Magnetron plasma apparatus

Abstract

A magnetron plasma apparatus boosted by hollow cathode plasma includes at least one electrically connected pair of a first hollow cathode plate and a second hollow cathode plate placed opposite to each other at a separation distance of at least 0.1 mm and having an opening following an outer edge of a sputter erosion zone on a magnetron target so that a magnetron magnetic field forms a perpendicular magnetic component inside a hollow cathode slit between plates and, wherein the plates and are connected to a first electric power generator together with the magnetron target to generate a magnetically enhanced hollow cathode plasma in at least one of a first working gas distributed in the hollow cathode slit and a second working gas admitted outside the slit in contact with a magnetron plasma generated in at least one of the first working gas and the second working gas.

The invention claimed is: 
     
         1 . A magnetron plasma apparatus boosted by hollow cathode plasma for plasma processing on a substrate in a reactor, comprising a parallel plate hollow cathode with a slit wherein a hollow cathode effect can be excited, magnetron sputtering apparatus with a magnetron target, an electric power generator for generation of plasma and a magnetic system generating a magnetron magnetic field giving form to an erosion zone on the magnetron target surface and spatial shape of the magnetron plasma, wherein
 at least one electrically connected pair of a first hollow cathode plate and a second hollow cathode plate placed opposite to each other at a separation distance of at least 0.1 mm has an opening following an outer edge of a sputter erosion zone on magnetron target so that a magnetron magnetic field forms a perpendicular magnetic induction component inside a hollow cathode slit between said plates and;   said pair of plates and is connected to a first electric power generator together with said target to generate a magnetically enhanced hollow cathode plasma in at least one of a first working gas distributed in said hollow cathode slit and a second working gas admitted outside said slit in contact with a magnetron plasma generated in at least one of said first working gas and said second working gas.   
     
     
         2 . The apparatus according to  claim 1 , wherein said second hollow cathode plate is integrated in said magnetron target and said hollow cathode slit where said hollow cathode plasma is forming is created between said first hollow cathode plate and said target. 
     
     
         3 . The apparatus according to  claim 1 , wherein said pair of said first hollow cathode plate and said second hollow cathode plate are electrically insulated from said magnetron target and connected to a second electric power generator. 
     
     
         4 . The apparatus according to any of the  claim 1 , wherein said magnetically enhanced hollow cathode plasma inside said hollow cathode slit forms a first hot zone on said first cathode plate and a second hot zone on said second hollow cathode plate and said hot zones and evaporate material from said hollow cathode plates. 
     
     
         5 . The apparatus according to  claim 1 , wherein said magnetron target has cylindrical form in a rotatable target magnetron apparatus and said pair of said first hollow cathode plate and said second hollow cathode plate are mechanically decoupled from said magnetron target. 
     
     
         6 . The apparatus according to  claim 1 , wherein multiple pairs of said first hollow cathode plate and said second hollow cathode plate have annular circular openings and create a hollow cylindrical shape of said magnetron target. 
     
     
         7 . The apparatus according to  claim 1 , wherein at least one of said first hollow cathode plate, said second hollow cathode plate and said magnetron target is fabricated at least in some part from a different material. 
     
     
         8 . The apparatus according to  claim 1 , wherein said individual pairs of said hollow cathode plates and are out of parallel with each other or with respect to said magnetron target. 
     
     
         9 . The apparatus according to  claim 1 , wherein said first hollow cathode plate and said second hollow cathode plate have other than planar shapes and compose uneven forms of said hollow cathode slit. 
     
     
         10 . The apparatus according to  claim 1 , wherein said magnetically enhanced hollow cathode plasma is generated in said first working gas.