Substrate Processing Apparatus, Substrate Processing Method, and Recording Medium

Abstract

A substrate processing apparatus includes a nozzle for discharging a processing solution, a processing solution supply part for supplying the processing solution to the nozzle and a controller. The processing solution supply part includes a tank, a first conduit for guiding the processing solution from the tank to the nozzle, a pump installed in the first conduit, and a filter having first and second spaces, and a filtering member for separating between the first space and the second space. The controller performs a first control process of controlling the processing solution supply part to flow the processing solution from the first space to the second space through the filtering member by the pump, and after the first control process, a second control process of controlling the processing solution supply part to flow the processing solution from the second space to the first space through the filtering member by the pump.

What is claimed is: 
     
         1 . A substrate processing apparatus comprising:
 a nozzle configured to discharge a processing solution;   a processing solution supply part configured to supply the processing solution to the nozzle; and   a controller,   wherein the processing solution supply part includes:   a tank in which the processing solution is received;   a first conduit configured to guide the processing solution from the tank to the nozzle;   a pump installed in the first conduit; and   a filter installed in the first conduit between the tank and the pump and having a first space defined at the side of the tank, a second space defined at the side of the pump, and a filtering member configured to separate between the first space and the second space, and   the controller is configured to perform:   a first control process of controlling the processing solution supply part to flow the processing solution from the first space to the second space through the filtering member by the pump; and   after the first control process, a second control process of controlling the processing solution supply part to flow the processing solution from the second space to the first space through the filtering member by the pump.   
     
     
         2 . The apparatus of  claim 1 , wherein the second control process comprises discharging the processing solution introduced into the first space from the second space through the filtering member with an increase in an internal pressure of the filter. 
     
     
         3 . The apparatus of  claim 2 , wherein the controller is configured to initiate the second control process with an increase in a difference between an internal pressure of the first space and an internal pressure of the second space. 
     
     
         4 . The apparatus of  claim 2 , wherein the processing solution supply part further includes:
 a pressurizing part configured to pressurize the processing solution received in the tank toward the pump; and   a second conduit connected between the first space and the second space while bypassing the filtering member,   wherein the controller is configured to further perform, after the processing solution flows from the second space to the first space through the filtering member under the second control process, a third control process of controlling the processing solution supply part to guide the processing solution pressurized by the pressurizing part to the second space through the second conduit and to flow the processing solution from the second space to the first space through the filtering member.   
     
     
         5 . The apparatus of  claim 2 , wherein the controller is configured to further perform, before the first control process, a fourth control process of controlling the processing solution supply part to flow the processing solution from the second space to the first space through the filtering member by the pump. 
     
     
         6 . The apparatus of  claim 1 , wherein the controller is configured to initiate the second control process with an increase in a difference between an internal pressure of the first space and an internal pressure of the second space. 
     
     
         7 . The apparatus of  claim 6 , wherein the processing solution supply part further includes:
 a pressurizing part configured to pressurize the processing solution received in the tank toward the pump; and   a second conduit connected between the first space and the second space while bypassing the filtering member,   wherein the controller is configured to further perform, after the processing solution flows from the second space to the first space through the filtering member under the second control process, a third control process of controlling the processing solution supply part to guide the processing solution pressurized by the pressurizing part to the second space through the second conduit and to flow the processing solution from the second space to the first space through the filtering member.   
     
     
         8 . The apparatus of  claim 6 , wherein the controller is configured to further perform, before the first control process, a fourth control process of controlling the processing solution supply part to flow the processing solution from the second space to the first space through the filtering member by the pump. 
     
     
         9 . The apparatus of  claim 1 , wherein the processing solution supply part further comprises:
 a pressurizing part configured to apply pressure to the processing solution within the tank to direct the same toward the pump; and   a second conduit connecting the first space and the second space without going through the filtering member,   wherein the controller is configured to further perform, after the processing solution flows from the second space to the first space through the filtering member under the second control process, a third control process of controlling the processing solution supply part to guide the processing solution pressurized by the pressurizing part to the second space through the second conduit and to flow the processing solution from the second space to the first space through the filtering member.   
     
     
         10 . The apparatus of  claim 9 , wherein the third control process includes controlling the processing solution supply part to open a flow path of the processing solution through the second conduit when an internal pressure of the second space is lower than an internal pressure of the tank. 
     
     
         11 . The apparatus of  claim 9 , wherein the controller is configured to further perform, before the first control process, a fourth control process of controlling the processing solution supply part to flow the processing solution from the second space to the first space through the filtering member by the pump. 
     
     
         12 . The apparatus of  claim 1 , wherein the controller is configured to further perform, before the first control process, a fourth control process of controlling the processing solution supply part to flow the processing solution from the second space to the first space through the filtering member by the pump. 
     
     
         13 . The apparatus of  claim 12 , wherein the controller is configured to complete the fourth control process with a decrease in a difference between an internal pressure of the first space and an internal pressure of the second space. 
     
     
         14 . The apparatus of  claim 12 , wherein the controller is configured to further perform, after the fourth control process and before the first control process, a fifth control process of controlling the processing solution supply part to flow the processing solution from the first space to the second space through the filtering member by the pump. 
     
     
         15 . A method of processing a substrate using a substrate processing apparatus which is provided with a nozzle configured to discharge a processing solution and a processing solution supply part configured to supply the processing solution to the nozzle, the processing solution supply part including a tank in which the processing solution is received, a first conduit configured to guide the processing solution from the tank to the nozzle, a pump installed in the first conduit, and a filter installed in the first conduit between the tank and the pump and having a first space defined at the side of the tank, a second space defined at the side of the pump, and a filtering member configured to separate between the first space and the second space, the method comprising:
 flowing the processing solution from the first space to the second space through the filtering member by the pump; and   after the flowing the processing solution from the first space to the second space through the filtering member, directing the processing solution from the second space to the first space through the filtering member by the pump.   
     
     
         16 . The method of  claim 15 , wherein the directing of the processing solution from the second space to the first space through the filtering member includes discharging the processing solution introduced into the first space from the second space through the filtering member with an increase in an internal pressure of the filter. 
     
     
         17 . The method of  claim 15 , further comprising: changing the flowing the processing solution from the first space to the second space through the filtering member into the directing the processing solution from the second space to the first space through the filtering member with an increase in a difference between an internal pressure of the first space and an internal pressure of the second space. 
     
     
         18 . The method of  claim 15 , further comprising:
 using the substrate processing apparatus in which the processing solution supply part further includes a pressurizing part configured to pressurize the processing solution received in the tank toward the pump and a second conduit connected between the first space and the second space while bypassing the filtering member,   after the directing the processing solution from the second space to the first space through the filtering member, guiding the processing solution pressurized by the pressurizing part to the second space through the second conduit so that the processing solution flows from the second space to the first space through the filtering member.   
     
     
         19 . The method of  claim 18 , wherein the guiding the processing solution pressurized by the pressurizing part to the second space through the second conduit allows the directing the processing solution from the second space to the first space through the filtering member to open a flow path of the processing solution through the second conduit when an internal pressure of the second space is lower than an internal pressure of the tank. 
     
     
         20 . A non-transitory computer-readable recording medium having a program recorded therein for causing an apparatus to execute the method of  claim 15 .