US2018036805A1PendingUtilityA1
Coated copper particles and method for producing the same
Est. expiryMay 30, 2034(~7.8 yrs left)· nominal 20-yr term from priority
B22F 1/054B22F 1/102B22F 9/30B22F 9/24H01B 5/00B22F 2301/10H01B 13/00H01B 1/22B22F 9/305B22F 1/0018B22F 1/0062B22F 1/02Y02E60/324Y02E60/32
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Claims
Abstract
A method for producing coated copper particles having a surface coated with an aliphatic carboxylic acid, wherein the method comprises obtaining a reaction mixture containing copper formate, an amino alcohol, an aliphatic carboxylic acid having an aliphatic group having 5 or more carbon atoms, and a solvent, and subjecting a complex compound formed in the reaction mixture to thermal decomposition treatment to form metal copper, wherein a ΔSP value, which is a difference in SP value between the amino alcohol and the solvent, is 4.2 or more.
Claims
exact text as granted — not AI-modified1 .- 6 . (canceled)
7 . A coated copper particle containing a copper particle coated with an aliphatic carboxylic acid having an aliphatic group having 5 or more carbon atoms, wherein the coated copper particle has an average primary particle diameter D SEM of 0.02 to 0.2 mm, as determined by a SEM examination, wherein a value of a coefficient of variation of the particle size distribution (standard deviation SD/average primary particle diameter DSEM) is 0.1 to 0.5, and the coated copper particle has a DXRD/DSEM ratio of 0.25 to 1.00 wherein the DXRD/DSEM ratio is a ratio of a crystal particle diameter DXRD, as determined by a powder X-ray analysis, to an average primary particle diameter DSEM, as determined by a SEM examination.
8 . A coated copper particle having a surface coated with an aliphatic carboxylic acid having an aliphatic group having 5 or more carbon atoms, wherein the coated copper particle has a DXRD/DSEM ratio of 0.25 to 1.00 wherein the DXRD/DSEM ratio is a ratio of a crystal particle diameter DXRD, as determined by a powder X-ray analysis, to an average primary particle diameter DSEM, as determined by a SEM examination, and wherein the coated copper particle is a thermal decomposition product of a complex compound formed in a reaction mixture containing copper formate, an amino alcohol, an aliphatic carboxylic acid having an aliphatic group having 5 or more carbon atoms, and a solvent, wherein a DSP value, which is a difference in SP value between the amino alcohol and the solvent, is 4.2 or more.
9 .- 11 . (canceled)
12 . The coated copper particle according to claim 7 which is a thermal decomposition product of a complex compound formed in a reaction mixture containing copper formate, an amino alcohol, an aliphatic carboxylic acid having an aliphatic group having 5 or more carbon atoms, and a solvent, wherein a DSP value, which is a difference in SP value between the amino alcohol and the solvent, is 4.2 or more.
13 . The coated copper particles according to claim 7 , wherein the aliphatic carboxylic acid physically adsorbs on the surface of the copper particles.
14 . The coated copper particles according to claim 8 , wherein the aliphatic carboxylic acid physically adsorbs on the surface of the copper particles.
15 . The coated copper particles according to claim 12 , wherein the aliphatic carboxylic acid physically adsorbs on the surface of the copper particles.
16 . A conductive composition comprising coated copper particles according to claim 7 and a medium.
17 . A conductive composition comprising coated copper particles according to claim 8 and a medium.
18 . A conductive composition comprising coated copper particles according to claim 12 and a medium.
19 . A conductive composition comprising coated copper particles according to claim 13 and a medium.
20 . A conductive composition comprising coated copper particles according to claim 14 and a medium.
21 . A conductive composition comprising coated copper particles according to claim 15 and a medium.
22 . A circuit formed article comprising a substrate, and a wiring pattern which is disposed on the substrate, and which is a thermal treatment product of the conductive composition according to claim 16 .
23 . A circuit formed article comprising a substrate, and a wiring pattern which is disposed on the substrate, and which is a thermal treatment product of the conductive composition according to claim 17 .
24 . A circuit formed article comprising a substrate, and a wiring pattern which is disposed on the substrate, and which is a thermal treatment product of the conductive composition according to claim 18 .
25 . A circuit formed article comprising a substrate, and a wiring pattern which is disposed on the substrate, and which is a thermal treatment product of the conductive composition according to claim 19 .
26 . A composition comprising the coated copper particles according to claim 7 , amino alcohol, and a solvent, wherein a DSP value, which is a difference in SP value between the amino alcohol and the solvent, is 4.2 or more.
27 . A composition comprising the coated copper particles according to claim 8 , amino alcohol, and a solvent, wherein a DSP value, which is a difference in SP value between the amino alcohol and the solvent, is 4.2 or more.
28 . A composition comprising the coated copper particles according to claim 12 , amino alcohol, and a solvent, wherein a DSP value, which is a difference in SP value between the amino alcohol and the solvent, is 4.2 or more.
29 . A composition comprising the coated copper particles according to claim 13 , amino alcohol, and a solvent, wherein a DSP value, which is a difference in SP value between the amino alcohol and the solvent, is 4.2 or more.Join the waitlist — get patent alerts
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