

A liquid immersion exposure apparatus in which a substrate is exposed via a projection optical system, includes: a liquid supply flow path; a first flow path which receives a first portion of immersion liquid from the liquid supply flow path; a second flow path which receive a second portion of the immersion liquid from the liquid supply flow path; a supply port via which the first portion of the immersion liquid is supplied; and an adjusting device provided downstream of the liquid supply flow path, which adjusts a quantity of the first portion of the immersion liquid. During the exposure of the substrate, the first portion of the immersion liquid is supplied to form a liquid immersion area covering a portion of an upper surface of the substrate, and the substrate is exposed with an exposure light through the liquid immersion area.

What is claimed is: 
     
         1 . A liquid immersion exposure apparatus in which a substrate is exposed via a projection optical system, the apparatus comprising:
 a liquid supply flow path;   a first flow path which receives a first portion of immersion liquid from the liquid supply flow path;   a second flow path which receive a second portion of the immersion liquid from the liquid supply flow path;   a supply port via which the first portion of the immersion liquid is supplied; and   an adjusting device provided downstream of the liquid supply flow path, which adjusts a quantity of the first portion of the immersion liquid,   wherein during the exposure of the substrate, the first portion of the immersion liquid is supplied to form a liquid immersion area covering a portion of an upper surface of the substrate, and the substrate is exposed with an exposure light through the liquid immersion area.   
     
     
         2 . The apparatus according to  claim 1 , wherein the adjusting device is disposed upstream of the supply port.